公开(公告)号：US06879778B2

公开(公告)日：2005-04-12

申请号：US10313707

申请日：2002-12-05

申请人： Woo Sik Yoo ,  Takashi Fukada

发明人： Woo Sik Yoo ,  Takashi Fukada

IPC分类号： H01L21/205 ,  C23C16/46 ,  H01L21/00 ,  H01L21/26 ,  H01L21/324 ,  F26B19/00

CPC分类号： H01L21/67115 ,  C23C16/46 ,  H01L21/67109

摘要： A system and method for isothermally distributing a temperature across a semiconductor device. A furnace assembly is provided, which includes a processing tube configured to removably receive a wafer carrier having a full compliment of semiconductor wafers. A heating assembly is provided which can include a heating element positioned to heat air or other gases allowed to enter the process tube. The furnace assembly and process tube are capable of being vertically raised and lowered into a position enclosing the heating assembly within the process tube. Once the heating assembly forms a seal with the process tube, the process tube is exhausted and purged of air. Gas is then allowed to flow into the process tube and exchange heat with the heating element. The heated gas circulates through the process tube to convectively change the temperature of the wafers.

摘要翻译： 一种用于在半导体器件上等温分布温度的系统和方法。 提供一种炉组件，其包括配置成可移除地接收具有完全补充半导体晶片的晶片载体的处理管。 提供一种加热组件，其可包括加热元件，该加热元件定位成加热允许进入过程管的空气或其它气体。 炉组件和处理管能够被垂直地升高和降低到包围加热组件在处理管内的位置。 一旦加热组件与处理管形成密封，则处理管被排出并吹扫空气。 然后允许气体流入处理管并与加热元件交换热量。 加热的气体通过处理管循环以对流地改变晶片的温度。

公开(公告)号：US07440094B2

公开(公告)日：2008-10-21

申请号：US11291246

申请日：2005-11-30

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： G01N21/00

CPC分类号： G01B11/2513 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615

摘要： Systems and techniques for characterizing samples using optical techniques. Coherent light may be incident on a sample, and a diffraction pattern detected. Information indicative of diffraction pattern intensity may be used to determine one or more sample characteristics and/or one or more pattern characteristics. For example, sample characteristics such as stress, warpage, curvature, and contamination may be determined. The coherent light may be light of a single wavelength, or may be light of multiple wavelengths.

摘要翻译： 使用光学技术表征样品的系统和技术。 相干光可能入射到样品上，并且检测到衍射图。 可以使用指示衍射图强度的信息来确定一个或多个样品特性和/或一个或多个图案特征。 例如，可以确定应力，翘曲，曲率和污染等样品特性。 相干光可以是单个波长的光，或者可以是多个波长的光。

公开(公告)号：US20080251111A1

公开(公告)日：2008-10-16

申请号：US11733681

申请日：2007-04-10

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： H01L31/024

CPC分类号： H01L35/30 ,  F24S21/00 ,  Y02E10/40

摘要： A thermoelectric power generator includes a thermoelectric pile in a chamber. A window admits light and/or heat radiation such as solar radiation into the chamber, which is absorbed in a radiation absorbing body in thermal contact with a first side of the thermoelectric pile, whereby the temperature of the first side is raised. A second side of the thermoelectric pile is in thermal contact with the wall of the chamber, which is a heat sink to maintain the second side at a lower temperature. The temperature difference produces a voltage difference at electrical contacts to the thermoelectric pile, which is capable of powering electrical devices.

摘要翻译： 热电发电机包括室中的热电堆。 窗口承认诸如太阳辐射的光和/或热辐射进入室，其被吸收在与热电堆的第一侧热接触的辐射吸收体中，由此第一侧的温度升高。 热电堆的第二面与室的壁热接触，该室的壁是将第二面保持在较低温度的散热器。 温差产生与电热器件电接触的电压差，能够为电器件供电。

公开(公告)号：US20080084555A1

公开(公告)日：2008-04-10

申请号：US11539426

申请日：2006-10-06

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： G01J3/44 ,  G01N21/64 ,  G01N21/65

CPC分类号： G01N21/65 ,  G01J3/36 ,  G01J3/44 ,  G01J3/4406 ,  G01N21/645 ,  G01N21/6489 ,  G01N2021/6417

摘要： Systems and techniques for contemporaneous Raman and photoluminescence spectroscopy. Light that has interacted with a sample is dispersed to separate wavelength components, including Raman and photoluminescence components. A first array detector is positioned to receive Raman components, and a second array detector is positioned to receive Raman components. The first array detector and the second array detector may comprise the same detector material, or different detector materials.

