摘要:
A sifter frame is composed of a pair of frame elements including an outer frame and an inner frame, and the outer frame is formed from a frame member having the same height and includes a pair of fine powder dropping ports, a rough powder dropping port and a rectangular fine powder receiving plate disposed in a region surrounded by these openings and one of the outer block frame members and the inner frame is fitted with the space above the receiving plate. A pair of the outer frame members of the inner frame in contact with the fine powder dropping ports of the inner frame are projected more to the rough powder dropping port than the outer block frame members of the inner frame in contact with the rough powder dropping port of the outer frame, receiving portions are provided with the outer frame in correspondence with the above arrangement so that the projected portions of the inner frame are placed thereon as well as the surfaces where the projected portions are engaged with the receiving portions are formed to an arc shape in order to that a depressing force of an upper stage sifter frame is applied to the engaging surfaces where the inner frame of a lower stage sifter frame is engaged with the outer frame thereof as a sealing force. With the above arrangement, there is provided a novel stacking type sifter frame by which the mixture of rough powder with fine powder can be securely prevented while limiting a portion to be periodicially replaced to a minimum necessary portion.
摘要:
A sifter frame is composed of a pair of frame elements including an outer frame and an inner frame, and the outer frame is formed from a frame member having the same height and includes a pair of fine powder dropping ports, a rough powder dropping port and a rectangular fine powder receiving plate disposed in a region surrounded by these openings and one of the outer block frame members and the inner frame is fitted with the space above the receiving plate. A pair of the outer frame members of the inner frame in contact with the fine powder dropping ports of the inner frame are projected more to the rough powder dropping port than the outer block frame members of the inner frame in contact with the rough powder dropping port of the outer frame, receiving portions are provided with the outer frame in correspondence with the above arrangement so that the projected portions of the inner frame are placed thereon as well as the surfaces where the projected portions are engaged with the receiving portions are formed to an arc shape in order to that a depressing force of an upper stage sifter frame is applied to the engaging surfaces where the inner frame of a lower stage sifter frame is engaged with the outer frame thereof as a sealing force. With the above arrangement, there is provided a novel stacking type sifter frame by which the mixture of rough powder with fine powder can be securely prevented while limiting a portion to be periodically replaced to a minimum necessary portion.
摘要:
A high-shear melt-kneader includes a high-shear unit (20) having an internal feedback-type screw (23) configured to apply high-shear stress to a melted resin, resin pressure sensors (33) for configured to detect a front portion resin pressure in the vicinity of an inlet of the internal feedback-type screw and a rear portion resin pressure in the vicinity of an outlet, and a control device configured to appropriately control a material supplying amount, a material temperature, a kneading time, and a screw rotation speed according to pressure values detected by the sensors. The control device controls the conditions such that waveforms with the lapse of time of the front and rear portion resin pressures are similar to each other and show variation to a steady state after formation of a predetermined peak value, and the front and rear portion resin pressures form a predetermined pressure difference with the lapse of time. According to the high-shear melt-kneader, it is possible to improve high-shear efficiency, increase precision of nano dispersion of a material, and stably and finely disperse/mix internal structures of immiscible polymer blend-based, polymer/filler-based and polymer blend/filler-based materials to a nano level.
摘要:
To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.
摘要:
Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要:
An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要:
To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.
摘要:
The present intention intends to operate an ejector which carries out gate cut and product ejection in an injection molding machine, at optimal speeds, respectively. According to the present invention, a control unit for controlling hydraulic or electric drive means for operating one or more than one ejector pin comprises operation speed setting means for gate cut and another operation speed setting means for product ejection. Such a structure enables to carry out gate cut by operating an ejector unit controlled by an ejector unit operation speed setting means for a gate cut and, subsequently, to carry out a product ejection from metallic molds by operating the ejector unit controlled by another ejector unit operation speed setting means for product ejection. The ejector unit is set at a comparatively high operation speed for gate cut so that no gate trace will remain, and at a comparatively low operation speed for product ejection so that no cracks will be generated in the product.
摘要:
Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要:
An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.