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24 条记录 (耗时 0.021 秒)

    Determining emitter beam size for data storage medium
    3.
    发明授权
    Determining emitter beam size for data storage medium 失效
    确定数据存储介质的发射束大小

    公开(公告)号：US07129503B2

    公开(公告)日：2006-10-31

    申请号：US10268504

    申请日：2002-10-09

    申请人： Jeffrey M. Valley ,  John Liebeskind

    发明人： Jeffrey M. Valley ,  John Liebeskind

    IPC分类号： G11B9/10 ,  H01J37/244

    CPC分类号： G01J1/4257 ,  G11C7/005 ,  G11C13/00 ,  G11C13/04

    摘要： Determining a beam size of an emitter for a data storage medium is disclosed. The emitter, having an emitted beam, is moved across conductor of a detector. Current through the conductor, resulting from the emitted beam as the emitter moves across the detector, is measured. The size of the emitted beam of the emitter is determined based on the position of the emitter and the measured current.

    摘要翻译： 公开了确定数据存储介质的发射器的光束尺寸。 具有发射光束的发射器被移动穿过检测器的导体。 测量由发射体穿过检测器发射的射束产生的通过导体的电流。 基于发射极的位置和测量的电流来确定发射器的发射光束的大小。

    Display device
    4.
    发明申请
    Display device 审中-公开
    显示设备

    公开(公告)号：US20060033676A1

    公开(公告)日：2006-02-16

    申请号：US10915753

    申请日：2004-08-10

    申请人： Kenneth Faase ,  Timothy Weber ,  John Liebeskind ,  Charles Morehouse ,  James McKinnell

    发明人： Kenneth Faase ,  Timothy Weber ,  John Liebeskind ,  Charles Morehouse ,  James McKinnell

    IPC分类号： G09G3/00

    CPC分类号： G02B26/02

    摘要： A display device includes a base and light valve components formed over the base. The base includes electrical circuitry. Each of the light valve components includes a chamber that defines an optical path, particles within the chamber, and a mechanism for transversely repositioning the particles in relation to the optical path in response to voltages provided by the electrical circuitry.

    摘要翻译： 显示装置包括形成在基座上的基座和光阀部件。 基座包括电路。 每个光阀部件包括限定光路的腔室，腔内的颗粒，以及用于响应于由电路提供的电压而相对于光路横向地重新定位颗粒的机构。

    Method of activating a getter structure
    5.
    发明申请
    Method of activating a getter structure 审中-公开
    激活吸气剂结构的方法

    公开(公告)号：US20050085053A1

    公开(公告)日：2005-04-21

    申请号：US10689821

    申请日：2003-10-20

    申请人： Chien-Hua Chen ,  James McKinnell ,  John Liebeskind

    发明人： Chien-Hua Chen ,  James McKinnell ,  John Liebeskind

    IPC分类号： H01L23/26 ,  H01L21/322

    CPC分类号： H01L23/26 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

    摘要： A method of activating a getter structure, including illuminating a photomask having a transmissive region substantially aligned with the getter structure, transmitting a portion of the photons through, the transmissive region. In addition the method includes absorbing the photons, transmitted through the transmissive region, in the getter structure and heating the getter structure with the absorbed photons.

    摘要翻译： 一种激活吸气剂结构的方法，包括照射具有与吸气剂结构基本上对准的透射区域的光掩模，透射部分光子穿过透射区域。 此外，该方法包括吸收通过透射区域传输的光子，在吸气剂结构中并用吸收的光子加热吸气剂结构。

    Vacuum device having non-evaporable getter component with increased exposed surface area
    9.
    发明授权
    Vacuum device having non-evaporable getter component with increased exposed surface area 有权
    具有不可蒸发的吸气剂组分的真空装置具有增加的暴露表面积

    公开(公告)号：US07608998B2

    公开(公告)日：2009-10-27

    申请号：US11387222

    申请日：2006-03-22

    申请人： Sriram Ramamoorthi ,  Zhizhang Chen ,  John Liebeskind ,  Ronald L. Enck ,  Jennifer Shih

    发明人： Sriram Ramamoorthi ,  Zhizhang Chen ,  John Liebeskind ,  Ronald L. Enck ,  Jennifer Shih

    IPC分类号： H01J17/24 ,  H01J19/70 ,  H01J61/26

    CPC分类号： H01J7/186 ,  F04B37/02 ,  H01J19/70

    摘要： A vacuum device, including a substrate and a support structure having a support perimeter, where the support structure is disposed over the substrate. In addition, the vacuum device also includes a non-evaporable getter layer having an exposed surface area. The non-evaporable getter layer is disposed over the support structure, and extends beyond the support perimeter, in at least one direction, of the support structure forming a vacuum gap between the substrate and the non-evaporable getter layer increasing the exposed surface area.

    摘要翻译： 一种真空装置，包括基底和具有支撑周边的支撑结构，其中所述支撑结构设置在所述基底上。 此外，真空装置还包括具有暴露表面积的不可蒸发的吸气剂层。 不可蒸发的吸气剂层设置在支撑结构上方，并且在支撑结构的至少一个方向上延伸超过支撑周边，所述支撑结构在衬底和非蒸发性吸气剂层之间形成真空间隙，增加暴露的表面积。