摘要翻译： 同时期拉曼和光致发光光谱的系统和技术。 已经与样品相互作用的光被分散到单独的波长分量，包括拉曼和光致发光组分。 定位第一阵列检测器以接收拉曼分量，并且第二阵列检测器定位成接收拉曼分量。 第一阵列检测器和第二阵列检测器可以包括相同的检测器材料或不同的检测器材料。

公开(公告)号：US06911376B2

公开(公告)日：2005-06-28

申请号：US10677512

申请日：2003-10-01

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： H01L21/00 ,  H01L21/324 ,  H01L21/762 ,  H01L21/30

CPC分类号： H01L21/67115 ,  H01L21/324 ,  H01L21/76254 ,  H01L21/76838 ,  Y10S438/918 ,  Y10S438/967

摘要： A process, which includes implanting hydrogen ions into a silicon substrate, overlaying the silicon substrate on to a support substrate, and applying a flash anneal heat treatment to the silicon and support substrates to cause the silicon substrates to separate at a region defined by the implanted hydrogen ions.

摘要翻译： 一种方法，其包括将氢离子注入到硅衬底中，将硅衬底覆盖在支撑衬底上，并对硅和支撑衬底施加闪光退火热处理，以使硅衬底在由植入物 氢离子。

公开(公告)号：US06633132B2

公开(公告)日：2003-10-14

申请号：US09767513

申请日：2001-01-23

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： H05H100

CPC分类号： H01J37/32009 ,  H01J37/32357

摘要： An apparatus and process for processing a substrate using components and particles formed in a remote plasma generation section of a processing chamber. The processing chamber includes a processing section and a plasma generation section. A plasma field is generated in the plasma generation section, such that the plasma field is generated remotely from the processing section. Components and particles from the plasma field can diffuse and/or drift from the plasma generation section through a passageway to the processing section. The processing chamber may include a plurality of plasma generation sections for generating additional plasma fields. In each instance, the additional plasma fields are generated remotely from the processing section.

摘要翻译： 一种用于使用在处理室的远程等离子体产生部分中形成的部件和颗粒来处理基板的装置和方法。 处理室包括处理部和等离子体产生部。 在等离子体产生部中产生等离子体场，使得等离子体场从处理部远程生成。 来自等离子体场的组分和颗粒可以从等离子体产生部分通过通道扩散和/或漂移到处理部分。 处理室可以包括用于产生附加等离子体场的多个等离子体产生部分。 在每种情况下，从处理部分远程生成附加等离子体场。

公开(公告)号：US06621943B1

公开(公告)日：2003-09-16

申请号：US09590714

申请日：2000-06-08

申请人： Woo Sik Yoo ,  Kitaek Kang ,  Taro Yamazaki

发明人： Woo Sik Yoo ,  Kitaek Kang ,  Taro Yamazaki

IPC分类号： G06K920

CPC分类号： G01D5/39

摘要： An improved system and method for obtaining data related to the operation of a processing system which converts from analog measurement data, usually obtained from meters and gages, to digital data. Visual images of various types of measuring instruments are collected and used for measuring a process functionality. An image sensor provides an image of a first feature of the measuring instrument. The image data is processed by an image processor, which is operable to detect a first feature and determine its position relative to a second feature of the measuring instrument. The difference in the relative positions (measured distance) can then be compared to a predetermined or expected value. If the measured and expected values are not substantially the same, a signal can be generated which instructs a controller to adjust the process functionality until the measured value reaches the expected value.

