公开(公告)号：US20110199597A1

公开(公告)日：2011-08-18

申请号：US13096112

申请日：2011-04-28

申请人： Wolfgang Hummel ,  Jurgen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schöngart ,  Markus Neumaier ,  Bärbel Trossbach ,  Ulrich Weber ,  Michael Mühlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Wolfgang Hummel ,  Jurgen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schöngart ,  Markus Neumaier ,  Bärbel Trossbach ,  Ulrich Weber ,  Michael Mühlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/52

CPC分类号： G03F7/70258 ,  G03F7/70825

摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

公开(公告)号：US07830611B2

公开(公告)日：2010-11-09

申请号：US11971328

申请日：2008-01-09

申请人： Olaf Conradi ,  Sascha Bleidistel ,  Markus Hauf ,  Wolfgang Hummel ,  Arif Kazi ,  Baerbel Schwaer ,  Jochen Weber ,  Hubert Holderer ,  Payam Tayebati ,  Boris Bittner

发明人： Olaf Conradi ,  Sascha Bleidistel ,  Markus Hauf ,  Wolfgang Hummel ,  Arif Kazi ,  Baerbel Schwaer ,  Jochen Weber ,  Hubert Holderer ,  Payam Tayebati ,  Boris Bittner

IPC分类号： G02B1/06 ,  G02B3/02 ,  G02B27/02

CPC分类号： G02B27/0068 ,  G02B3/14 ,  G03F7/70266 ,  G03F7/70825

摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

公开(公告)号：US20060164619A1

公开(公告)日：2006-07-27

申请号：US11316160

申请日：2005-12-21

申请人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70258

摘要： An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 所述线性驱动器具有至少一个移动元件，所述移动元件具有剪切部分和提升部分。 所述剪切部分被布置成移动光学元件，并且所述提升部分被布置成移动所述剪切部分。 所述线性驱动器具有支撑元件，该支撑元件在剪切部分被提升部分移动的同时与光学元件接触并防止其移动。

公开(公告)号：US06549600B1

公开(公告)日：2003-04-15

申请号：US09668489

申请日：2000-09-25

申请人： Martin Beier ,  Wolfgang Hummel ,  Wolfram Kindlein ,  Jürgen Uckert

发明人： Martin Beier ,  Wolfgang Hummel ,  Wolfram Kindlein ,  Jürgen Uckert

IPC分类号： G21C1706

CPC分类号： G21C17/06 ,  G21Y2002/201 ,  G21Y2002/204 ,  G21Y2004/30 ,  G21Y2004/40 ,  G21Y2004/504

摘要： A method for inspecting an irradiated fuel element in a nuclear power plant includes the step of measuring, with a measuring device, a spacer of a fuel element for providing measurements of the spacer. The measuring device also measures a calibration rod for providing measurements of the calibration rod, the calibration rod having known dimensions. The measurements of the spacer are calibrated by using the measurements of the calibration rod. It is possible thereby to measure at least the maximum width of the spacer with a measuring error of less than 20 &mgr;m. A device for inspecting an irradiated fuel element in a nuclear power plant is also provided.

摘要翻译： 用于检查核动力装置中的辐射燃料元件的方法包括用测量装置测量用于提供间隔件的测量值的燃料元件的间隔件的步骤。 测量装置还测量用于提供校准杆的测量的校准杆，校准杆具有已知的尺寸。 通过使用校准杆的测量来校准间隔物的测量。 因此，可以以小于20μm的测量误差来测量间隔物的至少最大宽度。 还提供了一种用于检查核电站中辐射的燃料元件的装置。

公开(公告)号：US06521877B1

公开(公告)日：2003-02-18

申请号：US09721451

申请日：2000-11-22

申请人： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

发明人： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

IPC分类号： G01J120

CPC分类号： G03F7/70891

摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement (3) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.

