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公开(公告)号：US5156237A
公开(公告)日：1992-10-20
申请号：US767629
申请日：1991-09-30
申请人： Yoshikatsu Hayashi , Masami Yoshikawa , Makoto Tomidokoro , Masaaki Murakami , Tetsuro Ogushi , Yutaka Noda
发明人： Yoshikatsu Hayashi , Masami Yoshikawa , Makoto Tomidokoro , Masaaki Murakami , Tetsuro Ogushi , Yutaka Noda
CPC分类号： B66B13/301 , B66B13/08 , E06B5/16
摘要： An apparatus operable on each elevator platform for opening or closing doors wherein the apparatus includes a pair of doors for opening or closing an inlet/outlet on the elevator platform, a rail for guiding the rolling movement of rollers carried by a hanger plate standing upright on the upper surface of each door and a door-sill arranged below said inlet/outlet for guiding the slidable movement of a door shoe at the lower end of each door. Each door is essentially composed of a door main body having a vertically extending reinforcement member for supporting the dead weight of each door and a thermal insulating panel fixedly secured to the door main body on the elevator platform side, the thermally insulating panel being filled with a thermal insulating material, and a decorative plate is adhesively secured to the front surface of the thermal insulating panel on the elevator platform side.
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2.发明申请公开(公告)号：US20110039081A1
公开(公告)日：2011-02-17
申请号：US12988945
申请日：2009-04-20
申请人： Masato Murouchi , Kenji Hayashi , Kaoru Suzuki , Masaaki Murakami
发明人： Masato Murouchi , Kenji Hayashi , Kaoru Suzuki , Masaaki Murakami
CPC分类号： G02B1/10 , C08K3/22 , C08K5/0091 , G02B27/0006 , G02F1/133502 , Y10T428/24942
摘要： A transparent-film-forming composition contains at least one microparticle-form inorganic substance having a refractive index of 1.80 or higher and lower than 3.00 (ingredient A), at least one microparticle-form inorganic substance having a refractive index of 1.55 or higher and lower than 1.80 (ingredient B), and a binder having a refractive index lower than that of the ingredient B, and preferably, a dispersion stabilizer, and being capable of forming, on a surface of a transparent substrate, a transparent film having excellent transparency and free from interference-related disturbance. A transparent-film-layered product has a transparent substrate and, on a surface of the substrate, a transparent film formed from the composition, which layered product exhibits a difference in refractive index between the transparent substrate and the transparent film of 0.03 or smaller and excellent transparency, and providing minimized interference-related disturbance.
摘要翻译： 透明膜形成组合物含有折射率为1.80以上且低于3.00（成分A）的至少一种微粒形式的无机物质，至少一种折射率为1.55以上的微粒形式的无机物质，以及 低于1.80（成分B）和折射率低于成分B的粘合剂，优选分散稳定剂，并且能够在透明基材的表面上形成透明性优异的透明膜 并且没有干扰相关的干扰。 透明膜层积体具有透明基板，并且在基板的表面上形成由该组合物形成的透明膜，该层叠体的透明基板和透明膜之间的折射率差为0.03以下， 良好的透明度，并且提供最小的与干扰有关的干扰。
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公开(公告)号：USD594884S1
公开(公告)日：2009-06-23
申请号：US29282810
申请日：2007-07-30
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公开(公告)号：US5626913A
公开(公告)日：1997-05-06
申请号：US400935
申请日：1995-03-09
CPC分类号： G03F7/162 , G03F7/3021 , Y10S134/902
摘要： A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
摘要翻译： 本发明提供了一种用于待处理物体的抗蚀剂处理方法，包括将处理液供给到待处理物体上以对被处理物进行处理的处理步骤，以及将清洗液供给到 要处理的对象以清洁待处理的对象，其中处理步骤至少部分地与清洁步骤重叠。 本发明还提供了一种用于待处理对象的抗蚀剂处理方法，包括以下步骤：将处理溶液供应装置定位在用于将处理溶液供给到具有一对相对边缘的待处理四边形物体上方， 在所述处理液供给单元将所述处理液供给到被处理对象物的同时，将所述待处理对象物的一对边缘的一个边缘相对于所述待处理物体移动，将所述处理液供给单元从一个边缘 将待处理物体相对于被处理物体的待处理物体的一对边缘的另一边缘相对于被处理物体供给到待处理物体上。
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公开(公告)号：US5580607A
公开(公告)日：1996-12-03
申请号：US186879
申请日：1994-01-26
CPC分类号： H01L21/67173 , B05C11/08 , B05D1/005 , H01L21/67109 , H01L21/6715
摘要： A coating apparatus comprises a chuck on which a semiconductor wafer is adhered, a resist liquid supplying system for supplying a resist liquid to the semiconductor wafer, a motor for rotating the semiconductor wafer, thereby spreading the resist liquid over the semiconductor wafer, and a plate, on which the semiconductor wafer is placed, for creating a temperature distribution on the semiconductor wafer.
