公开(公告)号：US06872952B2

公开(公告)日：2005-03-29

申请号：US09819906

申请日：2001-03-29

申请人： Yasuhiro Shimada ,  Takayuki Yagi ,  Haruhito Ono ,  Hiroshi Maehara

发明人： Yasuhiro Shimada ,  Takayuki Yagi ,  Haruhito Ono ,  Hiroshi Maehara

IPC分类号： G03F7/20 ,  G21K1/087 ,  H01J9/14 ,  H01J37/04 ,  H01J37/12 ,  H01J37/305 ,  H01L21/027 ,  H01J37/302

CPC分类号： G21K1/087

摘要： This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrode structures which are arranged along the paths of a plurality of charged-particle beams and have pluralities of apertures on the paths of the plurality of charged-particle beams. At least one of the plurality of electrode structures includes a substrate having a plurality of apertures for transmitting the plurality of charged-particle beams, and a plurality of electrodes extending from the side surfaces of the plurality of apertures to the peripheries of the plurality of apertures. At least the surface of the substrate is insulated.

摘要翻译： 本发明涉及具有多个电子透镜的电子光学系统阵列。 电子光学系统阵列包括沿着多个带电粒子束的路径布置并在多个带电粒子束的路径上具有多个孔的多个电极结构。 多个电极结构中的至少一个包括具有多个用于透射多个带电粒子束的孔的基板和从多个孔的侧表面延伸到多个孔的周边的多个电极 。 至少衬底的表面是绝缘的。

公开(公告)号：US06603128B2

公开(公告)日：2003-08-05

申请号：US09842120

申请日：2001-04-26

申请人： Hiroshi Maehara ,  Haruhito Ono ,  Yasuhiro Shimada ,  Takayuki Yagi

发明人： Hiroshi Maehara ,  Haruhito Ono ,  Yasuhiro Shimada ,  Takayuki Yagi

IPC分类号： H01J3700

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J37/3174

摘要： A correction electron optical system (3) has substrates in which apertures for constituting electron lenses are formed. Valves (14) whose opening degrees can be adjusted are used to relax the pressure difference between the upper and lower surfaces of each substrate caused when supply/exhaust pumps (51-56) adjust the internal pressure of a main body cover (80). The opening degrees are controlled based on outputs from differential pressure sensors (13). The pressure sensors (13) can be replaced with photosensors.

公开(公告)号：US07009007B2

公开(公告)日：2006-03-07

申请号：US10443089

申请日：2003-05-22

申请人： Hiroshi Maehara ,  Chieko Mihara ,  Yoshihiko Kikuchi

发明人： Hiroshi Maehara ,  Chieko Mihara ,  Yoshihiko Kikuchi

IPC分类号： C08C19/22 ,  C08C19/30 ,  C08C19/34

CPC分类号： C08J11/10 ,  C08F8/14 ,  C08F8/32 ,  C08F2810/40 ,  C08G81/021 ,  Y02W30/702 ,  C08F112/08

摘要： A novel resin is provided, which is renewable with less energy. A process for renewing the resin is also provided. The present invention includes a polymer having the repeating unit represented by Structural Formula (1) [—P1—R—]n (1). In the formula, P1 indicates an addition polymer moiety having a continuous hydrocarbon chain as the skeleton containing no condensation system, and is a polymer or oligomer prepared by addition polymerization of one or more monomers having a double bond; R indicates a linking group constituted of a condensation system for linking the polymer moieties P; and n is a number of repeating units and is an integer of 2 or more.

摘要翻译： 提供了一种新颖的树脂，可以以更少的能量再生。 还提供了更新树脂的方法。 本发明包括具有由结构式（1）表示的重复单元的聚合物[-P 1→R 1] n（1）。 在该式中，P 1'表示具有连续烃链作为不含缩合体系的骨架的加成聚合物部分，是通过一种或多种具有双键的单体的加成聚合制备的聚合物或低聚物 ; R表示由用于连接聚合物部分P的缩合体系构成的连接基团; n为重复单元数，为2以上的整数。

公开(公告)号：US06728332B2

公开(公告)日：2004-04-27

申请号：US09970826

申请日：2001-10-05

申请人： Keiko Chiba ,  Masami Tsukamoto ,  Yutaka Watanabe ,  Shinichi Hara ,  Hiroshi Maehara

发明人： Keiko Chiba ,  Masami Tsukamoto ,  Yutaka Watanabe ,  Shinichi Hara ,  Hiroshi Maehara

IPC分类号： G21K300

CPC分类号： G03F1/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

摘要： An exposure method for transferring a pattern of a mask onto a member to be exposed. The method includes the steps of making preparations for exposure while a protection cover is attached to the mask, executing alignment between the member to be exposed and the mask while the protection cover is detached from the mask, and executing exposure with X-rays while the protection cover is detached from the mask.

