摘要:
A lower electrode layer 2, an upper electrode layer 4 formed above the lower electrode layer 2, and a metal oxide thin film layer 3 formed between the lower electrode layer 2 and the upper electrode layer 4 are provided. The metal oxide thin film layer 3 includes a first region 3a whose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer 2 and the upper electrode layer 4 and a second region 3b arranged around the first region 3a and having a larger content of oxygen than the first region 3a, wherein the lower and upper electrode layers 2 and 4 and at least a part of the first region 3a are arranged so as to overlap as viewed from the direction of the thickness of the first region 3a.
摘要:
A lower electrode layer 2, an upper electrode layer 4 formed above the lower electrode layer 2, and a metal oxide thin film layer 3 formed between the lower electrode layer 2 and the upper electrode layer 4 are provided. The metal oxide thin film layer 3 includes a first region 3a whose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer 2 and the upper electrode layer 4 and a second region 3b arranged around the first region 3a and having a larger content of oxygen than the first region 3a, wherein the lower and upper electrode layers 2 and 4 and at least a part of the first region 3a are arranged so as to overlap as viewed from the direction of the thickness of the first region 3a.
摘要:
A method for manufacturing a variable resistance element includes the steps of: depositing a variable resistance material (106) in a contact hole (105), which is formed on an interlayer insulating layer (104) on a substrate and has a lower electrode (103) at a bottom portion thereof, such that an upper surface of the variable resistance material (106) in the contact hole (105) is located lower than an upper surface of the interlayer insulating layer (104); depositing an upper electrode material on the deposited variable resistance material (106) such that an upper surface of the upper electrode material in the contact hole (105) is located higher than the upper surface of the interlayer insulating layer (104); and element-isolating by a CMP the variable resistance element including the variable resistance material (106) and the upper electrode material.
摘要:
A lower electrode layer 2, an upper electrode layer 4 formed above the lower electrode layer 2, and a metal oxide thin film layer 3 formed between the lower electrode layer 2 and the upper electrode layer 4 are provided. The metal oxide thin film layer 3 includes a first region 3a whose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer 2 and the upper electrode layer 4 and a second region 3b arranged around the first region 3a and having a larger content of oxygen than the first region 3a, wherein the lower and upper electrode layers 2 and 4 and at least a part of the first region 3a are arranged so as to overlap as viewed from the direction of the thickness of the first region 3a.
摘要:
A method for manufacturing a variable resistance element includes the steps of: depositing a variable resistance material (106) in a contact hole (105), which is formed on an interlayer insulating layer (104) on a substrate and has a lower electrode (103) at a bottom portion thereof, such that an upper surface of the variable resistance material (106) in the contact hole (105) is located lower than an upper surface of the interlayer insulating layer (104); depositing an upper electrode material on the deposited variable resistance material (106) such that an upper surface of the upper electrode material in the contact hole (105) is located higher than the upper surface of the interlayer insulating layer (104); and element-isolating by a CMP the variable resistance element including the variable resistance material (106) and the upper electrode material.
摘要:
A lower electrode layer 2, an upper electrode layer 4 formed above the lower electrode layer 2, and a metal oxide thin film layer 3 formed between the lower electrode layer 2 and the upper electrode layer 4 are provided. The metal oxide thin film layer 3 includes a first region 3a whose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer 2 and the upper electrode layer 4 and a second region 3b arranged around the first region 3a and having a larger content of oxygen than the first region 3a, wherein the lower and upper electrode layers 2 and 4 and at least a part of the first region 3a are arranged so as to overlap as viewed from the direction of the thickness of the first region 3a.
摘要:
Memory elements (3) arranged in matrix in a memory apparatus (21), each includes a resistance variable element (1) which changes an electrical resistance value in response to an applied electrical pulse having a positive polarity or a negative polarity and maintains the changed electrical resistance value, and a current suppressing element (2) for suppressing a current flowing when the electrical pulse is applied to the resistance variable element. The current suppressing element includes a first electrode, a second electrode, and a current suppressing layer provided between the first electrode and the second electrode, and the current suppressing layer comprises SiNx (x: positive actual number).
摘要:
A nonvolatile memory element includes a substrate; a lower electrode layer and a resistive layer sequentially formed on the substrate; a resistance variable layer formed on the resistive layer; a wire layer formed above the lower electrode layer; an interlayer insulating layer disposed between the substrate and the wire layer and covering at least the lower electrode layer and the resistive layer, the interlayer insulating layer being provided with a contact hole extending from the wire layer to the resistance variable layer; and an upper electrode layer formed inside the contact hole such that the upper electrode layer is connected to the resistance variable layer and to the wire layer; resistance values of the resistance variable layer changing reversibly in response to electric pulses applied between the lower electrode layer and the upper electrode layer.
摘要:
A nonvolatile memory element (10) of the present invention comprises a substrate (11); a lower electrode layer (15) and a resistive layer (16) sequentially formed on the substrate (11); a resistance variable layer (31) formed on the resistive layer (16); a wire layer (20) formed above the lower electrode layer (15); an interlayer insulating layer (17) disposed between the substrate (11) and the wire layer (20) and covering at least the lower electrode layer (15) and the resistive layer (16), the interlayer insulating layer being provided with a contact hole (26) extending from the wire layer (20) to the resistance variable layer (31); and an upper electrode layer (19) formed inside the contact hole (26) such that the upper electrode layer is connected to the resistance variable layer (31) and to the wire layer (20); resistance values of the resistance variable layer (31) changing reversibly in response to electric pulses applied between the lower electrode layer (15) and the upper electrode layer (19).
摘要:
A variable resistance element including: a first electrode; a second electrode; and a variable resistance layer having a resistance value which reversibly changes according to electrical signals applied, wherein the variable resistance layer includes a first variable resistance layer comprising a first oxygen-deficient transition metal oxide, and a second variable resistance layer comprising a second transition metal oxide having a degree of oxygen deficiency lower than a degree of oxygen deficiency of the first oxygen-deficient transition metal oxide, the second electrode has a single needle-shaped part at an interface with the second variable resistance layer, and the second variable resistance layer is interposed between the first variable resistance layer and the second electrode, is in contact with the first variable resistance layer and the second electrode, and covers the single needle-shaped part.