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公开(公告)号：US4473750A
公开(公告)日：1984-09-25
申请号：US236512
申请日：1981-07-24
CPC分类号： G01B11/24
摘要： A three-dimensional shape measuring device comprises a light beam condensing and irradiating system for irradiating a light beam to an object at a fixed angle .theta. and converging the light beam to a desired minimum diameter at a point A on an optical axis of the light beam, an imaging optical system having an optical axis having an angle .phi. different from the angle .theta. and including the point A on the optical axis thereof, for focusing the point A on an effectively constant aperture of a detecting light screen or on a small area, aperture-transmitted light detecting means or photo-electric converter means for detecting light transmitted through the aperture or the small area, detecting position changing means for changing a relative position between the object and the point A, maximum value detecting means for detecting a maximum value of the signal detected by the aperture-transmitted light detecting means or the photo-electric converter means and detection means for detecting a change in the detecting position caused by the detecting position changing means at a time when the maximum value detecting means detects the maximum value. The change in the detecting position is sequentially detected by the detecting means for each of a plurality of points on the surface of the object to measure the three-dimensional shape of the object.
摘要翻译： 三维形状测量装置包括光束聚光和照射系统，用于以固定角度θ将光束照射到物体，并将光束会聚在光束的光轴上的点A处的期望的最小直径 成像光学系统，其光轴具有与角度θ不同的角度，并且包括其光轴上的点A，用于将点A聚焦在检测光屏的有效恒定的孔上或小区域上， 孔径透过光检测装置或光电转换装置，用于检测透过孔径或小区域的光;检测位置改变装置，用于改变物体与点A之间的相对位置;最大值检测装置，用于检测最大值 由光圈透射光检测装置或光电转换装置检测的信号和检测ac的检测装置 在最大值检测装置检测到最大值时，由检测位置改变装置引起的检测位置的变化。 通过检测装置对物体表面上的多个点中的每个点依次检测检测位置的变化，以测量物体的三维形状。
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公开(公告)号：US07217573B1
公开(公告)日：2007-05-15
申请号：US09678652
申请日：2000-10-04
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.
摘要翻译： 一种用于检查DNA芯片的方法及其装置，其允许以下列步骤重建图像：在安装在平台上的DNA探针阵列上形成多个照射点。 然后，在X，Y方向上移位台，以进行扫描，从而基本上照射DNA探针阵列的整个表面。 接下来，从DNA探针阵列上的多个照射点部分产生的多个发射荧光灯被会聚，然后由多个检测器同时检测。 最后，数据处理装置处理检测到的信号，从而重建图像。
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3.发明授权公开(公告)号：US07092058B2
公开(公告)日：2006-08-15
申请号：US10841487
申请日：2004-05-10
申请人： Aki Sakai , Noboru Kunimatsu , Yoshitada Oshida
发明人： Aki Sakai , Noboru Kunimatsu , Yoshitada Oshida
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788
摘要： It is possible to enhance the utilization efficiency of a light source and impart an orientation control performance and a pretilt angle to an orientation film in a short treatment time. Substrates to which orientation films are applied are mounted on stages which are sequentially transported to a main irradiation region and a sub-irradiation region. Light flux irradiated from a light source device having a single light source receives polarization treatment at a polarization unit, thus generating main polarized light and sub-polarized light. The main polarized light is irradiated to the orientation film formed on the substrate which is transported to a main irradiation region, thus imparting orientation control performance to the orientation film. Subsequently, the substrate is transported to a sub-irradiation region, and sub-polarized light is irradiated to the orientation film to which orientation control performance is already imparted, thus imparting a pretilt angle to the orientation film.
摘要翻译： 可以在短的处理时间内提高光源的利用效率并赋予取向膜的取向控制性能和预倾角。 将施加取向膜的基板安装在依次传送到主照射区域和副照射区域的台上。 从具有单个光源的光源装置照射的光束在偏振单元处接收偏振处理，从而产生主偏振光和亚偏振光。 将主偏振光照射到形成在基板上的取向膜，该取向膜被输送到主照射区域，从而赋予取向膜定向控制性能。 随后，将基板输送到副照射区域，并且将亚偏振光照射到已经赋予取向控制性能的取向膜，从而赋予取向膜预倾斜角。
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公开(公告)号：US06335146B1
公开(公告)日：2002-01-01
申请号：US09542071
申请日：2000-04-03
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F700
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, forming the excimer laser in a particular shape, illuminating a pattern on a mask for a phase shifter method with the particular shaped excimer laser, and exposing a resist on a wafer with the excimer laser which passed through the mask. The resist on the wafer is developed and the wafer is etched to form a pattern.
