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78 条记录 (耗时 0.033 秒)

    Exhaust pipe
    3.
    发明授权
    Exhaust pipe 有权
    排气管

    公开(公告)号：US08844576B2

    公开(公告)日：2014-09-30

    申请号：US12447272

    申请日：2008-06-19

    申请人： Yasutaka Ito ,  Jin Wakamatsu

    发明人： Yasutaka Ito ,  Jin Wakamatsu

    IPC分类号： F15D1/02 ,  C23C26/00 ,  C23C24/00 ,  C23C24/10 ,  F01N13/16 ,  F01N13/14 ,  C23C24/08 ,  F01N13/08

    CPC分类号： F01N13/08 ,  C23C24/00 ,  C23C24/08 ,  C23C24/10 ,  C23C26/00 ,  F01N13/141 ,  F01N13/16 ,  F01N2240/02

    摘要： An object of the present invention is to provide an exhaust pipe in which a peeling of a constituent member does not occur and reliability thereof is excellent, and an exhaust pipe allowing exhaust gases to flow through the exhaust pipe of the present invention includes a heat-releasing layer containing a crystalline inorganic material and an amorphous inorganic material and having infrared emissivity higher than infrared emissivity of a base, wherein irregularities are formed on a surface of the base on which the heat-releasing layer is to be formed.

    摘要翻译： 本发明的目的是提供一种排气管，其中不会发生构成构件的剥离，并且其可靠性优异，并且允许废气流过本发明的排气管的排气管包括： 包含结晶无机材料和无定形无机材料并且具有高于基底的红外发射率的红外发射率的释放层，其中在要形成所述散热层的基底的表面上形成不规则性。

    Rotating anode X-ray tube
    4.
    发明授权
    Rotating anode X-ray tube 有权
    旋转阳极X射线管

    公开(公告)号：US07697665B2

    公开(公告)日：2010-04-13

    申请号：US12469254

    申请日：2009-05-20

    申请人： Tetsuya Yonezawa ,  Hironori Nakamuta ,  Ryoichi Takahashi ,  Yasuo Yoshii ,  Hitoshi Hattori ,  Yasutaka Ito

    发明人： Tetsuya Yonezawa ,  Hironori Nakamuta ,  Ryoichi Takahashi ,  Yasuo Yoshii ,  Hitoshi Hattori ,  Yasutaka Ito

    IPC分类号： H01J35/00

    CPC分类号： H01J35/106 ,  H01J2235/1006 ,  H01J2235/1046 ,  H01J2235/108 ,  H01J2235/1204 ,  H01J2235/1262

    摘要： A rotating anode X-ray tube includes a fixed body having a radial sliding bearing surface and a channel therein through which a coolant flows, a rotor including a discoid large-diameter portion, which has a recess fitted with one end portion of the fixed body with a clearance therebetween and constitutes an anode target, and a small-diameter portion, which has on an inner surface thereof a radial sliding bearing surface which faces the aforesaid radial sliding bearing surface with a clearance, and is united with the large-diameter portion at one end portion thereof, a lubricant filling the clearances, a cathode arranged opposite to the anode target, and a vacuum envelope which contains the fixed body, the rotor, the lubricant and the cathode, and fixes the fixed body at another end portion of the fixed body situated opposite the one end portion of the fixed body fitted in the recess.

    摘要翻译： 旋转阳极X射线管包括具有径向滑动轴承表面的固定体和冷却剂流过的通道，包括盘状大直径部分的转子，其具有与固定体的一个端部配合的凹部 并且构成阳极靶，小直径部分在其内表面上具有与所述径向滑动轴承表面间隙相对的径向滑动轴承表面，并与大直径部分 在其一端部分填充有间隙的润滑剂，与阳极靶相对的阴极，以及包含固定体，转子，润滑剂和阴极的真空外壳，并将固定体固定在另一端部 所述固定体位于与所述凹部中嵌合的所述固定体的一端部相对的位置。

    Hot plate
    5.
    发明申请
    Hot plate 审中-公开
    热板

    公开(公告)号：US20050258164A1

    公开(公告)日：2005-11-24

    申请号：US10901109

    申请日：2004-07-29

    申请人： Yasuji Hiramatsu ,  Yasutaka Ito

    发明人： Yasuji Hiramatsu ,  Yasutaka Ito

    IPC分类号： H05B3/20 ,  C04B35/581 ,  C04B35/584 ,  C23C14/50 ,  C23C16/46 ,  H01L21/00 ,  H05B3/10 ,  H05B3/14 ,  H05B3/16 ,  H05B3/18 ,  H05B3/68 ,  H05B3/74

    CPC分类号： H01L21/67103 ,  H05B3/143

    摘要： An object of the present invention is to provide a hot plate which is superior in thermal conductivity, is superior in temperature-rising/dropping property, particularly in temperature-dropping property, and has high cooling thermal efficiency at the time of cooling. The hot plate of the present invention is a hot plate comprising: a ceramic substrate; and a resistance heating element formed on the surface of said ceramic substrate or inside said ceramic substrate, wherein said ceramic substrate has a leakage quantity of 10−7 Pa·m3/sec (He) or less by measurement with a helium leakage detector.

