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1.发明申请BUNDLE-GUIDING OPTICAL COLLECTOR FOR COLLECTING THE EMISSION OF A RADIATION SOURCE 有权用于收集辐射源排放的组合光学收集器公开(公告)号：US20100231882A1
公开(公告)日：2010-09-16
申请号：US12726081
申请日：2010-03-17
Applicant: Udo Dinger , Christopher Weth
Inventor： Udo Dinger , Christopher Weth
CPC classification number: G03F7/70175 , G02B5/0891 , G02B5/09 , G03F7/70083 , G03F7/70116 , G03F7/702 , G21K2201/064
Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.
Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。
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2.发明授权Bundle-guiding optical collector for collecting the emission of a radiation source 有权用于收集辐射源的发射的束引导光收发器公开(公告)号：US08934085B2
公开(公告)日：2015-01-13
申请号：US12726081
申请日：2010-03-17
Applicant: Udo Dinger , Christopher Weth
Inventor： Udo Dinger , Christopher Weth
CPC classification number: G03F7/70175 , G02B5/0891 , G02B5/09 , G03F7/70083 , G03F7/70116 , G03F7/702 , G21K2201/064
Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.
Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。
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公开(公告)号：US20080130076A1
公开(公告)日：2008-06-05
申请号：US12009984
申请日：2008-01-23
Applicant: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
Inventor： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC classification number: B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
Abstract translation: 提供了一种用于微光刻的照明系统。 该照明系统包括具有多个场光栅元件的光学元件，其中照射场的平面以及位于从光学元件到平面的光路中的掠入射镜之后的光学元件。 照明系统在光路中，光学元件之后和平面之前没有其他掠入射镜。
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公开(公告)号：US07375798B2
公开(公告)日：2008-05-20
申请号：US11657420
申请日：2007-01-24
Applicant: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
Abstract translation: 提供了一个EUV光学投影系统。 该系统包括位于从物平面到像平面的光路中的第一镜，第二镜，第三镜，第四镜，第五镜和第六镜，用于将所述物平面中的物体成像成 所述图像平面中的图像。 图像具有宽度W和割线长度SL，宽度W大于约2mm。
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公开(公告)号：US07355678B2
公开(公告)日：2008-04-08
申请号：US11243407
申请日：2005-10-04
Applicant: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).
Abstract translation: EUV光学投影系统包括用于对图像（IM）上的物体（OB）进行成像的至少六个反射表面。 该系统优选地配置成沿着从物体（OB）到次级反射镜（M 2）和第三反射镜（M 3）之间的图像（IM）的光路形成中间图像（IMI），使得主 反射镜（M 1）和副镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 2）。 该系统还优选地包括沿着从物体（OB）到主镜（M 1）和副镜（M 2）之间的图像（IM）的光路定位的孔径光阑（APE）。 副镜（M 2）优选为凹面，第三反射镜（M 3）优选为凸面。 六个反射表面中的每一个优选地以小于大约15°的入射角从中心场点接收主光线（CR）。 该系统优选地在图像（IM）处具有大于0.18的数值孔径。 优选地，该系统构造成使得主光线（CR）在副反射镜（M 2）和第三反射镜（M 3）之间传播的同时朝向光轴（OA）会聚。
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Patent Agency Ranking
公开(公告)号：US20070153252A1
公开(公告)日：2007-07-05
申请号：US11657420
申请日：2007-01-24
Applicant: Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
IPC: G03B27/54
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
Abstract translation: 提供了一个EUV光学投影系统。 该系统包括位于从物平面到像平面的光路中的第一镜，第二镜，第三镜，第四镜，第五镜和第六镜，用于将所述物平面中的物体成像成 所述图像平面中的图像。 图像具有宽度W和割线长度SL，宽度W大于约2mm。
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公开(公告)号：US20070070322A1
公开(公告)日：2007-03-29
申请号：US11604997
申请日：2006-11-28
Applicant: Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
IPC: G03B27/54
CPC classification number: G03F7/70233 , G02B17/0652 , G02B17/0657 , G03F7/70275
Abstract: An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
Abstract translation: EUV光学投影系统包括用于将物体（OB）成像到图像（IM）的至少六个反射镜（M 1，M 2，M 3，M 4，M 5，M 6）。 优选地，至少一个镜对配置为至少相位补偿镜对。 该系统优选地被配置成沿着从物体（OB）到第二反射镜（M 2）和第三反射镜（M 3）之间的图像（IM））的光路形成中间图像（IMI），使得第一 反射镜（M 1）和第二反射镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 1）。 该系统还优选地包括沿着从物体（OB）到第一反射镜（M 1）和第二反射镜（M 2）之间的图像（IM））的光路定位的孔径光阑（APE）。 第二镜（M 2）优选为凸面，第三镜（M 3）优选为凹面。 该系统优选地形成数值孔径大于0.18的图像（IM）。
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公开(公告)号：US07186983B2
公开(公告)日：2007-03-06
申请号：US10919583
申请日：2004-08-17
Applicant: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
Inventor： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC classification number: B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
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9.发明申请Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature 有权Euv投影透镜，具有由具有不同符号的材料制成的反射镜，用于在零转变温度附近的热膨胀系数的温度依赖性升高公开(公告)号：US20070035814A1
公开(公告)日：2007-02-15
申请号：US10577163
申请日：2003-09-27
Applicant: Udo Dinger , Frank Eisert , Stefan Koehler , Andreas Ochse , Johannes Zellner , Martin Lowisch , Timo Laufer
Inventor： Udo Dinger , Frank Eisert , Stefan Koehler , Andreas Ochse , Johannes Zellner , Martin Lowisch , Timo Laufer
IPC: G06K7/10
CPC classification number: G03F7/70958 , B82Y10/00 , G02B1/00 , G02B5/0891 , G02B7/181 , G03F7/70891 , G21K1/062 , G21K2201/065
Abstract: A projection objective 1 for short wavelengths, in particular for wavelengths λ
Abstract translation: 用于短波长的投影物镜1，特别是对于波长λ<157nm的投影物镜1设置有多个反射镜M 1，M 2，M 3，M 4，M 5和M 6，其被精确地相对于光学 轴5。 反射镜M 1，M 2，M 3，M 4，M 5和M 6具有多层涂层。 提供了至少两种不同的镜材料，其热膨胀系数的上升与热膨胀系数的过零区域中的温度的函数不同，特别是大小的符号。
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10.发明授权公开(公告)号：US06700952B2
公开(公告)日：2004-03-02
申请号：US09760091
申请日：2001-01-11
Applicant: Udo Dinger , Martin Ross-Messemer
Inventor： Udo Dinger , Martin Ross-Messemer
IPC: G21K106
CPC classification number: G03F7/702 , G02B5/1828 , G02B5/1838 , G03F7/70075 , G03F7/70158
Abstract: There is provided an optical apparatus for radiation with a wavelength ≦160 nm. The apparatus comprises a mirror with a mirror surface, and a first device for generating elastic oscillations with different acoustic wavelengths on the mirror surface due to surface deformations. Radiation impinging on the mirror surface is diffracted in a predetermined range of angles (&agr;).
Abstract translation: 提供了一种波长<= 160nm的辐射光学装置。 该装置包括具有镜面的反射镜，以及用于由于表面变形而在镜面上产生具有不同声波长的弹性振荡的第一装置。 撞击在镜面上的辐射在预定的角度范围（α）被衍射。
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