摘要翻译： 半导体器件的制造方法包括以下步骤：从光源发射准分子激光，形成特定形状的准分子激光器，照射具有特定形状的准分子激光器的移相器方法的掩模上的图案，以及曝光 具有通过掩模的准分子激光器的晶片上的抗蚀剂。 显影晶片上的抗蚀剂，蚀刻晶片以形成图案。
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公开(公告)号：US6094268A
公开(公告)日：2000-07-25
申请号：US315841
申请日：1994-09-30
CPC分类号： G03F9/7049
摘要： A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
摘要翻译： 投影曝光装置（1）包括入射光学系统，用于使从光源1发射的光在对角线方向进入曝光对象（4）;检测装置（3），用于使反射光 从曝光对象（4）和参考光中检测所得的干涉条纹，处理电路用于根据干涉条纹的光学信息确定曝光物体（4）的表面的倾斜度和高度，以及 舞台（7）支持曝光对象（4）。 曝光对象（4）通过根据计算出的曝光对象的倾斜度和高度来驱动舞台（7）进行投影曝光（4）。
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6.发明授权Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference 失效用于通过从光栅衍射并从光栅反射到外差干涉的被摄体光来测量微小位移的方法和装置
公开(公告)号：US5164789A
公开(公告)日：1992-11-17
申请号：US789006
申请日：1991-11-07
IPC分类号： G01B9/02
CPC分类号： G01B9/02028 , G01B9/02002 , G01B9/02003 , G01B2290/30 , G01B2290/70
摘要： The present invention resides in method and apparatus for measuring a minute displacement, comprising applying a light of a first wavelength at a predetermined angle to a diffraction grating formed on an object whose position is to be detected, subjecting each of the resulting diffracted light and regular reflected light and a light of a second wavelength different from the first wavelength to heterodyne interference with each other to generate a measurement signal and a reference signal, and measuring a phase difference between the measurement signal and the reference signal to thereby determine a minute displacement of the object.
摘要翻译： 本发明在于用于测量微小位移的方法和装置，包括以预定角度将第一波长的光施加到形成在要检测的位置的物体上的衍射光栅，对所得衍射光和规则 反射光和不同于第一波长的第二波长的光与彼此的外差干涉产生测量信号和参考信号，并测量测量信号和参考信号之间的相位差，从而确定 物体。
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公开(公告)号：US4795261A
公开(公告)日：1989-01-03
申请号：US944524
申请日：1986-12-22
CPC分类号： G03F9/7076
摘要： A reduction projection type aligner in a reduction projection exposing device for exposing a circuit pattern on a mask through a reduction projection lens onto a wafer by the step and repeat of the wafer, which comprises: a light source for irradiating coherent irradiation light, a reflection mirror for reflecting the coherent irradiation light irradiated from the light source, a detection optical system for detecting an interference pattern by optically causing interference between an alignment pattern reflection light obtained by entering the coherent irradiation light irradiated from the light source through the reduction projection lens to the alignment pattern portion of the wafer, which is then reflected at the alignment pattern portion and then passed through the reduction projection lens and a reflection light reflected at the reflection mirror, and means for aligning a mask and a wafer relatively by detecting the position of the wafer by the video image signals in the interference pattern detected by the detection optical system.
摘要翻译： 一种还原投影型对准器，用于通过晶片的步骤和重复将通过还原投影透镜将还原投影透镜上的电路图案曝露在晶片上的还原投影曝光装置中，包括：用于照射相干照射光的光源，反射 用于反射从光源照射的相干照射光的反射镜;检测光学系统，用于通过光学地引起通过将从光源经过还原投影透镜照射的相干照射光进入的对准图案反射光之间的干涉，检测干涉图案， 晶片的对准图案部分然后在对准图案部分反射然后通过还原投影透镜和在反射镜处反射的反射光，以及用于通过检测掩模和晶片的位置相对地对准掩模和晶片的位置 晶片由视频信号在干涉中 检测光学系统检测到的图案。
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公开(公告)号：US4668089A
公开(公告)日：1987-05-26
申请号：US684292
申请日：1984-12-20
CPC分类号： G03F9/7049
摘要： An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section is on that surface of the mask plate which does not face the light source and includes a reflection portion for conducting light from another light source to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion of providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.