摘要翻译： 光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。 折射光学元件，例如 透镜（2）被光源的旋转非对称辐射冲击（3）加热。 至少一个电加热元件耦合到光学元件。 所述加热元件包括由光学元件承载的电阻加热涂层。 在由光源的辐射作用的光学元件的表面（3）的区域中，电阻加热涂层基本上是光学透明的。 它包括多个平行的，电互相绝缘的涂层条（5至10）。 加热电流源（17〜19）是加热元件的另外一部分。 由于通过辐射冲击（3）和电阻加热对光学元件的组合加热，通过对称和/或均匀的温度和折射率分布来实现由光学元件中的照明引起的成像缺陷的校正 。

公开(公告)号：US06466382B2

公开(公告)日：2002-10-15

申请号：US09751132

申请日：2000-12-29

申请人： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

发明人： Werner Müller-Rissmann ,  Hubert Holderer ,  Rudolf Von Bünau ,  Christian Wagner ,  Jochen Becker ,  Stefan Xalter ,  Wolfgang Hummel

IPC分类号： G02B702

CPC分类号： G03F7/70058 ,  G03F7/70216 ,  G03F7/70891 ,  G03F7/70958

摘要： An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.

摘要翻译： 光学装置，特别是用于微光刻的投影曝光系统，特别是狭缝状图像场或非旋转对称照明。 结果，光学元件（101）以非旋转对称的方式暴露于光源（110,111,112）的辐射。 光学元件（101）具有吸收涂层（104,105）。 涂层（104,105）的吸收以这样的方式分布，使得其以与辐射（107,108,109）的曝光的强度分布至少近似互补的方式是非旋转对称的， 的光源（110,111,112）。 由于在涂层（104,105）中吸收的能量的结果，发生光学元件（101）的附加加热，其导致更好的非旋转对称的温度分布，并且因此补偿光诱导的 成像错误。

公开(公告)号：US5013520A

公开(公告)日：1991-05-07

申请号：US393284

申请日：1989-08-11

申请人： Wolfgang Hummel

发明人： Wolfgang Hummel

IPC分类号： G21C19/36

CPC分类号： G21C19/36

摘要： An apparatus for the insertion of mutually parallel, elongated fuel rods into an elongated can having a rectangular cross section, a longitudinal direction and a lateral transverse slit formed therein, includes a holder for holding a can. A fuel rod positioning arm has an insertion end for insertion through the slit in the can in an insertion direction at right angles to the longitudinal direction of the can. A support structure is attached to the insertion end of the arm for supporting fuel rods. The support structure has a pivot axis at right angles to the insertion direction of the arm and to the longitudinal direction of the can about which the support structure is pivotable back and forth within a given pivot angle. The support structure has a jacket surface with two fuel rod support surfaces being curved outwardly about the pivot axis and offset alongside one another in the direction of the pivot axis. One of the support surfaces merges from a first segment with a relatively shorter radial spacing from the pivot axis than the other of the support surfaces, into a second segment with a relatively greater radial spacing from the pivot axis than the other of the support surfaces. The radial spacings of the two support surfaces from the pivot axis increases in infinite graduations within the given pivot angle, as seen in opposite directions.

摘要翻译： 一种用于将相互平行的细长燃料棒插入具有形成在其中的矩形横截面，纵向方向和横向横向狭缝的细长罐的装置，包括用于保持罐的保持器。 燃料棒定位臂具有插入端，用于沿与罐的纵向成直角的插入方向穿过罐中的狭缝插入。 支撑结构附接到臂的插入端以支撑燃料棒。 支撑结构具有与臂的插入方向成直角的枢转轴线和罐的纵向方向，支撑结构可以在该纵向方向上在给定的枢转角度内来回枢转。 支撑结构具有护套表面，其中两个燃料棒支撑表面围绕枢转轴线向外弯曲并沿着枢转轴线的方向彼此偏移。 其中一个支撑表面从第一段与枢转轴线的相对较短的径向间隔从另一个支撑表面合并成第二段，与第二段具有比枢转轴线相对较大的径向距离，而不是另一个支撑表面。 两个支撑表面从枢转轴线的径向间距在给定的枢轴角度内以无穷大的梯度增加，如从相反的方向看到的。

