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27 条记录 (耗时 0.026 秒)

    Method for fabricating fine features by jet-printing and surface treatment
    1.
    发明授权
    Method for fabricating fine features by jet-printing and surface treatment 有权
    通过喷墨印刷和表面处理制造精细特征的方法

    公开(公告)号：US07223700B2

    公开(公告)日：2007-05-29

    申请号：US11251525

    申请日：2005-10-14

    申请人： William S. Wong ,  Steven E. Ready ,  Stephen D. White ,  Alberto Salleo ,  Michael L. Chabinyc

    发明人： William S. Wong ,  Steven E. Ready ,  Stephen D. White ,  Alberto Salleo ,  Michael L. Chabinyc

    IPC分类号： H01L21/302

    CPC分类号： H01L51/0004 ,  B82Y30/00 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139 ,  H01L29/66765 ,  H01L51/0021 ,  H01L51/0023 ,  H01L51/0541

    摘要： A method and system for masking a surface to be etched is described. The method includes the operation of heating a phase-change masking material and using a droplet source to eject droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze after upon contact with the thin-film or substrate surface. The thin-film or substrate is then treated to alter the surface characteristics, typically by depositing a self assembled monolayer on the surface. After deposition, the masking material is removed. A material of interest is then deposited over the substrate such that the material adheres only to regions not originally covered by the mask such that the mask acts as a negative resist. Using such techniques, feature sizes of devices smaller than the smallest droplet printed may be fabricated.

    摘要翻译： 描述用于掩蔽待蚀刻表面的方法和系统。 该方法包括加热相变掩模材料和使用液滴源来喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它基底表面上的操作。 控制薄膜或基板表面的温度，使得在与薄膜或基板表面接触之后液滴快速冷冻。 然后通常通过在表面上沉积自组装的单层来处理薄膜或基底以改变表面特性。 沉积后，去除掩模材料。 然后将感兴趣的材料沉积在衬底上，使得材料仅粘附到最初不被掩模覆盖的区域，使得掩模用作负抗蚀剂。 使用这样的技术，可以制造小于最小液滴印刷的装置的特征尺寸。

    Large area electronic device with high and low resolution patterned film features
    3.
    发明授权
    Large area electronic device with high and low resolution patterned film features 有权
    大面积电子设备具有高分辨率和低分辨率图案胶片功能

    公开(公告)号：US07125495B2

    公开(公告)日：2006-10-24

    申请号：US11019037

    申请日：2004-12-20

    申请人： Robert A. Street ,  William S. Wong ,  Alberto Salleo ,  Michael L. Chabinyc

    发明人： Robert A. Street ,  William S. Wong ,  Alberto Salleo ,  Michael L. Chabinyc

    IPC分类号： G01D15/00

    CPC分类号： H01L51/0004 ,  H01L51/0011 ,  H01L51/0021

    摘要： Two different processing techniques are utilized to respectively form high resolution features and low resolution features in a critical layer of an electronic device, and in particular a large area electronic device. High resolution features are formed by soft lithography, and low resolution features are formed by jet-printing or using a jet-printed etch mask. Jet-printing is also used to stitch misaligned structures. Alignment marks are generated with the features to coordinate the various processing steps and to automatically control the stitching process. Thin-film transistors are formed by generating gate structures using a first jet-printed etch mask, forming source/drain electrodes using soft lithography, forming interconnect structures using a second jet-printed etch mask, and then depositing semiconductor material over the source/drain electrodes. Redundant structures are formed to further improve tolerance to misalignment, with non-optimally positioned structures removed (etched) during formation of the low resolution interconnect structures.