摘要翻译： 一种用于将掩模图案转印到要曝光的构件上的曝光方法。 该方法包括以下步骤：当保护盖附着到掩模上时，进行曝光准备，在保护盖与掩模分离的同时执行被曝光元件与掩模之间的对准，并且执行X射线曝光 防护罩与面罩分离。

公开(公告)号：US6087076A

公开(公告)日：2000-07-11

申请号：US968589

申请日：1997-11-13

申请人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

发明人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/0048

摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.

摘要翻译： 一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有 抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。 涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

公开(公告)号：US6008942A

公开(公告)日：1999-12-28

申请号：US997704

申请日：1997-12-23

申请人： Makoto Ogusu ,  Hiroshi Maehara ,  Keita Sakai

发明人： Makoto Ogusu ,  Hiroshi Maehara ,  Keita Sakai

IPC分类号： G02B5/18 ,  G02B27/44

CPC分类号： G02B5/1866

摘要： A diffractive optical element for diffracting non-collimated light includes a base surface and a periodic structure formed on the base surface and having a plurality of diffractive surfaces and a plurality of boundary surfaces. The boundary surfaces are separated into plural zones, and in each zone, the boundary surface is placed substantially parallel to a main portion of a light beam impinging on that zone.

摘要翻译： 用于衍射非准直光的衍射光学元件包括形成在基底表面上并具有多个衍射面和多个边界面的基底表面和周期性结构。 边界表面被分成多个区域，并且在每个区域中，边界表面基本上平行于入射到该区域上的光束的主要部分。

公开(公告)号：US5485495A

公开(公告)日：1996-01-16

申请号：US286904

申请日：1994-08-08

申请人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

发明人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K5/04 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F1/22 ,  G03F7/70783 ,  G21K5/04

摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

摘要翻译： 制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。 在两个步骤中，掩模基板保持由于翘曲量而获得的形状。 由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。 因此，提供了适合于非常精确的曝光的X射线掩模。

公开(公告)号：US07295357B2

公开(公告)日：2007-11-13

申请号：US10537413

申请日：2004-04-19

申请人： Hiroshi Maehara

发明人： Hiroshi Maehara

IPC分类号： G02B5/32

CPC分类号： G03H1/0005 ,  G03H1/0244 ,  G03H1/2205 ,  G03H2001/0077 ,  G03H2001/0478 ,  G03H2001/085 ,  G03H2001/221 ,  G03H2210/55

摘要： An apparatus for handling a minute object such as a cell by using a holographic optical tweezers that comprises a laser light source 1, holographic plate 3 having a specified pattern to form a hologram with light emitted from the light source, and a transparent plate that holds a liquid including a minute object, wherein the holographic plate 3 is irradiated with laser light emitted from the laser light source 1, and the laser light passed through the holographic plate 3 is focused in a sample solution 7 held on the transparent plate 6 to form a hologram having a pattern according to the pattern of the holographic plate 3 in the sample solution 7.

摘要翻译： 一种用于通过使用全息光学镊子来处理诸如单元的微小物体的装置，其包括激光光源1，具有指定图案的全息板3，以从光源发射的光形成全息图;以及透明板，其保持 包含微小物体的液体，其中，从激光光源1发射的激光照射全息板3，并且穿过全息板3的激光聚焦在保持在透明板6上的样品溶液7中，以形成 具有根据样品溶液7中的全息板3的图案的图案的全息图。

公开(公告)号：US07122297B2

公开(公告)日：2006-10-17

申请号：US10942890

申请日：2004-09-17

申请人： Hiroshi Maehara

发明人： Hiroshi Maehara

IPC分类号： G03F7/04 ,  G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

摘要： There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.

摘要翻译： 提供了至少含有具有糖结构的聚合物化合物的感光性树脂组合物，其具有在酸存在下可分离的官能团中的至少两种，通过电磁波的放射产生酸的光酸反应器，或 带电粒子束，另外还有抗蚀剂组合物，制造用于制造半导体器件的图案化衬底的方法等，以及诸如高度集成的半导体等的器件。

公开(公告)号：US06317274B1

公开(公告)日：2001-11-13

申请号：US09533691

申请日：2000-03-23

申请人： Hideo Kato ,  Hiroshi Maehara

发明人： Hideo Kato ,  Hiroshi Maehara

IPC分类号： G02B308

CPC分类号： G03F7/70058 ,  G02B5/1866 ,  G02B5/1876 ,  G03F7/70216

摘要： An optical element includes a first substrate having a diffractive surface or a surface structure with a surface level difference, a second substrate for covering the diffractive surface or the surface structure to provide a shield therefor, and a groove provided at the diffractive surface or the surface structure, and extending from a central portion to a peripheral portion thereof, for discharging or replacing a gas at the diffractive surface or the surface structure therethrough.

摘要翻译： 光学元件包括具有衍射面或具有表面水平差的表面结构的第一衬底，用于覆盖衍射表面或表面结构以提供其屏蔽的第二衬底，以及设置在衍射表面或表面处的凹槽 结构，并且从中心部分延伸到其周边部分，用于排出或替换通过其中的衍射表面或表面结构处的气体。