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    Imprint lithography template having opaque alignment marks
    3.
    发明授权
    Imprint lithography template having opaque alignment marks 有权
    具有不透明对准标记的压印光刻模板

    公开(公告)号：US07136150B2

    公开(公告)日：2006-11-14

    申请号：US10670980

    申请日：2003-09-25

    申请人： Sidlgata V. Sreenivasan ,  Philip D. Schumaker

    发明人： Sidlgata V. Sreenivasan ,  Philip D. Schumaker

    IPC分类号： G03B27/62 ,  G03B27/58

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00

    摘要： The present invention is directed to providing a template with alignment marks that are opaque to selective wavelength of light. In one embodiment, a template is provided having patterning areas and a template, with the template mark being formed from metal and disposed outside of the patterning areas. The alignment marks may be surrounded by a moat to prevent curable liquid from being in superimposition therewith during imprinting. In this manner, opaque alignment marks may be employed without degrading the quality of the pattern formed during imprinting.

    摘要翻译： 本发明旨在提供一种具有对选择性波长的光不透明的对准标记的模板。 在一个实施例中，提供具有图案化区域和模板的模板，其中模板标记由金属形成并且设置在图案化区域的外部。 对准标记可以由护城河包围，以防止可印刷过程中可固化液体与其重叠。 以这种方式，可以使用不透明的对准标记而不降低在压印期间形成的图案的质量。

    Drop Deposition Control
    6.
    发明申请
    Drop Deposition Control 审中-公开
    滴沉积控制

    公开(公告)号：US20100104747A1

    公开(公告)日：2010-04-29

    申请号：US12579569

    申请日：2009-10-15

    申请人： Van Nguyen Truskett ,  Philip D. Schumaker ,  Jared L. Hodge ,  Kang Luo ,  Bharath Thiruvengadachari

    发明人： Van Nguyen Truskett ,  Philip D. Schumaker ,  Jared L. Hodge ,  Kang Luo ,  Bharath Thiruvengadachari

    IPC分类号： B05D7/22

    CPC分类号： H05K3/125 ,  H01L51/0005 ,  H05K3/0008 ,  H05K2203/163

    摘要： A dispense controller and a tool controller may aid in providing a drop pattern of fluid on a substrate. The dispense controller may provide dispense coordinates to a fluid dispense system based on the drop pattern. The tool controller may control movement of a stage and also provide synchronization pulses to the fluid dispense system. The fluid dispense system may provide the drop pattern of fluid on the substrate using the dispense coordinates and the synchronization pulses.

    摘要翻译： 分配控制器和工具控制器可以有助于在衬底上提供液体滴落图案。 分配控制器可以基于滴液模式向流体分配系统提供分配坐标。 工具控制器可以控制平台的移动并且还向流体分配系统提供同步脉冲。 流体分配系统可以使用分配坐标和同步脉冲在衬底上提供流体的液滴模式。

    ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT
    7.
    发明申请
    ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT 有权
    可靠地优化生成缩略图的缩略图，它们是容忍变化和倾斜放置的变化

    公开(公告)号：US20100097590A1

    公开(公告)日：2010-04-22

    申请号：US12579553

    申请日：2009-10-15

    申请人： Philip D. Schumaker

    发明人： Philip D. Schumaker

    IPC分类号： G03B27/42 ,  H04N1/60

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using a stochastic process such as a Monte Carlo or structured experiment over the expected range of process variability for drop locations and drop volumes. Thus, variability in drop placement, volume, or both may be compensated for, resulting in surface features being substantially filled with the fluid during imprint.

    摘要翻译： 压印平版印刷术可以包括产生流体图，产生流体液滴图案，以及根据流体液滴图案将流体施加到基底。 可以使用诸如蒙特卡罗之类的随机过程或在落下位置和下降体积的预期工艺变化范围内进行结构化实验来产生流体液滴图案。 因此，可以补偿液滴位置，体积或两者的变化性，导致表面特征在压印期间基本上被流体填充。

    System to transfer a template transfer body between a motion stage and a docking plate
    8.
    发明授权
    System to transfer a template transfer body between a motion stage and a docking plate 有权
    在运动台和对接板之间传送模板转印体的系统

    公开(公告)号：US07665981B2

    公开(公告)日：2010-02-23

    申请号：US11211766

    申请日：2005-08-25

    申请人： Philip D. Schumaker ,  Angelo Fancello ,  Jae H. Kim ,  Byung-Jin Choi ,  Daniel A. Babbs

    发明人： Philip D. Schumaker ,  Angelo Fancello ,  Jae H. Kim ,  Byung-Jin Choi ,  Daniel A. Babbs

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707

    摘要： The present is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.

    摘要翻译： 本发明涉及一种压印光刻系统，其特别包括对接板; 具有与其相关联的运动范围的运动台，所述运动范围具有与所述对接板间隔开的第一距离的周边; 以及主体，其具有间隔开第二距离的第一和第二相对侧，其选择性地联接在所述对接板和所述运动台之间，所述第一距离大于所述第二距离以最小化对接板之间的碰撞概率， 运动台和身体，同时在对接板和运动台之间转移身体。

    Efficient method for modeling and simulation of the impact of local and global variation on integrated circuits
    10.
    发明授权
    Efficient method for modeling and simulation of the impact of local and global variation on integrated circuits 有权
    用于建模和模拟局部和全局变化对集成电路影响的高效方法

    公开(公告)号：US06978229B1

    公开(公告)日：2005-12-20

    申请号：US09675427

    申请日：2000-09-29

    申请人： Sharad Saxena ,  Carlo Guardiani ,  Philip D. Schumaker ,  Patrick D. McNamara ,  Dale Coder

    发明人： Sharad Saxena ,  Carlo Guardiani ,  Philip D. Schumaker ,  Patrick D. McNamara ,  Dale Coder

    IPC分类号： G06F17/50 ,  H01L21/66 ,  G06G7/48

    CPC分类号： H01L22/20 ,  G06F17/5036 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A computer implemented method for statistical modeling and simulation of the impact of global variation and local mismatch on the performance of integrated circuits, comprises the steps of: estimating a representation of component mismatch from device performance measurements in a form suitable for circuit simulation; reducing the complexity of statistical simulation by performing a first level principal component or principal factor decomposition of global variation, including screening; further reducing the complexity of statistical simulation by performing a second level principal component decomposition including screening for each factor retained in the first level principal component decomposition step to represent local mismatch; and performing statistical simulation with the joint representation of global variation and local mismatch obtained in the second level principal component decomposition step.

    摘要翻译： 用于对全局变化和局部失配对集成电路性能的影响进行统计建模和仿真的计算机实现方法包括以下步骤：以适于电路仿真的形式从设备性能测量中估计组件失配的表示; 通过执行全局变化的一级主成分或主因子分解（包括筛选）来降低统计模拟的复杂性; 通过执行第二级主成分分解进一步降低统计模拟的复杂性，包括筛选保留在第一级主成分分解步骤中的每个因子以表示局部不匹配; 并且在第二级主成分分解步骤中获得的全局变化和局部失配的联合表示来执行统计模拟。