    摘要翻译： 利用两种不同的处理技术在电子设备的关键层，特别是大面积的电子设备中分别形成高分辨率特征和低分辨率特征。 通过软光刻形成高分辨率特征，并且通过喷墨印刷或使用喷射印刷的蚀刻掩模形成低分辨率特征。 喷墨印刷也用于缝合不对齐的结构。 产生对准标记的特征是协调各种处理步骤并自动控制缝合过程。 通过使用第一喷射印刷蚀刻掩模产生栅极结构来形成薄膜晶体管，使用软光刻形成源极/漏极，使用第二喷射印刷的蚀刻掩模形成互连结构，然后在源极/漏极上沉积半导体材料 电极。 形成冗余结构以进一步改善对未对准的容限，在形成低分辨率互连结构期间，非最佳定位的结构被去除（蚀刻）。

    Electronic device and methods for fabricating an electronic device
    4.
    发明授权
    Electronic device and methods for fabricating an electronic device 有权
    用于制造电子设备的电子设备和方法

    公开(公告)号：US07405424B2

    公开(公告)日：2008-07-29

    申请号：US11071305

    申请日：2005-03-04

    申请人： Michael L. Chabinyc ,  Alberto Salleo ,  William S. Wong

    发明人： Michael L. Chabinyc ,  Alberto Salleo ,  William S. Wong

    IPC分类号： H01L29/04 ,  H01L31/20

    CPC分类号： H01L51/0545 ,  H01L29/41733 ,  H01L51/0021 ,  H01L51/057

    摘要： An electronic device and a method of fabricating the electronic device includes forming a first electrical contact, a dielectric layer and a second electrical contact wherein the dielectric layer is located between the first and the second electrical contacts, forming an electrically insulating layer over the dielectric layer and the first electrical contact, exposing the first and second electrical contact, the dielectric layer and a first portion of the electrically insulating layer to radiation from the side of the first electrical contact, removing a second portion of the electrically insulating layer that was not irradiated by the radiation, providing a semiconductor material over a portion of the dielectric layer, and forming at least a third electrical contact over at least a portion of the electrically insulting layer and the semiconductor material.

    摘要翻译： 电子器件和制造该电子器件的方法包括形成第一电接触，电介质层和第二电接触，其中电介质层位于第一和第二电接触之间，在介电层上形成电绝缘层 和所述第一电接触，使所述第一和第二电接触，所述电介质层和所述电绝缘层的第一部分暴露于从所述第一电接触侧的辐射，除去未被照射的所述电绝缘层的第二部分 通过辐射，在电介质层的一部分上提供半导体材料，并且在电绝缘层和半导体材料的至少一部分上形成至少第三电接触。

    Electronic device and methods for fabricating an electronic device
    7.
    发明授权
    Electronic device and methods for fabricating an electronic device 失效
    用于制造电子设备的电子设备和方法

    公开(公告)号：US06921679B2

    公开(公告)日：2005-07-26

    申请号：US10739189

    申请日：2003-12-19

    申请人： Michael L Chabinyc ,  Alberto Salleo ,  William S. Wong

    发明人： Michael L Chabinyc ,  Alberto Salleo ,  William S. Wong

    IPC分类号： H01L21/28 ,  H01L21/00 ,  H01L21/336 ,  H01L29/41 ,  H01L29/417 ,  H01L29/76 ,  H01L29/786 ,  H01L51/05 ,  H01L51/40

    CPC分类号： H01L51/0545 ,  H01L29/41733 ,  H01L51/0021 ,  H01L51/057

    摘要： An electronic device and a method of fabricating the electronic device includes forming a first electrical contact, a dielectric layer and a second electrical contact wherein the dielectric layer is located between the first and the second electrical contacts, forming an electrically insulating layer over the dielectric layer and the first electrical contact, exposing the first and second electrical contact, the dielectric layer and a first portion of the electrically insulating layer to radiation from the side of the first electrical contact, removing a second portion of the electrically insulating layer that was not irradiated by the radiation, providing a semiconductor material over a portion of the dielectric layer, and forming at least a third electrical contact over at least a portion of the electrically insulating layer and the semiconductor material.

