公开(公告)号：US07981805B2

公开(公告)日：2011-07-19

申请号：US12852230

申请日：2010-08-06

申请人： Yoshimitsu Kodaira ,  Tomoaki Osada ,  Sanjay Shinde

发明人： Yoshimitsu Kodaira ,  Tomoaki Osada ,  Sanjay Shinde

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/32136 ,  H01J37/321 ,  H01J37/3266 ,  H01L27/101 ,  H01L45/04 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/147 ,  H01L45/1675

摘要： The present invention provides a method for manufacturing a resistance change element that can reduce occurrence of corrosion without increasing a substrate temperature. A laminate film that includes a high melting-point metal film and a metal oxide film, is etched using a mask under a plasma atmosphere formed using any one of a mixture gas formed by adding at least one gas selected from the group consisting of Ar, He, Xe, Ne, Kr, O2, O3, N2, H2O, N2O, NO2, CO and CO2 to at least one kind of gasified compound selected from alcohol and hydrocarbon or the gas compound.

摘要翻译： 本发明提供一种能够在不增加基板温度的情况下减少腐蚀发生的电阻变化元件的制造方法。 包含高熔点金属膜和金属氧化物膜的层压膜在等离子体气氛下使用掩模进行蚀刻，所述等离子体气氛使用通过添加至少一种选自Ar， He，Xe，Ne，Kr，O 2，O 3，N 2，H 2 O，N 2 O，NO 2，CO和CO 2与至少一种选自醇和烃或气体化合物的气化化合物。

公开(公告)号：US20110021000A1

公开(公告)日：2011-01-27

申请号：US12852230

申请日：2010-08-06

申请人： Yoshimitsu Kodaira ,  Tomoaki Osada ,  Sanjay Shinde

发明人： Yoshimitsu Kodaira ,  Tomoaki Osada ,  Sanjay Shinde

IPC分类号： H01L21/02

CPC分类号： H01L21/32136 ,  H01J37/321 ,  H01J37/3266 ,  H01L27/101 ,  H01L45/04 ,  H01L45/1233 ,  H01L45/146 ,  H01L45/147 ,  H01L45/1675

摘要： The present invention provides a method for manufacturing a resistance change element that can reduce occurrence of corrosion without increasing a substrate temperature. A laminate film that includes a high melting-point metal film and a metal oxide film, is etched using a mask under a plasma atmosphere formed using any one of a mixture gas formed by adding at least one gas selected from the group consisting of Ar, He, Xe, Ne, Kr, O2, O3, N2, H2O, N2O, NO2, CO and CO2 to at least one kind of gasified compound selected from alcohol and hydrocarbon or the gas compound.

摘要翻译： 本发明提供一种能够在不增加基板温度的情况下减少腐蚀发生的电阻变化元件的制造方法。 包含高熔点金属膜和金属氧化物膜的层压膜在等离子体气氛下使用掩模进行蚀刻，所述等离子体气氛使用通过添加至少一种选自Ar， He，Xe，Ne，Kr，O 2，O 3，N 2，H 2 O，N 2 O，NO 2，CO和CO 2与至少一种选自醇和烃或气体化合物的气化化合物。

公开(公告)号：US20100310902A1

公开(公告)日：2010-12-09

申请号：US12819691

申请日：2010-06-21

申请人： Tomoaki Osada ,  Naoko Matsui ,  Yoshimitsu Kodaira ,  Koji Tsunekawa

发明人： Tomoaki Osada ,  Naoko Matsui ,  Yoshimitsu Kodaira ,  Koji Tsunekawa

IPC分类号： H01L43/08 ,  H01L43/12 ,  C23C14/00

CPC分类号： H01L21/67069 ,  C23F4/00 ,  G11B5/3163 ,  G11B5/3906 ,  H01F41/34 ,  H01J37/321 ,  H01J37/3266 ,  H01J37/3408 ,  H01J37/3414 ,  H01J37/3429 ,  H01J37/3447 ,  H01L21/32136 ,  H01L43/12

摘要： In a method of manufacturing a magneto-resistance element having a multi-layer film including magnetic layers, TaOx generated on the surface of the Ta mask is prevented from peeling off when etching is performed on the multi-layer film using an etching gas containing oxygen atoms.When a Ta mask which is used at the time of dry etching performed on the multi-layer film including magnetic layers with an etching gas containing oxygen atoms is formed by sputtering, the Ar gas pressure is set to be 0.1 Pa to 0.4 Pa.

