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公开(公告)号:US11931935B2
公开(公告)日:2024-03-19
申请号:US17804939
申请日:2022-06-01
申请人: XTPL S.A.
发明人: Jolanta Gadzalińska , Łukasz Witczak , Aneta Wiatrowska , Karolina Fia̧zyk , Piotr Kowalczewski , Filip Granek
CPC分类号: B29C45/14344 , B29C45/0001 , B29C45/0053 , B29C45/1657 , B29C45/20 , B29C2045/0075 , B29C2045/0094 , B29K2077/00
摘要: A method of filling a microcavity with layers of a polymer material includes the following steps: (A) estimating a current vertical position of a bottom of the microcavity (current bottom position); (B) lowering the capillary tube into the microcavity towards the current bottom position; (C) dispensing a polymer composition from a tube outlet of the capillary tube under a dispensing applied pressure until the polymer composition substantially fills the microcavity; (D) curing a work piece including the microcavity and the polymer composition in the microcavity to obtain a current layer of the polymer material; and (E) repeatedly executing steps (A), (B), (C), and (D), until the layers of the polymer material have substantially filled the microcavity.
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2.
公开(公告)号:US12082347B2
公开(公告)日:2024-09-03
申请号:US18345175
申请日:2023-06-30
申请人: XTPL S.A.
IPC分类号: H05K3/12
CPC分类号: H05K3/1241
摘要: A method for printing traces on a substrate and an additive manufacturing apparatus therefor are provided. The method comprises determining at least two first location points for a first trace and at least two second location points for a second trace. The first trace and the second trace traverse at least two surfaces of the substrate, including a first surface of the substrate and a second surface of the substrate. At least two third location points are determined for a third trace based on the at least two first location points and the at least two second location points. The third trace is intermediate the first trace and the second trace. The third trace is formed on the at least two surfaces based on the at least two third location points.
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3.
公开(公告)号:US11911814B2
公开(公告)日:2024-02-27
申请号:US17391633
申请日:2021-08-02
申请人: XTPL S.A.
发明人: Łukasz Witczak , Piotr Kowalczewski , Aneta Wiatrowska , Karolina Fia̧czyk , Łukasz Kosior , Filip Granek
CPC分类号: B21C23/005 , B22F3/20 , H01L33/62
摘要: A method of forming an elongate electrical connection feature that traverses at least one step on or in a substrate is disclosed. A metallic nanoparticle composition is extruded from a capillary tube while the capillary tube is displaced relative to the substrate. The method includes: (1) continuously extruding the composition from the capillary tube while displacing the capillary tube by a height increment during a displacement period; (2) continuously extruding the composition from the capillary tube while the capillary tube is stationary during a stationary period; and (3) repeatedly executing (1) and (2) until the capillary tube is displaced from a position at a step bottom portion to another position at a height not lower than a step top portion.
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公开(公告)号:US11490526B2
公开(公告)日:2022-11-01
申请号:US17265382
申请日:2019-08-01
申请人: XTPL S.A.
摘要: A method of forming a structure upon a substrate is disclosed. The method comprises: providing a substrate upon a surface of which a plurality of electrically conductive pads are disposed; depositing fluid containing a dispersion of electrically polarizable nanoparticles onto the substrate such that at least a portion of a first one of the plurality of pads is in contact with the fluid; applying an alternating electric field to the fluid using a first electrode and a second electrode, the first electrode being positioned so as to provide an effective first electrode end position from which the electric field is applied, coincident with the deposited fluid, and spaced apart from the first pad by a distance, and the second electrode being in contact with the first pad, such that a plurality of the nanoparticles are assembled to form a first elongate structure extending along at least part of the distance between the effective first electrode end position and the portion of the first pad.
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公开(公告)号:US11673406B2
公开(公告)日:2023-06-13
申请号:US17425638
申请日:2019-03-20
申请人: XTPL S.A.
发明人: Filip Granek , Aneta Wiatrowska , Krzysztof Fijak , Michal Dusza , Przemyslaw Cichon , Piotr Kowalczewski
IPC分类号: B41J2/175
CPC分类号: B41J2/17596
摘要: Method of printing fluid on a printable surface of a substrate. A print head ejects fluid in a continuous stream. The print head that includes a micro-structural fluid ejector, which consists of output, elongate input, and tapering portions between the output and the elongate input portions. The output consists of an exit orifice of an inner diameter ranging between 0.1 μm and 5 μm and an end face having a surface roughness of less than 0.1 μm. The print head is positioned above the substrate with the output of the micro-structural fluid ejector pointing downward. During printing, the print head positioning system maintains a vertical distance between the end face and the printable surface of the substrate within a range of 0 μm to 5 μm, and the pneumatic system applies pressure to the fluid in the micro-structural fluid ejector in the range of −50,000 Pa to 1,000,000 Pa.
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公开(公告)号:US11549026B2
公开(公告)日:2023-01-10
申请号:US17024512
申请日:2020-09-17
申请人: XTPL S.A.