    摘要翻译： 电子器件和制造该电子器件的方法包括形成第一电接触，电介质层和第二电接触，其中电介质层位于第一和第二电接触之间，在介电层上形成电绝缘层 和所述第一电接触，使所述第一和第二电接触，所述电介质层和所述电绝缘层的第一部分暴露于从所述第一电接触侧的辐射，除去未被照射的所述电绝缘层的第二部分 通过辐射，在电介质层的一部分上提供半导体材料，以及在电绝缘层和半导体材料的至少一部分上形成至少第三电接触。

    Surface energy control methods for color filter printing
    8.
    发明授权
    Surface energy control methods for color filter printing 有权
    彩色滤光片印刷的表面能量控制方法

    公开(公告)号：US07879390B2

    公开(公告)日：2011-02-01

    申请号：US11755717

    申请日：2007-05-30

    申请人： Alberto Salleo ,  Steven E. Ready

    发明人： Alberto Salleo ,  Steven E. Ready

    IPC分类号： B05D5/06

    CPC分类号： G02F1/133516 ,  G02B5/201

    摘要： Black matrix (BM) material is deposited on glass and patterned to form walls that define an array of wells. Various surface treatments and masking schemes are utilized to achieve surface energy control of the BM glass. The surface treatments include one or more of chemically treating the BM walls by depositing hydrophobic self-assembled monolayers on the uppermost wall surfaces, and plasma treatments to control the surface energy of the various BM glass surfaces. Masking processes include backside exposure and development of photoresist, and maskless, self-aligned photo-patterning of the monolayers. Color filter ink is then injected into each well from an ink jet print head. The high surface energy of the lower and side wall surfaces facilitates wetting of the ink, and the low surface energy of the monolayers prevents intermixing of ink between adjacent wells. The ink then dries to form a color filter in each well.

    摘要翻译： 黑色矩阵（BM）材料沉积在玻璃上并图案化以形成限定孔阵列的壁。 利用各种表面处理和掩蔽方案来实现BM玻璃的表面能量控制。 表面处理包括通过在最上壁表面上沉积疏水性自组装单层而进行化学处理BM壁的一种或多种，​​以及用于控制各种BM玻璃表面的表面能的等离子体处理。 掩模过程包括背面曝光和光致抗蚀剂的开发，以及单层的无掩模，自对准光刻图案。 然后将滤色器墨水从喷墨打印头注入每个孔中。 下表面和侧壁表面的高表面能有助于油墨的润湿，并且单层的低表面能防止相邻孔之间油墨的混合。 然后将油墨干燥以在每个孔中形成滤色器。

    Surface Energy Control Methods For Color Filter Printing
    9.
    发明申请
    Surface Energy Control Methods For Color Filter Printing 有权
    彩色滤光片打印的表面能量控制方法

    公开(公告)号：US20080299327A1

    公开(公告)日：2008-12-04

    申请号：US11755717

    申请日：2007-05-30

    申请人： Alberto Salleo ,  Steven E. Ready

    发明人： Alberto Salleo ,  Steven E. Ready

    IPC分类号： C23C14/28

    CPC分类号： G02F1/133516 ,  G02B5/201

    摘要： Black matrix (BM) material is deposited on glass and patterned to form walls that define an array of wells. Various surface treatments and masking schemes are utilized to achieve surface energy control of the BM glass. The surface treatments include one or more of chemically treating the BM walls by depositing hydrophobic self-assembled monolayers on the uppermost wall surfaces, and plasma treatments to control the surface energy of the various BM glass surfaces. Masking processes include backside exposure and development of photoresist, and maskless, self-aligned photo-patterning of the monolayers. Color filter ink is then injected into each well from an ink jet print head. The high surface energy of the lower and side wall surfaces facilitates wetting of the ink, and the low surface energy of the monolayers prevents intermixing of ink between adjacent wells. The ink then dries to form a color filter in each well.

    摘要翻译： 黑色矩阵（BM）材料沉积在玻璃上并图案化以形成限定孔阵列的壁。 利用各种表面处理和掩蔽方案来实现BM玻璃的表面能量控制。 表面处理包括通过在最上壁表面上沉积疏水性自组装单层而进行化学处理BM壁的一种或多种，​​以及用于控制各种BM玻璃表面的表面能的等离子体处理。 掩模过程包括背面曝光和光致抗蚀剂的开发，以及单层的无掩模，自对准光刻图案。 然后将滤色器墨水从喷墨打印头注入每个孔中。 下表面和侧壁表面的高表面能有助于油墨的润湿，并且单层的低表面能防止相邻孔之间油墨的混合。 然后将油墨干燥以在每个孔中形成滤色器。