公开(公告)号：US4040732A

公开(公告)日：1977-08-09

申请号：US662275

申请日：1976-02-27

申请人： Wolfgang Hummel

发明人： Wolfgang Hummel

IPC分类号： G03G21/00 ,  G03G15/00

CPC分类号： G03G15/752

摘要： Disclosed is an electrophotographic copying apparatus comprising a cylindrical drum member having a circumferential wall and an aperture in the circumferential wall and a photoconductor belt having two end sections and covering the outer face of the circumferential wall, passing through the aperture to extend into the drum to form a seal for the aperture, and being secured within the drum, wherein one of the end sections is attached to a means for maintaining tension in the belt and the other end section is attached to a fixed member within the drum. The drum may also have end walls for attachment to the one or more fixed members within the drum.

摘要翻译： 公开了一种电子照相复印设备，包括圆柱形鼓构件，圆柱形鼓构件具有圆周壁和圆周壁中的孔，并且具有两个端部并且覆盖周壁的外表面的感光体带，其通过孔延伸到滚筒中 形成用于孔的密封件，并且被固定在滚筒内，其中一个端部部分附接到用于保持带中的张力的装置，另一端部附接到滚筒内的固定构件。 滚筒还可以具有用于附接到滚筒内的一个或多个固定构件的端壁。

公开(公告)号：US20110013012A1

公开(公告)日：2011-01-20

申请号：US12839441

申请日：2010-07-20

申请人： Wolfgang Hummel ,  Timo Feller

发明人： Wolfgang Hummel ,  Timo Feller

IPC分类号： G06T7/00 ,  H04N7/18

CPC分类号： G21C17/06

摘要： In a method for ascertaining the deformation of a fuel assembly in a pressurized-water reactor, the fuel assembly is placed in a measurement station located inside a flooded pool. The measurement station has a holding apparatus for accommodating and fixing the fuel assembly and also a camera which can be moved at least approximately parallel to its bearing axis. Digital images of the fuel assembly are recorded and stored using the camera in various axial positions, in which in each case one selected structural element of the fuel assembly is located, with the position of the fuel assembly in the recorded image depending on the deformation of the fuel assembly. Each recorded image is segmented using methods of digital image processing, and the selected structural element is identified by comparison with a virtual image of the structural element. Subsequently, for at least one selected reference element of the structural element, the spatial position of which is known from the deformation of the fuel assembly, at least one image coordinate is automatically ascertained and assigned to an object coordinate using a previously known imaging scale.

摘要翻译： 在用于确定加压水反应堆中的燃料组件的变形的方法中，燃料组件被放置在位于充水池内的测量站中。 测量站具有用于容纳和固定燃料组件的保持装置，以及可以至少大致平行于其轴承轴线移动的照相机。 燃料组件的数字图像使用照相机在各种轴向位置被记录和存储，其中在每种情况下，燃料组件的一个选定结构元件位于燃料组件的位置，燃料组件在记录图像中的位置取决于 燃料组件。 使用数字图像处理的方法对每个记录的图像进行分割，并且通过与结构元素的虚拟图像进行比较来识别所选择的结构元素。 随后，对于结构元件的至少一个所选择的参考元件，其空间位置从燃料组件的变形是已知的，至少一个图像坐标被自动确定并且使用先前已知的成像刻度指定给对象坐标。

公开(公告)号：US20100046691A1

公开(公告)日：2010-02-25

申请号：US12604756

申请日：2009-10-23

申请人： Wolfgang Hummel ,  Wolfgang Nahr ,  Wolfgang Lucken

发明人： Wolfgang Hummel ,  Wolfgang Nahr ,  Wolfgang Lucken

IPC分类号： G21C19/00

CPC分类号： B23D19/06

摘要： A method enables dismantling of a control element of a boiling water reactor. Two control element leaves that are disposed opposite one another are separated by means of a roll-cutting method from the other two control element leaves, respectively along an intersection line extending in the longitudinal direction thereof and in the vicinity of the longitudinal center axis.

摘要翻译： 一种方法能够拆除沸水反应器的控制元件。 分别沿其纵向延伸的交叉线和纵向中心轴附近通过辊切割方法从另外两个控制元件叶分离彼此相对设置的两个控制元件叶。