摘要翻译： 在制造具有包含磁性层的多层膜的磁阻元件的方法中，使用含有氧的蚀刻气体对多层膜进行蚀刻时，防止在Ta掩模的表面上产生的TaO x剥离 原子 当通过溅射形成在包含含有氧原子的蚀刻气体的磁性层的多层膜上进行干法蚀刻时使用的Ta掩模，将Ar气体压力设定为0.1Pa〜0.4Pa。

公开(公告)号：US20090078569A1

公开(公告)日：2009-03-26

申请号：US12211023

申请日：2008-09-15

申请人： Hirohisa Hirayanagi ,  Kiyotaka Sakamoto ,  Tomoaki Osada ,  Yoshimitsu Kodaira

发明人： Hirohisa Hirayanagi ,  Kiyotaka Sakamoto ,  Tomoaki Osada ,  Yoshimitsu Kodaira

IPC分类号： C23C14/00

CPC分类号： H01L21/67069 ,  H01J37/15 ,  H01J37/321 ,  H01J37/32357 ,  H01J2237/022 ,  H01J2237/20

摘要： An inductively coupled plasma processing apparatus according to the present invention prevents debris formed through a sputter etching operation from forming a film on an inner face of a side wall part 14 of a dielectric wall container 11 and a high-frequency power from being hindered to be supplied. All of straight lines which start from any one point on the outermost perimeter of an article to be processed 2 and pass through a plasma introduction port 12 form an intersecting point with the bottom part 13 of the dielectric wall container 11 on the inner face of the bottom part 13, in the inductively coupled plasma processing apparatus.

摘要翻译： 根据本发明的电感耦合等离子体处理装置防止通过溅射蚀刻操作形成的碎屑在电介质壁容器11的侧壁部分14的内表面上形成膜，并且阻止高频电力为 提供。 从待处理物品2的最外周上的任何一个点开始并通过等离子体引入口12的所有直线与电介质壁容器11的底部13在内壁上形成交叉点 底部13，在电感耦合等离子体处理装置中。

公开(公告)号：US20100044340A1

公开(公告)日：2010-02-25

申请号：US12556987

申请日：2009-09-10

申请人： Yoshimitsu Kodaira ,  Tomoaki Osada

发明人： Yoshimitsu Kodaira ,  Tomoaki Osada

IPC分类号： B44C1/22

CPC分类号： C23F4/00 ,  B82Y10/00 ,  B82Y25/00 ,  B82Y40/00 ,  G11B5/3163 ,  G11B5/3906 ,  G11B5/3909 ,  G11C11/161 ,  H01F10/3254 ,  H01F41/308 ,  H01L43/08 ,  H01L43/12

摘要： A magnetic device is fabricated by etching a magnetic film in an atmosphere of plasma using a non-organic film as a mask. An atmosphere of plasma is generated by using at least one kind of gasifying compound selected from a gasifying compound group consisting of ethers, aldehydes, carboxylic acids, esters and diones; and by using a non-organic material mask, etching a magnetic film or diamagnetic film which includes at least one kind of metal selected from a metal group consisting of VIII group, IX group and X group elements in a periodic table. As a gas in the atmosphere of plasma, at least one kind of gas selected from a gas group consisting of oxygen, ozone, nitrogen, H2O, N2O, NO2 and CO2 can be added to the gasifying compound. The etching rate and the etching ratio were favorable.