IPC分类号: C09D11/033 , C09D11/52 , C09D11/106 , C09D11/037
摘要: A metallic nanoparticle composition includes copper nanoparticles, a first non-aqueous polar protic solvent (boiling point in a range of 180° C. to 250° C. and viscosity in a range of 10 cP to 100 cP at 25° C.), and a second non-aqueous polar protic solvent (boiling point in a range of 280° C. to 300° C. and a viscosity of at least 100 cP at 25° C.). The concentration of copper nanoparticles in the composition is in a range of 32 wt % to 55 wt %, and the concentration of the second non-aqueous polar protic solvent in the composition is in a range of 4 wt % to 10 wt %. There is polyvinylpyrrolidone present on the copper nanoparticles surfaces. The composition's viscosity is at least 250 cP at 25° C.
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公开(公告)号:US20220310397A1
公开(公告)日:2022-09-29
申请号:US17654088
申请日:2022-03-09
申请人: XTPL S.A.
发明人: Lukasz Witczak , Jolanta Gadzalinska , Aneta Wiatrowska , Karolina Fiaczyk , Piotr Kowalczewski , Filip Granek
IPC分类号: H01L21/288 , B82Y40/00 , B41M1/22 , H01B1/02
摘要: A method of forming an electrically conductive feature traversing a microscopic step on or in a substrate is disclosed. A metallic nanoparticle composition is continuously extruded from a capillary tube (nozzle) while displacing the capillary tube along a first portion of a trajectory from a first position (above a step-top portion) past an edge of the microscopic step to a second position to form a first extrudate. The composition is continuously extruded while displacing the nozzle along a sloped second portion of the trajectory from the second position to a third position (above a step-bottom portion) to form a second extrudate. The third position is at a lower height than the second position. The composition is continuously extruded while displacing the nozzle along a third portion of the trajectory from the third position to a fourth position (above the step-bottom portion). The feature includes the first, second, and third extrudates.
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公开(公告)号:US12128477B2
公开(公告)日:2024-10-29
申请号:US17646333
申请日:2021-12-29
申请人: XTPL S.A.
IPC分类号: B05B1/00 , B22F1/054 , B22F1/0545 , B22F1/107 , B22F10/10 , B22F10/32 , B33Y10/00 , B33Y70/10 , B33Y80/00
CPC分类号: B22F10/10 , B05B1/00 , B22F1/0545 , B22F1/0547 , B22F1/107 , B22F10/32 , B33Y10/00 , B33Y70/10 , B33Y80/00 , B22F2301/10 , B22F2301/255 , B22F2304/05
摘要: An additive method of forming a metallic nanoparticle microdot on a substrate is disclosed. The method includes: (A) estimating or obtaining a position of an outlet of a capillary tube at zero height above the substrate (zero-height position); (B) extruding a metallic nanoparticle composition from the outlet at a first height h1 above the zero-height position, including forming a fluid bridge between the outlet and the substrate; (C) optionally lifting the capillary tube relative to the substrate by a height increment of Dh while continuing to extrude the metallic nanoparticle composition from the outlet; and (D) rapidly lifting the capillary tube to separate the outlet from the fluid bridge.
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公开(公告)号:US11905591B2
公开(公告)日:2024-02-20
申请号:US17202226
申请日:2021-03-15
申请人: XTPL S.A.
IPC分类号: C23C14/35 , C23C14/08 , C04B35/457
CPC分类号: C23C14/35 , C04B35/457 , C23C14/086 , C04B2235/3293
摘要: A method of decreasing a sheet resistance of a transparent conductor is disclosed. The method includes the following: forming a first transparent conductor layer on a substrate; dispensing a metallic nanoparticle composition on the first transparent conductor layer to form metallic nanoparticle features; and sintering at least the first transparent conductor layer and the metallic nanoparticle features. The first transparent conductor layer includes a crystalline metal oxide. The aperture ratio of the transparent conductor is in a range of 90% to 99%.
A multilayer transparent conductor and a method of forming a multilayer transparent conductor are also disclosed.-
公开(公告)号:US11673409B2
公开(公告)日:2023-06-13
申请号:US17425610
申请日:2019-03-20
申请人: XTPL S.A.
发明人: Filip Granek , Aneta Wiatrowska , Krzysztof Fijak , Michal Dusza , Przemyslaw Cichon , Piotr Kowalczewski
CPC分类号: B41J3/28 , B41J2/04505 , B41J2/17596
摘要: Fluid printing apparatus including substrate, print head, pneumatic system, and print head positioning system. The print head ejects fluid in a continuous stream with a micro-structural fluid ejector consisting of output, elongate input, and tapering portions between the output and elongate input portions. The output portion consists of an exit orifice of an inner diameter ranging between 0.1 μm and 5 μm and an end face having a surface roughness of less than 0.1 μm. The print head is positioned above the substrate with the output portion of the micro-structural fluid ejector pointing downward. During printing, the print head positioning system maintains a vertical distance between the end face and the printable surface of the substrate within a range of 0 μm to 5 μm, and the pneumatic system applies pressure to the fluid in the micro-structural fluid ejector in the range of −50,000 Pa to 1,000,000 Pa.
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