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1.发明授权公开(公告)号：US07456933B2
公开(公告)日：2008-11-25
申请号：US11220643
申请日：2005-09-08
CPC分类号： G03F7/706 , G03F7/701 , G03F7/70566 , G03F7/70591
摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.
摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当的照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。
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2.发明申请公开(公告)号：US20060077371A1
公开(公告)日：2006-04-13
申请号：US11220643
申请日：2005-09-08
IPC分类号： G03B27/54
CPC分类号： G03F7/706 , G03F7/701 , G03F7/70566 , G03F7/70591
摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.
摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。
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3.发明授权Method for determining intensity distribution in the image plane of a projection exposure arrangement 有权用于确定投影曝光装置的图像平面中的强度分布的方法公开(公告)号：US07961297B2
公开(公告)日：2011-06-14
申请号：US12065451
申请日：2006-09-02
申请人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
发明人： Joern Greif-Wuestenbecker , Beate Boehme , Ulrich Stroessner , Michael Totzeck , Vladimir Kamenov , Olaf Dittmann , Daniel Kraehmer , Toralf Gruner , Bernd Geh
CPC分类号： G03F7/70666 , G03F7/70308
摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。
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公开(公告)号：US07808615B2
公开(公告)日：2010-10-05
申请号：US11427183
申请日：2006-06-28
申请人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
发明人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Dittmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
CPC分类号： G03F7/70958 , G02B13/143 , G02B17/0856 , G02B17/0892 , G02B27/0012 , G03F7/70091
摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).
摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。
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5.发明授权Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses 失效氟化物晶体透镜优化目标的方法，以及氟化物晶体透镜的目标公开(公告)号：US07321465B2
公开(公告)日：2008-01-22
申请号：US11071699
申请日：2005-03-02
申请人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
发明人： Michael Totzeck , Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B27/28
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966 , Y10S359/90
摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.
摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。
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公开(公告)号：US20080002167A1
公开(公告)日：2008-01-03
申请号：US11427183
申请日：2006-06-28
申请人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
发明人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
CPC分类号： G03F7/70958 , G02B13/143 , G02B17/0856 , G02B17/0892 , G02B27/0012 , G03F7/70091
摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).
摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。
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公开(公告)号：US09733395B2
公开(公告)日：2017-08-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
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公开(公告)号：US20060066764A1
公开(公告)日：2006-03-30
申请号：US11251300
申请日：2005-10-14
申请人： Vladimir Kamenov , Toralf Gruner
发明人： Vladimir Kamenov , Toralf Gruner
IPC分类号： G02F1/1335
CPC分类号： G03F7/70225 , G02B5/3091 , G02B17/02 , G02B17/08 , G02B17/0892 , G03F7/70241 , G03F7/70958 , G03F7/70966
摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.
摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。
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公开(公告)号：US08446665B2
公开(公告)日：2013-05-21
申请号：US12562693
申请日：2009-09-18
IPC分类号： G02B5/08
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。
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公开(公告)号：US20110038061A1
公开(公告)日：2011-02-17
申请号：US12562693
申请日：2009-09-18
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。
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