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公开(公告)号：US20120050726A1
公开(公告)日：2012-03-01
申请号：US13214717
申请日：2011-08-22
申请人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
发明人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
IPC分类号： G01J1/00
CPC分类号： G01B11/14 , G01B11/002 , G01S5/16 , G01S5/163 , G01S17/00
摘要： A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.
摘要翻译： 一种测量系统，其使用位于要组装的物体上的多个光检测目标，多个旋转光发射头，产生参考RF信号的主信号发生器，以及确定每个 从由每个目标响应于光发射头的信号产生的目标。 在操作期间，将参考RF信号广播到旋转的光发射头和光检测目标。 RF信号用于以高精确度确定磁头相对于零参考位置的方位角。
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公开(公告)号：US08582119B2
公开(公告)日：2013-11-12
申请号：US13214717
申请日：2011-08-22
申请人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
发明人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G01B11/002 , G01S5/16 , G01S5/163 , G01S17/00
摘要： A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.
摘要翻译： 一种测量系统，其使用位于要组装的物体上的多个光检测目标，多个旋转光发射头，产生参考RF信号的主信号发生器，以及确定每个 从由每个目标响应于光发射头的信号产生的目标。 在操作期间，将参考RF信号广播到旋转的光发射头和光检测目标。 RF信号用于以高精确度确定磁头相对于零参考位置的方位角。
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3.发明授权Imaging optical system configured with through the lens optics for producing control information 失效成像光学系统通过透镜光学元件配置，用于产生控制信息公开(公告)号：US07612892B2
公开(公告)日：2009-11-03
申请号：US11544833
申请日：2006-10-05
IPC分类号： G01B11/02
CPC分类号： G03F7/7085 , G02B27/40 , G03F7/70641
摘要： A new and useful imaging concept is provided that is designed to improve the manner in which control information for an imaging optical system such as a lithographic imaging optical system can be generated. An imaging optical system comprises imaging optics defining a primary optical path along which a primary image is imaged, and a measurement optical path is established and includes at least part of the primary optical path. The imaging optical system is configured to obtain information from the measurement optical path for use in providing control information for the imaging optical system. Such a system is particularly useful for measuring the topography of a large region of the surface under investigation, like the entire instantaneous field of a wafer, instead being limited to a small patch or set of patches.
摘要翻译： 提供了一种新的有用的成像概念，其被设计为改善可以生成诸如光刻成像光学系统的成像光学系统的控制信息的方式。 成像光学系统包括成像光学器件，其限定主要成像的主要光学路径，建立测量光学路径并且包括主要光学路径的至少一部分。 成像光学系统被配置为从用于提供成像光学系统的控制信息的测量光路获得信息。 这样的系统对于测量正在研究的表面的大区域的形貌特别有用，如晶片的整个瞬时场，而不是局限于小的贴片或一组贴片。
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4.发明授权Immersion lithography apparatus with hydrophilic region encircling hydrophobic region which encircles substrate support 有权浸没光刻设备，其环绕着包围衬底支撑的疏水区域的亲水区域公开(公告)号：US09007561B2
公开(公告)日：2015-04-14
申请号：US13543238
申请日：2012-07-06
申请人： W. Thomas Novak
发明人： W. Thomas Novak
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.
摘要翻译： 曝光装置通过光学组件和设置在基板上的液体将光照射到基板上来曝光基板。 曝光装置包括可相对于光学组件移动的舞台组件，舞台组件包括支撑衬底的支撑件，基本上环绕支撑件的第一子区域和基本上环绕第一子区域的第二子区域。 第一子区域包括具有第一特征的第一表面，而第二子区域包括具有不同于第一特征的第二特征的第二表面。
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5.发明授权Lyophobic run-off path to collect liquid for an immersion lithography apparatus 有权用于浸没式光刻设备的疏液流路以收集液体公开(公告)号：US08243253B2
公开(公告)日：2012-08-14
申请号：US12155377
申请日：2008-06-03
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
摘要翻译： 用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。 光学组件被定位成使得在装置上方存在间隙。 浸没流体系统用浸没流体填充间隙。 装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。 装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。
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6.发明授权公开(公告)号：US08094379B2
公开(公告)日：2012-01-10
申请号：US12461762
申请日：2009-08-24
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G02B3/12
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap.
摘要翻译： 光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。 在曝光期间，光学元件和基板之间的空间被填充液体。 在光学元件的部件和表面之间形成间隙，曝光光束不通过该光学元件。 液体被供应到间隙。
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公开(公告)号：US20110031416A1
公开(公告)日：2011-02-10
申请号：US12923948
申请日：2010-10-15
CPC分类号： G03F7/70341
摘要： A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
摘要翻译： 用于制造半导体器件的光刻工具包括晶片台，透镜和液体分配组件，通过该液体分配组件将液体沿着远离所述晶片台的方向引导到设置在晶片台上的半导体晶片的表面和透镜之间 半导体晶片在其边缘。
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公开(公告)号：US07688421B2
公开(公告)日：2010-03-30
申请号：US11628942
申请日：2004-12-20
申请人： Douglas C. Watson , W. Thomas Novak
发明人： Douglas C. Watson , W. Thomas Novak
CPC分类号： G03F7/70258 , G03F7/70341 , G03F7/70833 , G03F7/709
摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.
摘要翻译： 一种浸没式光刻系统，用于补偿由浸液引起的光学位移。 该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。 光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。 提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。 为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。 由变化的压力产生的所产生的力可能导致最终的光学元件变位。 流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。
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公开(公告)号：US07443482B2
公开(公告)日：2008-10-28
申请号：US11236759
申请日：2005-09-28
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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10.发明申请公开(公告)号：US20080239261A1
公开(公告)日：2008-10-02
申请号：US12155377
申请日：2008-06-03
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.
摘要翻译： 用于将图像转印到装置的曝光装置包括光学组件，浸液系统和装置台组件。 光学组件被定位成使得在装置上方存在间隙。 浸没流体系统用浸没流体填充间隙。 装置台组件包括倾斜区域，其有助于离开该间隙的浸没流体的移动远离装置。 装置台组件可以包括收集区域和从收集区域回收浸没流体的回收系统。
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