    摘要翻译： 本发明的目的在于提供一种导热性优异，升温/滴下性优异，特别是降温性能的热板，在冷却时冷却效率高的热板。 本发明的热板是一种热板，包括：陶瓷基板; 以及形成在所述陶瓷基板的表面上或所述陶瓷基板的内部的电阻加热元件，其中所述陶瓷基板的泄漏量为10-7Pa·m 3 / 秒（He）或更小，通过用氦泄漏检测器测量。

    Ceramic heater for semiconductor manufacturing/testing apparatus
    6.
    发明授权
    Ceramic heater for semiconductor manufacturing/testing apparatus 有权
    用于半导体制造/测试仪器的陶瓷加热器

    公开(公告)号：US06897414B2

    公开(公告)日：2005-05-24

    申请号：US10069511

    申请日：2001-07-03

    申请人： Yasutaka Ito ,  Kazutaka Mashima

    发明人： Yasutaka Ito ,  Kazutaka Mashima

    IPC分类号： H01L21/00 ,  H05B3/14 ,  H05B3/26 ,  H05B3/68

    CPC分类号： H01L21/67103 ,  H05B3/143 ,  H05B3/265

    摘要： A ceramic beater for a semiconductor producing/examining device having a resistance heating element superior in adhesion to a substrate. The ceramic heater includes a ceramic substrate and a resistance heating element formed on the surface of the ceramic substrate. Further, irregularities are formed on the side face of the resistance heating element.

    摘要翻译： 一种用于半导体制造/检查装置的陶瓷打浆机，其具有与基板的粘附性优异的电阻加热元件。 陶瓷加热器包括形成在陶瓷基板表面上的陶瓷基板和电阻加热元件。 此外，在电阻加热元件的侧面上形成凹凸。

    Ceramic plate for a semiconductor producing/inspecting apparatus
    8.
    发明授权
    Ceramic plate for a semiconductor producing/inspecting apparatus 有权
    用于半导体制造/检查装置的陶瓷板

    公开(公告)号：US06884972B2

    公开(公告)日：2005-04-26

    申请号：US10311368

    申请日：2001-04-23

    申请人： Yasutaka Ito ,  Yasuji Hiramatsu

    发明人： Yasutaka Ito ,  Yasuji Hiramatsu

    IPC分类号： H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  H01L21/683 ,  H05B3/14 ,  H01B3/68

    CPC分类号： H01L21/6835 ,  H01L21/67103 ,  H01L21/6831 ,  H05B3/143

    摘要： A ceramic heater for a semiconductor producing/examining device including a ceramic substrate having a disc form with a diameter exceeding 200 mm and first and second surfaces, the first surface being a wafer-holding face and the second surface opposing to the first surface, the wafer-holding face being such that a semiconductor wafer is directly put on the wafer-holding face or held apart from the wafer-holding face by a supporting pin. The wafer-holding face has a surface roughness Rmax of 0.1 to 250 μm according to JIS R 0601, and a difference between the surface roughness of the wafer-holding face and surface roughness of the second surface is 50% or less.

    摘要翻译： 一种用于半导体制造/检查装置的陶瓷加热器，其包括具有直径超过200mm的盘形的陶瓷基板和第一和第二表面，所述第一表面是晶片保持面和与第一表面相对的第二表面， 晶片保持面使得半导体晶片直接放置在晶片保持面上或通过支撑销与晶片保持面保持分离。 根据JIS R 0601，晶片保持面的表面粗糙度Rmax为0.1〜250μm，晶片保持面的表面粗糙度与第二面的表面粗糙度之差为50％以下。

    Ceramic heater
    9.
    发明授权
    Ceramic heater 有权
    陶瓷加热器

    公开(公告)号：US06861620B2

    公开(公告)日：2005-03-01

    申请号：US10658454

    申请日：2003-09-10

    申请人： Yasutaka Ito ,  Yasuji Hiramatsu

    发明人： Yasutaka Ito ,  Yasuji Hiramatsu

    IPC分类号： H05B3/20 ,  H01L21/00 ,  H01L21/027 ,  H05B3/10 ,  H05B3/14 ,  H05B3/16 ,  H05B3/26 ,  H05B3/28 ,  H05B3/68 ,  H05B3/74 ,  H05B3/08

    CPC分类号： H01L21/67109 ,  H01L21/67103 ,  H05B3/143 ,  H05B3/265 ,  H05B3/283 ,  H05B3/74

    摘要： An object of the present invention is to provide a ceramic heater making it possible to suppress an outflow of heat to a supporting case and so on to make the temperature of its ceramic substrate uniform. The ceramic heater of the present invention is a ceramic heater wherein a heating element is arranged on a surface of a ceramic substrate or inside the ceramic substrate, the surface roughness Rmax of the side face of the ceramic substrate being from 0.1 to 200 μm according to JIS B 0601.

    摘要翻译： 本发明的目的是提供一种陶瓷加热器，其可以抑制热量向支撑壳体的流出等，以使陶瓷基板的温度均匀。 本发明的陶瓷加热器是陶瓷加热器，其中加热元件布置在陶瓷基片的表面或陶瓷基片的内部，陶瓷基片的侧面的表面粗糙度Rmax为0.1〜200μm，根据 JIS B 0601。