Metrology for Extreme Ultraviolet Light Source
    1.
    发明申请
    Metrology for Extreme Ultraviolet Light Source 有权
    极紫外光源计量

    公开(公告)号:US20110141865A1

    公开(公告)日:2011-06-16

    申请号:US12637961

    申请日:2009-12-15

    IPC分类号: G11B20/00 G11B7/00

    CPC分类号: G01J1/429 H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统,被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括:光收集系统,被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。

    Metrology for extreme ultraviolet light source
    2.
    发明授权
    Metrology for extreme ultraviolet light source 有权
    极紫外光源测量

    公开(公告)号:US08000212B2

    公开(公告)日:2011-08-16

    申请号:US12637961

    申请日:2009-12-15

    IPC分类号: G11B7/00

    CPC分类号: G01J1/429 H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统,被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。 光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。 测量系统包括:光收集系统,被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。 光采集系统包括配置为光学地分离这些部分的二向色光学装置。

    Beam transport system for extreme ultraviolet light source
    3.
    发明授权
    Beam transport system for extreme ultraviolet light source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号:US08173985B2

    公开(公告)日:2012-05-08

    申请号:US12638092

    申请日:2009-12-15

    IPC分类号: H05G2/00 H01L21/027 G03F7/20

    CPC分类号: H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间,其容纳极紫外光收集器和目标位置; 以及光束传送系统,其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    Beam Transport System for Extreme Ultraviolet Light Source
    4.
    发明申请
    Beam Transport System for Extreme Ultraviolet Light Source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号:US20110140008A1

    公开(公告)日:2011-06-16

    申请号:US12638092

    申请日:2009-12-15

    IPC分类号: G21K5/04

    CPC分类号: H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间,其容纳极紫外光收集器和目标位置; 以及光束传送系统,其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    Laser system
    7.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号:US20080225908A1

    公开(公告)日:2008-09-18

    申请号:US11981449

    申请日:2007-10-30

    IPC分类号: H01S3/225

    摘要: An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

    摘要翻译: 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法,其可以包括种子激光振荡器,其产生包括种子激光输出的脉冲光束的输出,所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,该激光系统输出包括激光系统输出光束 的脉冲,其可以包括环形功率放大级; 种子注射机制。