摘要翻译： 一种涂覆装置，包括：一个卡盘，一个半导体晶片被粘在其上;一个用于向半导体晶片提供抗蚀剂液体的抗蚀剂供应系统;一个用于旋转半导体晶片的马达，从而将抗蚀剂液体扩散到半导体晶片上; ，其上放置有半导体晶片，用于在半导体晶片上产生温度分布。
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公开(公告)号：US5335720A
公开(公告)日：1994-08-09
申请号：US925162
申请日：1992-08-06
CPC分类号： F28D15/04
摘要： A heat pipe comprising a hermetic shell tube, a heat conveying fluid within the shell tube and a plurality of capillary circumferential or axial grooves provided entirely of an inner surface of the shell. A capillary axial channel structure which includes axially extending plates defining a U-shaped or V-shaped channels therebetween circumferential grooves and having an opening defining therein a meniscus of the heat conveying fluid in the liquid phase at least in the evaporator section and the condenser section. The capillary axial channel structure may comprise an inner tube for defining a tubular, axially extending capillary space therebetween. The inner tube has open ends disposed within the evaporation and condensation sections for allowing the heat conveying fluid to flow therethrough.
摘要翻译： 一种热管，包括密封壳管，壳管内的传热流体和整个由壳的内表面提供的多个毛细管周向或轴向槽。 一种毛细管轴向通道结构，其包括轴向延伸的板，其在周向槽之间限定U形或V形通道，并且具有至少在蒸发器部分和冷凝器部分中限定在液相中的传热流体的弯月面的开口 。 毛细管轴向通道结构可以包括用于在其间限定管状的轴向延伸毛细管空间的内管。 内管具有设置在蒸发和冷凝部分内的开口端，用于允许热输送流体流过其中。
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公开(公告)号：US08661793B2
公开(公告)日：2014-03-04
申请号：US13496709
申请日：2010-09-01
IPC分类号： F01N3/00
CPC分类号： E02F9/0883 , B01D53/9418 , B60K13/04 , B60K15/063 , B60Y2200/412 , E02F9/0833 , F01N2610/1406 , F01N2610/1413 , Y02A50/2325 , Y02T10/24
摘要： A construction machine including an engine, a fuel tank, and a liquid reductant tank. The construction machine further includes a tank cover, and the fuel tank has an upper surface including a high-position surface and a low-position surface located at a lower position than the high-position surface and adjacent to the high-position surface through a step. The tank cover is provided over the low-position surface and at a height position approximately equal to that of the high-position surface to define a liquid reductant tank installation space in cooperation with the low-position surface. The liquid reductant tank has a replenishment port, installed in the liquid reductant tank installation space so that the replenishment port is close to a lower surface of the tank cover.
摘要翻译： 一种包括发动机，燃料箱和液体还原罐的建筑机械。 施工机械还包括油箱盖，并且燃料箱具有上表面，该上表面包括高位置表面和位于比高位置表面低的位置并且靠近高位表面的低位表面 步。 油箱盖设置在低位表面上并且在高位置处大致等于高位表面的高度位置，以与低位表面配合定义液体还原罐安装空间。 液体还原剂罐具有补充口，安装在液体还原剂罐安装空间中，使得补充口靠近罐盖的下表面。
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公开(公告)号：USD575804S1
公开(公告)日：2008-08-26
申请号：US29282799
申请日：2007-07-30
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公开(公告)号：US5779796A
公开(公告)日：1998-07-14
申请号：US768884
申请日：1996-12-17
CPC分类号： G03F7/162 , G03F7/3021 , Y10S134/902
摘要： The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
摘要翻译： 本发明提供了一种用于待处理物体的抗蚀剂处理方法，包括将处理液供给到待处理物体上以对被处理物进行处理的处理步骤，以及提供清洗液 到待处理的物体上以清洁待处理的物体，其中处理步骤至少部分地与清洁步骤重叠。 本发明还提供了一种用于待处理对象的抗蚀剂处理方法，包括以下步骤：将处理溶液供应装置定位在用于将处理溶液供给到具有一对相对边缘的待处理四边形物体上方， 在所述处理液供给单元将所述处理液供给到被处理对象物的同时，将所述待处理对象物的一对边缘的一个边缘相对于所述待处理物体移动，将所述处理液供给单元从一个边缘 将待处理物体相对于被处理物体的待处理物体的一对边缘的另一边缘相对于被处理物体供给到待处理物体上。
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公开(公告)号：US5759614A
公开(公告)日：1998-06-02
申请号：US639748
申请日：1996-04-29
CPC分类号： G03F7/162 , G03F7/3021 , Y10S134/902
摘要： The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
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