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    Methods of and apparatus for making high aspect ratio microelectromechanical structures
    4.
    发明申请
    Methods of and apparatus for making high aspect ratio microelectromechanical structures 失效
    制备高纵横比微机电结构的方法和装置

    公开(公告)号：US20030121791A1

    公开(公告)日：2003-07-03

    申请号：US10272255

    申请日：2002-10-15

    申请人： University of Southern California

    发明人： Adam L. Cohen

    IPC分类号： C25D005/02

    CPC分类号： B81C1/0038 ,  B33Y10/00 ,  B81C1/00619 ,  B81C2201/0197 ,  C25D1/00 ,  C25D1/003 ,  C25D5/022 ,  C25D5/10 ,  C25D7/12 ,  C25D17/02 ,  C25D21/14 ,  H01L21/2885 ,  H01L21/76885 ,  H05K3/241

    摘要： Various embodiments of the invention present techniques for forming structures (e.g. HARMS-type structures) via an electrochemical extrusion (ELEXnull) process. Preferred embodiments perform the extrusion processes via depositions through anodeless conformable contact masks that are initially pressed against substrates that are then progressively pulled away or separated as the depositions thicken. A pattern of deposition may vary over the course of deposition by including more complex relative motion between the mask and the substrate elements. Such complex motion may include rotational components or translational motions having components that are not parallel to an axis of separation. More complex structures may be formed by combining the ELEXnull process with the selective deposition, blanket deposition, planarization, etching, and multi-layer operations of EFABnull.

    摘要翻译： 本发明的各种实施方案提供了用于通过电化学挤出（ELEX TM）方法形成结构（例如HARMS型结构）的技术。 优选的实施方案通过沉积通过无阳极适应的接触掩模进行挤出过程，其最初被压在基底上，然后随着沉积增厚逐渐拉开或分离。 沉积图案可以通过在掩模和衬底元件之间包括更复杂的相对运动而在沉积过程中变化。 这种复杂运动可以包括旋转分量或具有不与分离轴平行的分量的平移运动。 可以通过将ELEX TM工艺与EFAB TM的选择性沉积，覆盖沉积，平坦化，蚀刻和多层操作组合来形成更复杂的结构。

    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures
    5.
    发明申请
    Multi-cell masks and methods and apparatus for using such masks to form three-dimensional structures 失效

    公开(公告)号：US20040129573A1

    公开(公告)日：2004-07-08

    申请号：US10677546

    申请日：2003-10-01

    申请人： University of Southern California

    发明人： Adam L. Cohen

    IPC分类号： C25D005/10

    CPC分类号： B81C1/00492 ,  B33Y10/00 ,  C25D1/003 ,  C25D1/08 ,  C25D5/022 ,  C25D5/10 ,  C25D7/12

    摘要： Multilayer structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. Selectivity of deposition is obtained via a multi-cell controllable mask. Alternatively, net selective deposition is obtained via a blanket deposition and a selective removal of material via a multi-cell mask. Individual cells of the mask may contain electrodes comprising depositable material or electrodes capable of receiving etched material from a substrate. Alternatively, individual cells may include passages that allow or inhibit ion flow between a substrate and an external electrode and that include electrodes or other control elements that can be used to selectively allow or inhibit ion flow and thus inhibit significant deposition or etching. Single cell masks having a cell size that is smaller or equal to the desired deposition resolution may also be used to form structures.

    Methods and apparatus for monitoring deposition quality during conformable contact mask plating operations
    6.
    发明申请
    Methods and apparatus for monitoring deposition quality during conformable contact mask plating operations 审中-公开
    在一致的接触掩模电镀操作期间监测沉积质量的方法和装置

    公开(公告)号：US20040000489A1

    公开(公告)日：2004-01-01

    申请号：US10434494

    申请日：2003-05-07

    申请人： University of Southern California

    发明人： Gang Zhang ,  Adam L. Cohen

    IPC分类号： C25D005/02

    CPC分类号： H01L21/2885 ,  B33Y10/00 ,  C25D1/003 ,  H01L21/4857 ,  H01L21/76879 ,  H05K3/241 ,  H05K3/243

    摘要： Electrochemical fabrication (e.g. EFAB) processes and apparatus are disclosed that provide monitoring of at least one electrical parameter (e.g. voltage) during selective deposition where the monitored parameter is used to help determine the quality of the deposition that was made. If the monitored parameter indicates that a problem occurred with the deposition, various remedial operations may be undertaken to allow successful formation of the structure to be completed.

    摘要翻译： 公开了电化学制造（例如EFAB）方法和装置，其在选择性沉积期间提供至少一个电参数（例如电压）的监测，其中所使用的监测参数用于帮助确定所制备的沉积的质量。 如果所监测的参数表明沉积物发生问题，则可进行各种补救操作以允许成功地形成待完成的结构。