摘要翻译： 一种改进的系统和方法，用于获得与通常从米和量规获得的模拟测量数据转换为数字数据的处理系统的操作相关的数据。 收集各种类型的测量仪器的视觉图像并用于测量过程功能。 图像传感器提供测量仪器的第一特征的图像。 图像数据由图像处理器处理，图像处理器可操作以检测第一特征并确定其相对于测量仪器的第二特征的位置。 然后可以将相对位置（测量距离）的差异与预定值或预期值进行比较。 如果测量值和期望值基本上不相同，则可以产生指示控制器调整过程功能直到测量值达到预期值的信号。

公开(公告)号：US06376806B2

公开(公告)日：2002-04-23

申请号：US09910298

申请日：2001-07-20

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： A21B100

CPC分类号： H01L21/67115 ,  C30B31/12 ,  H05B3/0047

摘要： A system for uniformly and controllably heating the active surface of a semiconductor wafer or substrate during processing. The present invention may include a radiation energy source provided, which is enclosed or substantially surrounded by a reflective/absorptive surface, which both reflects and absorbs the radiation, emitted from the energy source. In accordance with the present invention, the resultant energy output as seen by the wafer is substantially free of non-uniformity.

摘要翻译： 一种用于在加工期间均匀且可控地加热半导体晶片或基板的有源表面的系统。 本发明可以包括提供的辐射能源，其被反射/吸收表面包围或基本上包围，所述反射/吸收表面反射和吸收从能量源发射的辐射。 根据本发明，如晶片所见的合成能量输出基本上没有不均匀性。

公开(公告)号：US06349546B1

公开(公告)日：2002-02-26

申请号：US09656584

申请日：2000-09-06

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： F17C902

CPC分类号： F28F27/00 ,  C30B25/10 ,  F17C13/045 ,  F17C2221/014 ,  F17C2223/0161 ,  F17C2223/033 ,  F17C2225/0123 ,  F17C2225/035 ,  F17C2225/036 ,  F17C2227/0316 ,  F17C2250/032 ,  F17C2270/0518 ,  F28D2021/0077 ,  F28F1/14 ,  F28F9/26

摘要： A heat exchanger is used to transfer heat from water to liquid nitrogen. As heat is transferred from the water to the liquid nitrogen, the temperature of the water becomes lower and the liquid nitrogen converts to gaseous nitrogen. The cooled water and gaseous nitrogen are used by one or more semiconductor fabrication equipment in the semiconductor fabrication process. Thus, overall power consumption of the semiconductor fabrication process is lowered because water is cooled by passing the water by liquid nitrogen to convert the liquid nitrogen to gaseous nitrogen for use in the semiconductor fabrication process.

摘要翻译： 使用热交换器将水从水转移到液氮。 当热量从水转移到液氮时，水的温度变低，液氮转化为气态氮。 冷却的水和气态氮在半导体制造工艺中由一个或多个半导体制造设备使用。 因此，半导体制造工艺的整体功耗降低，因为通过使液氮通过水来冷却水而将液氮转化为气态氮以用于半导体制造工艺。

公开(公告)号：US06271459B1

公开(公告)日：2001-08-07

申请号：US09558522

申请日：2000-04-26

申请人： Woo Sik Yoo

发明人： Woo Sik Yoo

IPC分类号： H01L3500

CPC分类号： H01L35/00

摘要： A semiconductor processing system and method, which uses heat energy typically wasted in most common semiconductor processing systems, to generate power. The present invention includes a heat management system, which uses the waste heat and/or the excess heat generated by a thermal-processing chamber, to generate a current from a first thermoelectric device. The current from the first thermoelectric device is then delivered to a second thermoelectric device. The second thermoelectric device, driven by the current from the first thermoelectric device, can be used to remove heat from a cooling chamber or else add heat to another processing chamber.

摘要翻译： 使用通常在大多数常见半导体处理系统中浪费的热能的半导体处理系统和方法来产生功率。 本发明包括使用由热处理室产生的废热和/或多余热量的热管理系统，从第一热电装置产生电流。 然后将来自第一热电装置的电流输送到第二热电装置。 由第一热电装置的电流驱动的第二热电装置可用于从冷却室中除去热量，或者将热量加热到另一处理室。