摘要翻译： 曝光装置包括光源，具有曝光图案区域部分和对准/反射区域部分的掩模板，投影透镜，用于保持具有工件对准标记的工件的可动台，对准控制和用于 活动舞台。 在通过投影透镜投射到工件上的光源照射曝光图案区域部分之前，工件与掩模正确对准。 掩模板与工件之间的对准通过有效地使用具体排列并具有特定结构的对准/反射区域部分进行。 对准/反射区域在掩模板的不面向光源的表面上，并且包括用于将来自另一光源的光传导到工件的反射部分，并且传导从工件散射的光并通过投影透镜到 对准控制和掩模对准标记部分，当照明时，将掩模对准标记部分的图像提供给对准控制，使得其检测掩模对准标记部分和工件对准标记之间的位置关系，并产生控制信号 以实现掩模板和工件之间的对准。
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公开(公告)号：US4085423A
公开(公告)日：1978-04-18
申请号：US691099
申请日：1976-05-28
申请人： Yoshito Tsunoda , Takeshi Maeda , Yoshitada Oshida
发明人： Yoshito Tsunoda , Takeshi Maeda , Yoshitada Oshida
CPC分类号： G11B7/0903 , G11B7/12
摘要： Information reproducing apparatus for producing information on an optical information recording medium includes a first light source which gives forth a beam of light of a wavelength .lambda..sub.1 and a second light source which gives forth a beam of light of a wavelength .lambda..sub.2 different from the wavelength .lambda..sub.1. An optical element selectively reflects the light of the wavelength .lambda..sub.1 and selectively transmits the light of the wavelength .lambda..sub.2. The first and second light sources, the optical element and the recording medium are positionally arranged so that the light beams from the first and second light sources may be projected on a predetermined position of the recording medium and a substantially identical position to the predetermined position through the optical element, respectively, and the arrangement of these elements is also such that the respective projected light beams may fall on the optical element after being reflected by the recording medium. First and second photodetectors detect light reflected from the optical element and light transmitted light through the same in accordance with the wavelength of the light beams falling on the optical element, respectively, and develop focusing and tracking control signals.
摘要翻译： 用于在光学信息记录介质上产生信息的信息再现装置包括：发出波长为λ1的光束的第一光源和产生波长为λ2的不同波长的光束的第二光源 光学元件选择性地反射波长λ1的光并选择性地透射波长λ2的光。第一和第二光源，光学元件和记录介质被位置地布置成使得来自 第一和第二光源可以分别投影在记录介质的预定位置上，并且通过光学元件分别与预定位置基本相同的位置，并且这些元件的布置也使得各个投影光束可能落在 被记录介质反射后的光学元件。 第一和第二光电检测器分别检测从光学元件反射的光并根据分别落在光学元件上的光束的波长来透过光，并且形成聚焦和跟踪控制信号。
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公开(公告)号：US20080079921A1
公开(公告)日：2008-04-03
申请号：US11839863
申请日：2007-08-16
申请人： Yoshitada Oshida , Kazuo Kobayashi
发明人： Yoshitada Oshida , Kazuo Kobayashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70066 , G03F7/70075
摘要： An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.
摘要翻译： 即使二维光学空间调制器的光学调制平面的横向尺寸Hx与纵向尺寸Hy之间的比率Hx / Hy为 例如提供1.5或以上。 将从积分器发射的光引导到二维光学空间调制器的第二光学系统的沿x方向的焦距fx和y方向的焦距fy被制成不同的fx / fy = 1.6，例如。 以这种方式，积分器中的棒状透镜的数量可以在横向和纵向方向上相等，并且通过将棒透镜的纵横比dx：dy设置为1.6:1，可以使得Hx / Hy的值为2.5 1。
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