摘要翻译： 通过使用非有机膜作为掩模在等离子体气氛中蚀刻磁性膜来制造磁性器件。 通过使用选自由醚，醛，羧酸，酯和二酮组成的气化组合物中的至少一种气化化合物，产生等离子体气氛; 并且通过使用非有机材料掩模，蚀刻包括选自元素周期表中由VIII族，IX族和X族元素组成的金属中的至少一种金属的磁性膜或抗磁性膜。 作为等离子体气体中的气体，可以向气化化合物中添加选自由氧，臭氧，氮，H 2 O，N 2 O，NO 2和CO 2组成的气体组中的至少一种气体。 蚀刻速率和蚀刻比是有利的。

公开(公告)号：US20110308544A1

公开(公告)日：2011-12-22

申请号：US13069635

申请日：2011-03-23

申请人： Tomoaki Osada ,  Franck Ernult

发明人： Tomoaki Osada ,  Franck Ernult

IPC分类号： B08B7/00 ,  C23F1/08

CPC分类号： H01L43/08 ,  B82Y25/00 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3163 ,  H01L43/12

摘要： The present invention provides a manufacturing method of a multilayer film, a manufacturing method of a magnetoresistance effect device, and a substrate treatment apparatus, capable of shortening the time of a cleaning step. In one embodiment of the present invention, the inside of an etching apparatus is cleaned by plasma of a mixed gas containing H2 gas and O2 gas between processes. This shortens the cleaning time to improve the productivity.

摘要翻译： 本发明提供了能够缩短清洗工序的时间的多层膜的制造方法，磁阻效应装置的制造方法以及基板处理装置。 在本发明的一个实施例中，通过在工艺之间含有H 2气体和O 2气体的混合气体的等离子体来清洁蚀刻装置的内部。 这缩短了清洁时间，以提高生产率。

公开(公告)号：US20090204606A1

公开(公告)日：2009-08-13

申请号：US12365701

申请日：2009-02-04

申请人： Tomoaki Osada

发明人： Tomoaki Osada

IPC分类号： G06F17/30

CPC分类号： G06F16/172

摘要： A file management apparatus which makes it possible to cache a file registered in a file server from an initial stage of registration thereof. When a file is newly registered in the file server, the file server extracts the feature elements of the file, and searches for an registered file having a high degree of similarity to the file being registered in response to the current registration request. The search is performed based on the feature elements and an access log. Then, the file server searches for a domain from which access has been made to the file a not smaller number of times than a predetermined number of times, and copies and registers the newly registered file also in a cache server of the domain.

摘要翻译： 一种文件管理装置，其可以从登记的初始阶段缓存在文件服务器中登记的文件。 当文件被新登记在文件服务器中时，文件服务器提取文件的特征元素，并且响应于当前注册请求搜索与被登记的文件具有高度相似性的注册文件。 基于特征元素和访问日志进行搜索。 然后，文件服务器搜索对该文件进行访问的域不小于预定次数的次数，并且还将该新注册的文件也复制并登记在域的高速缓存服务器中。

公开(公告)号：US20070285717A1

公开(公告)日：2007-12-13

申请号：US11751557

申请日：2007-05-21

申请人： Tsuyoshi Muto ,  Tomoaki Osada

发明人： Tsuyoshi Muto ,  Tomoaki Osada

IPC分类号： G06K15/00

CPC分类号： H04N1/00891 ,  G03G15/5012 ,  H04N1/00885 ,  H04N1/00915 ,  H04N1/00917 ,  H04N1/00923 ,  H04N1/00928 ,  H04N1/00931 ,  H04N2201/0094

摘要： A procedure through which a device is started up when power is introduced is fixed. Consequently, if there is a job that has been suspended owing to cut-off of power the length of time from re-introduction of power to resumption of the suspended job is too long. In order to solve this problem, an image processing apparatus, which enables execution of a plurality of jobs by starting up a plurality of software modules, is so adapted that in a case where a job being executed is suspended, execution information indicating status of execution of the job at the time of suspension is stored. The suspended job is resumed based on the execution information. Specifically, in resuming the suspended job, a group of software modules relating to the suspended job is started up before other software modules.

