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    Low dielectric constant dielectric layer fabrication method employing hard mask layer delamination
    1.
    发明授权
    Low dielectric constant dielectric layer fabrication method employing hard mask layer delamination 失效
    采用硬掩模层分层的低介电常数介质层制造方法

    公开(公告)号：US06395631B1

    公开(公告)日：2002-05-28

    申请号：US09366751

    申请日：1999-08-04

    申请人： Yi Xu ,  Jian Xun Li

    发明人： Yi Xu ,  Jian Xun Li

    IPC分类号： H01L214763

    CPC分类号： H01L21/31116 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/76802 ,  H01L21/7688

    摘要： A method for forming, within a low dielectric constant dielectric layer formed upon a substrate employed within a microelectronics fabrication, a conductor pattern employing a hard mask cap layer. There is first provided a substrate having conductor regions formed therein upon which is formed a low dielectric constant dielectric layer. There is then formed over the substrate a silicon containing hard mask cap layer. There is then formed over the hard mask cap layer a patterned photoresist etch mask layer. There is then subtractively etched employing the patterned photoresist etch mask layer and a first subtractive etching environment the pattern into the hard mask layer. There is then subtractively etched employing the patterned hard mask layer and a second etching environment the pattern into the low dielectric constant dielectric layer, simultaneously stripping the photoresist etch mask layer. There is then removed by delamination the hard mask cap layer employing a chemical treatment, leaving a trench pattern in the low dielectric constant dielectric layer. The trench pattern may be filled with a microelectronics material to form a patterned layer around which is a maximized amount of low dielectric constant dielectric material. The order of filling with microelectronics material and delamination of the hard mask layer may be reversed if desired to minimize the amount of patterned microelectronics material remaining above the substrate surface, in which case the method is a lift off method for patterning a microelectronics layer. After filling and patterning, the substrate surface may be planarized for further processing and optional additional microelectronics layers formed thereover.

    摘要翻译： 在形成在微电子制造中使用的衬底上的低介电常数电介质层内形成使用硬掩模帽层的导体图案的方法。 首先，设置有形成有导体区域的基板，在其上形成低介电常数介电层。 然后在衬底上形成含硅的硬掩模帽层。 然后在硬掩模帽层上形成图案化的光致抗蚀剂蚀刻掩模层。 然后使用图案化的光致抗蚀剂蚀刻掩模层进行减法蚀刻，并且将图案的第一减去刻蚀环境刻蚀成硬掩模层。 然后使用图案化的硬掩模层进行减法蚀刻，并且将图案的第二蚀刻环境放置到低介电常数介电层中，同时剥离光致抗蚀剂蚀刻掩模层。 然后通过分层去除采用化学处理的硬掩模帽层，在低介电常数介电层中留下沟槽图案。 沟槽图案可以用微电子材料填充以形成图案化层，围绕其形成最大量的低介电常数电介质材料。 如果需要，微电子材料的填充顺序和硬掩模层的分层可以相反，以使在基板表面之上残留的图案化微电子材料的量最小化，在这种情况下，该方法是用于图案化微电子层的剥离方法。 在填充和图案化之后，衬底表面可以被平坦化以用于进一步处理，并且在其上形成可选的另外的微电子层。

    Heat dissipation structure for sealed optical machines
    2.
    发明授权
    Heat dissipation structure for sealed optical machines 有权

    公开(公告)号：US11879627B1

    公开(公告)日：2024-01-23

    申请号：US18115815

    申请日：2023-03-01

    申请人： Yi Xu

    发明人： Yi Xu

    IPC分类号： F21V29/67 ,  G03B21/16 ,  F21V29/503 ,  F21V29/71

    CPC分类号： F21V29/503 ,  F21V29/67 ,  F21V29/71 ,  G03B21/16

    摘要： A new heat dissipation structure for sealed optical machines comprises an optical machine housing, an LED light source, a light cone, a first Fresnel lens, heat insulating glass, a liquid crystal screen, a second Fresnel lens, and a reflector; the upper part of the optical machine housing is installed with a second heat dissipation fan. The invention adopts two independent heat dissipation systems inside and outside, which can greatly increase the heat dissipation performance of the optical machine, and the external heat sink of the external heat dissipation system and the light heat sink share a fan in parallel, simplifying the structure and reducing the cost. The second heat dissipation fan is integrated with the optical machine shell, which effectively reduces the height of the optical machine, reduces the volume of the optical machine, and achieves a better internal circulation, further improving the heat dissipation efficiency.

