摘要:
A method for concurrent migration and decomposition of an integrated circuit layout applicable to double patterning lithography techniques is provided. The method includes cutting a sub-pattern of an initial pattern to configure a potentially conflicting pattern having separate or cutting sections; removing odd cycles in the potential conflicting pattern so as to cut the separate or cutting sections; configuring the double patterning constraint based upon corresponding location relations between each and adjacent cut sections; and assigning a first color layer or a second color layer to the cut sections according to the double patterning constraint to obtain a final layout pattern. Therefore, disadvantageous factors and patterning conflicts caused by separate processes as encountered in the prior art are avoided.
摘要:
A memory array includes a charge storage structure and a plurality of conductive materials over the charge storage structure is provided. Each conductive material, serving as a word line, has a substantially arc-sidewall and a substantially straight sidewall.
摘要:
A system and method for manufacturing a semiconductor device is provided. An embodiment comprises forming a deposited layer using an atomic layer deposition (ALD) process. The ALD process may utilize a first precursor for a first time period, a first purge for a second time period longer than the first time period, a second precursor for a third time period longer than the first time period, and a second purge for a fourth time period longer than the third time period.
摘要:
A terminal device receives a called telephone number inputted by a user. The terminal device generates a called domain name corresponding to the called telephone number according to a predefined rule, and queries the DDNS server for a called IP address that corresponds to the called domain name. The terminal device exchanges VoIP signaling with a called terminal device according to the called IP address when the called IP address is successfully queried from the DDNS server.
摘要:
A non-volatile memory and a manufacturing method thereof and a method for operating a memory cell are provided. The non-volatile memory includes a substrate, first and second doped regions, a charged-trapping structure, first and second gates and an inter-gate insulation layer. The first and second doped regions are disposed in the substrate and extend along a first direction. The first and second doped regions are arranged alternately. The charged-trapping structure is disposed on the substrate. The first and second gates are disposed on the charged-trapping structure. Each first gate is located above one of the first doped regions. The second gates extend along a second direction and are located above the second doped regions. The inter-gate insulation layer is disposed between the first gates and the second gates. Adjacent first and second doped regions and the first gate, the second gate and the charged-trapping structure therebetween define a memory cell.
摘要:
A method of operating an all-fiber-based ultra short pulse laser system is provided. The steps includes providing an all-fiber-based ultra short pulse laser system having a pulse pump light source, a fiber saturable absorber, an assistant light source, at least a dispersion fiber, and a light coupling output; generating a broadband ASE via the pulse pump light source; making the all-fiber-based ultra short pulse laser system switch passive mode locking via the fiber saturable absorber; decreasing the restoring period of the fiber saturable absorber via the assistant light source; providing dispersion compensation via the dispersion fiber to output an ultra short pulse; and partially outputting a laser passing through the all-fiber-based ultra short pulse laser system via the light coupling output.
摘要:
A semiconductor device including a first doped region of a first conductivity type, a second doped region of a second conductivity type, a gate, and a dielectric layer is provided. The first doped region is located in a substrate and has a trench. The second doped region is located at the bottom of the trench to separate the first doped region into a source doped region and a drain doped region. A channel region is located between the source doped region and the drain doped region. The gate is located in the trench. The dielectric layer covers the sidewall and the bottom of the trench and separates the gate and the substrate.
摘要:
A placer produces a global placement plan specifying positions of cell instances and orientations of macros within an integrated circuit (IC) by initially clusterizing cell instances and macros to form a pyramidal hierarchy of blocks. Then the placer iteratively repeats the declusterization and routability improvement process from the highest level to the lowest level of the hierarchy. An objective function is provided in Cartesian coordinate for representing the position of each movable instance and in polar coordinate for representing the orientation of a macro relative to its the center. For each movable instance and each rotatable macro, its position or orientation is determined by conjugate gradient method to minimize total wire length. Finally, the placer uses a look-ahead legalization technique to rotate rotatable macros to legal orientations and move cell instances to legal positions in the end of global placement.
摘要:
A packet forwarding device stores a predetermined threshold and a predetermined condition value of a first wide area network (WAN) port, and forwards packets that comply with the predetermined condition value via the first WAN port and forwards packets that do not comply with the predetermined condition value via a second WAN port. The packet forwarding device forwards some of the packets that do not comply with the predetermined condition value via the first WAN port in order to balance loads of the first and second WAN ports if the traffic value of the packets forwarded via the first WAN port is equal to or less than the predetermined threshold.
摘要:
A method for programming a multi-level cell and a memory apparatus are described, wherein each cell has two storage sites. The method includes making the first storage site have a first Vt level and the second storage site have a second Vt level. The first Vt level is selected from M Vt levels. When the first Vt level is the i-th level among the M Vt levels, the second Vt level is selected from ni Vt levels, wherein at least one ni is not equal to ni-1 (2≦i≦M). The multi-level cell has P storage states, wherein P = ∑ i = 1 M n i . The memory apparatus includes multiple multi-level cells and an operation circuit capable of performing the above method.