摘要翻译： 引入电源时启动设备的过程是固定的。 因此，如果由于权力被切断而暂停工作，从重新引入电力到恢复暂停工作的时间长短太长。 为了解决这个问题，通过启动多个软件模块能够执行多个作业的图像处理装置适合于在暂停执行作业的情况下，指示执行状态的执行信息 暂停时的作业被存储。 暂停的作业将根据执行信息恢复。 具体来说，在恢复暂停的作业时，在其他软件模块之前启动与挂起的作业相关的一组软件模块。

公开(公告)号：US5569350A

公开(公告)日：1996-10-29

申请号：US389789

申请日：1995-02-16

申请人： Tomoaki Osada ,  Yasuyuki Shirai

发明人： Tomoaki Osada ,  Yasuyuki Shirai

IPC分类号： C23C16/458 ,  H01L21/683 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01L21/6831 ,  C23C16/4586

摘要： A mechanism for completely separating a substrate, such as a semiconductor substrate, from at base in such a way that the substrate is in a horizontal position and can be easily removed from an electrostatic chuck. The substrate is mounted on a pedestal which is placed on a base such as an electrode. Pins are mounted within the base beneath a central portion of the substrate. The pins can be moved vertically through the circular pedestal to lift the substrate from the pedestal. A ring is mounted around the pedestal and underneath the outer edge of the substrate. When the pins are protrude beyond the top surface of the circular pedestal the substrate is lifted and caused to tilt. The ring then is lifted to act on the outer edge of the rear surface of the substrate, thus separating the substrate from the circular pedestal and returning the substrate to a horizontal position.

摘要翻译： 用于将基板（例如半导体基板）从底部完全分离以使得基板处于水平位置并且可以容易地从静电卡盘移除的方式的机构。 基板安装在放置在诸如电极的基座上的基座上。 引脚安装在底座下方的基板的中心部分之下。 销可以垂直移动通过​​圆形底座从基座提起基板。 一个环安装在基座周围并在基底的外边缘下方。 当销突出超过圆形基座的顶面时，基板被提起并使其倾斜。 然后，环被提升以作用在基板的后表面的外边缘上，从而将基板与圆形基座分离并将基板返回到水平位置。

公开(公告)号：US08520249B2

公开(公告)日：2013-08-27

申请号：US11751557

申请日：2007-05-21

申请人： Tsuyoshi Muto ,  Tomoaki Osada

发明人： Tsuyoshi Muto ,  Tomoaki Osada

IPC分类号： G06F3/12 ,  G06K15/00

CPC分类号： H04N1/00891 ,  G03G15/5012 ,  H04N1/00885 ,  H04N1/00915 ,  H04N1/00917 ,  H04N1/00923 ,  H04N1/00928 ,  H04N1/00931 ,  H04N2201/0094

摘要： A procedure through which a device is started up when power is introduced is fixed. Consequently, if there is a job that has been suspended owing to cut-off of power the length of time from re-introduction of power to resumption of the suspended job is too long. In order to solve this problem, an image processing apparatus, which enables execution of a plurality of jobs by starting up a plurality of software modules, is so adapted that in a case where a job being executed is suspended, execution information indicating status of execution of the job at the time of suspension is stored. The suspended job is resumed based on the execution information. Specifically, in resuming the suspended job, a group of software modules relating to the suspended job is started up before other software modules.

摘要翻译： 引入电源时启动设备的过程是固定的。 因此，如果由于权力被切断而暂停工作，从重新引入电力到恢复暂停工作的时间长短太长。 为了解决这个问题，通过启动多个软件模块能够执行多个作业的图像处理装置适合于在暂停执行作业的情况下，指示执行状态的执行信息 暂停时的作业被存储。 暂停的作业将根据执行信息恢复。 具体来说，在恢复暂停的作业时，在其他软件模块之前启动与挂起的作业相关的一组软件模块。