    Camera lens
    3.
    外观设计
    Camera lens 有权

    公开(公告)号：USD1002703S1

    公开(公告)日：2023-10-24

    申请号：US29761529

    申请日：2020-12-09

    申请人： Yi Xu ,  Zhiquan Yang ,  Yonghui Yuan ,  Jieming Li ,  Sufan Peng

    设计人： Yi Xu ,  Zhiquan Yang ,  Yonghui Yuan ,  Jieming Li ,  Sufan Peng

    摘要： FIG. 1 is a perspective view of a camera lens showing our new design;
    FIG. 2 is a front elevation view thereof;
    FIG. 3 is a rear elevation view thereof;
    FIG. 4 is a left side elevation view thereof;
    FIG. 5 is a right side elevation view thereof;
    FIG. 6 is a top plan view thereof;
    FIG. 7 is a bottom plan view thereof; and,
    FIG. 8 is an enlarged portion view taken from encircled portion labeled, “FIG. 8,” in FIG. 1.
    The dashed-dot lines form the boundary of the enlarged portion view of FIGS. 1 and 8 and form no part of the claimed design. The even dashed broken lines shown in the drawings are included for the purpose of illustrating portions of the camera lens that form no part of the claimed design.

    Architecture to simplify development of out of box experience (OOBE) modules
    7.
    发明申请
    Architecture to simplify development of out of box experience (OOBE) modules 审中-公开
    架构简化了开箱即用的体验（OOBE）模块

    公开(公告)号：US20070168904A1

    公开(公告)日：2007-07-19

    申请号：US11314662

    申请日：2005-12-20

    申请人： Wei Yuan ,  James Howell ,  Yi Xu ,  Fengshu Yang

    发明人： Wei Yuan ,  James Howell ,  Yi Xu ,  Fengshu Yang

    IPC分类号： G06F9/44

    CPC分类号： G06F8/20

    摘要： A method for providing an out of box experience (OOBE) which includes providing an OOBE module and an OOBE variables file, providing OOBE options to the OOBE module via the OOBE variables file, customizing the out of box experience via the OOBE options in the OOBE variables file, and presenting the out of box experience via the OOBE module is disclosed.

    摘要翻译： 一种提供开箱即用的经验（OOBE）的方法，其中包括提供OOBE模块和OOBE变量文件，通过OOBE变量文件向OOBE模块提供OOBE选项，通过OOBE中的OOBE选项定制开箱即用的经验 变量文件，并通过OOBE模块呈现开箱体验。

    Backlight module with light guide protrusion and liquid crystal display with same
    8.
    发明申请
    Backlight module with light guide protrusion and liquid crystal display with same 有权
    带导光突起的背光模块和液晶显示屏相同

    公开(公告)号：US20070058396A1

    公开(公告)日：2007-03-15

    申请号：US11518664

    申请日：2006-09-11

    申请人： Yi Xu ,  Ching-Huang Lin

    发明人： Yi Xu ,  Ching-Huang Lin

    IPC分类号： F21V7/04

    CPC分类号： G02B6/002

    摘要： An exemplary backlight module (1) includes a light guide plate (10) and at least one point illuminator (12). The light guide plate includes a first side surface (102), and a protrusion (14) outwardly extending from the first side surface. The protrusion includes at least one second side surface (144) oblique to the first side surface. The at least one point illuminator is adjacent to the least one second side surface.

    摘要翻译： 示例性背光模块（1）包括导光板（10）和至少一个点照明器（12）。 导光板包括第一侧表面（102）和从第一侧表面向外延伸的突出部（14）。 该突出部包括至少一个倾斜于第一侧表面的第二侧表面（144）。 所述至少一个点照明器邻近所述至少一个第二侧表面。

    Compilation of calibration information for plural testflows
    9.
    发明申请
    Compilation of calibration information for plural testflows 有权
    编辑多个测试流程的校准信息

    公开(公告)号：US20060236167A1

    公开(公告)日：2006-10-19

    申请号：US11091681

    申请日：2005-03-28

    申请人： Zhengrong Zhou ,  Yi Xu ,  Kai Yick

    发明人： Zhengrong Zhou ,  Yi Xu ,  Kai Yick

    IPC分类号： G01R31/28

    CPC分类号： G01R35/005 ,  G01R31/2834

    摘要： In one embodiment, a selection of plural testflows is first obtained. Each testflow specifies how automated test equipment (ATE) should test at least one device. Calibration information is then identified for each of the testflows, and redundancies in the identified calibration information are eliminated to compile a set of non-redundant information for performing a focused calibration over the ATE and selected testflows.

    摘要翻译： 在一个实施例中，首先获得多个测试流的选择。 每个测试流程指定自动化测试设备（ATE）如何测试至少一个设备。 然后为每个测试流程识别校准信息，并且消除所识别的校准信息中的冗余以编译一组用于在ATE和所选择的测试流上进行聚焦校准的非冗余信息。