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    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus
    1.
    发明授权
    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus 有权
    用于改善微光刻投影曝光装置的投影物镜的成像特性的方法

    公开(公告)号：US07456933B2

    公开(公告)日：2008-11-25

    申请号：US11220643

    申请日：2005-09-08

    申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

    发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner ,  Markus Mengel

    IPC分类号： G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

    摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

    摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当的照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus
    2.
    发明申请
    Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus 有权
    用于改善微光刻投影曝光装置的投影物镜的成像特性的方法

    公开(公告)号：US20060077371A1

    公开(公告)日：2006-04-13

    申请号：US11220643

    申请日：2005-09-08

    申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner

    发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner

    IPC分类号： G03B27/54

    CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

    摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

    摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

    System for measuring the image quality of an optical imaging system
    7.
    发明授权
    System for measuring the image quality of an optical imaging system 失效
    用于测量光学成像系统的图像质量的系统

    公开(公告)号：US08488127B2

    公开(公告)日：2013-07-16

    申请号：US12850740

    申请日：2010-08-05

    申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    IPC分类号： G01B11/02

    CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

    摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

    摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。

    SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM
    8.
    发明申请
    SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM 失效
    用于测量光学成像系统的图像质量的系统

    公开(公告)号：US20100315651A1

    公开(公告)日：2010-12-16

    申请号：US12850740

    申请日：2010-08-05

    申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

    IPC分类号： G01B11/02

    CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

    摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

    摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。

    Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
    9.
    发明授权
    Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser 有权
    用于确定光学系统对偏振状态的影响的方法和装置; 和分析仪

    公开(公告)号：US07286245B2

    公开(公告)日：2007-10-23

    申请号：US10628431

    申请日：2003-07-29

    申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

    发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

    IPC分类号： G01B9/02

    CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

    摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

    摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

    Device for polarization-specific examination, an optical imaging system and a calibration method
    10.
    发明申请
    Device for polarization-specific examination, an optical imaging system and a calibration method 有权
    用于偏振特异性检查的装置，光学成像系统和校准方法

    公开(公告)号：US20050146789A1

    公开(公告)日：2005-07-07

    申请号：US10883739

    申请日：2004-07-06

    申请人： Ulrich Wegmann ,  Markus Mengel

    发明人： Ulrich Wegmann ,  Markus Mengel

    IPC分类号： G01J4/04 ,  G01M11/00 ,  G01M11/02 ,  G01N21/21 ,  G02B5/18 ,  G02B5/30 ,  G02B27/44 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

    CPC分类号： G02B5/3058 ,  G01J4/04 ,  G02B5/1809 ,  G02B5/3091 ,  G02B27/4222 ,  G02B27/4255 ,  G02B27/4261 ,  G02B27/4277 ,  G03F7/70566 ,  G03F7/70591

    摘要： The invention relates to a device for polarization-specific examination of an optical system having a detector part that has polarization detector means for recording the exit state of polarization of radiation (6) emerging from the optical system, to an associated optical imaging system, and to a calibration method for the device. A device according to the invention includes polarization detector means with a polarizing grating structure (4). Provided as an alternative is a device for snapshot polarimetry having a birefringent element and downstream polarizer element that is suitable, also adequately polarizing nonquasi-parallel radiation. Use, for example, for determining the influencing of the state of polarization of UV radiation by a microlithographic projection objective.

    摘要翻译： 本发明涉及一种用于具有检测器部​​分的光学系统的偏振特定检查的装置，所述检测器部分具有用于记录从光学系统出射的辐射（6）的偏振的出射状态到相关联的光学成像系统的偏振检测器装置，以及 到设备的校准方法。 根据本发明的装置包括具有偏振光栅结构（4）的偏振检测器装置。 提供替代方案是用于快照偏振测量的装置，其具有适合的双折射元件和下游偏振器元件，也适用于非准并行辐射。 例如，用于通过微光刻投影物镜确定UV辐射的偏振状态的影响。