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公开(公告)号：US20080079921A1
公开(公告)日：2008-04-03
申请号：US11839863
申请日：2007-08-16
申请人： Yoshitada Oshida , Kazuo Kobayashi
发明人： Yoshitada Oshida , Kazuo Kobayashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70066 , G03F7/70075
摘要： An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.
摘要翻译： 即使二维光学空间调制器的光学调制平面的横向尺寸Hx与纵向尺寸Hy之间的比率Hx / Hy为 例如提供1.5或以上。 将从积分器发射的光引导到二维光学空间调制器的第二光学系统的沿x方向的焦距fx和y方向的焦距fy被制成不同的fx / fy = 1.6，例如。 以这种方式，积分器中的棒状透镜的数量可以在横向和纵向方向上相等，并且通过将棒透镜的纵横比dx：dy设置为1.6:1，可以使得Hx / Hy的值为2.5 1。
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公开(公告)号：US20070058149A1
公开(公告)日：2007-03-15
申请号：US11503976
申请日：2006-08-15
申请人： Yoshitada Oshida , Kazuo Kobayashi
发明人： Yoshitada Oshida , Kazuo Kobayashi
IPC分类号： G03B27/54
CPC分类号： G02B19/0057 , G02B19/0014 , G03F7/7005 , G03F7/70058
摘要： A lighting system and an exposure apparatus in which even if the outgoing optical axes of outgoing beams emitted from a plurality of LDs disposed on a flat plane are shifted, the efficiency of use of the beams can be improved, and the directivity of lighting can be enhanced. Diffused beams output from a plurality of LDs arrayed two-dimensionally are converted into high-directivity beams with spread angles equalized circumferentially by two kinds of cylindrical lenses. In this event, the optical axis of the beam emitted from each LD may tilt due to misalignment of the center of the beam with the optical axes of the corresponding cylindrical lenses. This tilt is corrected by a wedged glass. Thus, the optical axis of the beam output from each LD meets the optical axis in the entrance plane of an integrator.
摘要翻译： 一种照明系统和曝光装置，其中即使从布置在平面上的多个LD发射的出射光束的出射光轴偏移，也可以提高光束的使用效率，并且照明的方向性可以是 增强。 从二维排列的多个LD输出的扩散光束被转换成具有两个柱面透镜周向平行扩展角度的高指向性光束。 在这种情况下，从每个LD发射的光束的光轴可能由于光束的中心与对应的柱面透镜的光轴的不对准而倾斜。 这种倾斜由楔形玻璃校正。 因此，从每个LD输出的光束的光轴与积分器的入射面中的光轴相遇。
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公开(公告)号：US07755741B2
公开(公告)日：2010-07-13
申请号：US11839863
申请日：2007-08-16
申请人： Yoshitada Oshida , Kazuo Kobayashi
发明人： Yoshitada Oshida , Kazuo Kobayashi
CPC分类号： G03F7/70291 , G03F7/70066 , G03F7/70075
摘要： An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.
摘要翻译： 即使二维光学空间调制器的光学调制平面的横向尺寸Hx与纵向尺寸Hy之间的比率Hx / Hy为 例如提供1.5或以上。 将从积分器发射的光引导到二维光学空间调制器的第二光学系统的沿x方向的焦距fx和y方向的焦距fy被制成不同的fx / fy = 1.6，例如。 以这种方式，积分器中的棒状透镜的数量可以在横向和纵向方向上相等，并且通过将棒透镜的纵横比dx：dy设置为1.6:1，可以使得Hx / Hy的值为2.5 1。
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公开(公告)号：US20050219493A1
公开(公告)日：2005-10-06
申请号：US10506540
申请日：2003-07-02
IPC分类号： G02B3/00 , G02B19/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70075 , G02B3/005 , G02B3/0062 , G02B19/0014 , G02B19/0057 , G03F7/7005
摘要： The present invention provides a light exposure apparatus, and its method, comprising: an illumination optical system including: a light source array formed of a plural separate light sources arranged one-dimensionally or two-dimensionally; condensing optical system for condensing light emitted from each light source of the light source array; a light integrator for spatially decomposing the light condensed by the condensing optics, and thus generating a multitude of pseudo-secondary light sources; and a condenser lens for overlapping the light rays emitted from the multitude of pseudo-secondary light sources generated by the light integrator, and thus illuminating an illumination target region having a pattern to be exposed; and a projection optical system for projecting transmitted or reflected light onto an exposure target region of an exposure target object in order to expose the pattern to be exposed that is illuminated by the illumination optical system.
摘要翻译： 本发明提供一种曝光装置及其方法，包括：照明光学系统，包括：由一维或二维排列的多个单独的光源形成的光源阵列; 聚光光学系统，用于聚集从光源阵列的每个光源发射的光; 光积分器，用于空间分解由聚光光学器件聚光的光，从而产生大量的伪二次光源; 以及聚光透镜，用于将由光积分器产生的多个伪二次光源发射的光线重叠，从而照射具有待曝光图案的照明目标区域; 以及投影光学系统，用于将透射或反射的光投射到曝光目标物体的曝光目标区域上，以暴露由照明光学系统照射的待曝光图案。
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公开(公告)号：US07217573B1
公开(公告)日：2007-05-15
申请号：US09678652
申请日：2000-10-04
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.
摘要翻译： 一种用于检查DNA芯片的方法及其装置，其允许以下列步骤重建图像：在安装在平台上的DNA探针阵列上形成多个照射点。 然后，在X，Y方向上移位台，以进行扫描，从而基本上照射DNA探针阵列的整个表面。 接下来，从DNA探针阵列上的多个照射点部分产生的多个发射荧光灯被会聚，然后由多个检测器同时检测。 最后，数据处理装置处理检测到的信号，从而重建图像。
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6.发明授权公开(公告)号：US07092058B2
公开(公告)日：2006-08-15
申请号：US10841487
申请日：2004-05-10
申请人： Aki Sakai , Noboru Kunimatsu , Yoshitada Oshida
发明人： Aki Sakai , Noboru Kunimatsu , Yoshitada Oshida
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788
摘要： It is possible to enhance the utilization efficiency of a light source and impart an orientation control performance and a pretilt angle to an orientation film in a short treatment time. Substrates to which orientation films are applied are mounted on stages which are sequentially transported to a main irradiation region and a sub-irradiation region. Light flux irradiated from a light source device having a single light source receives polarization treatment at a polarization unit, thus generating main polarized light and sub-polarized light. The main polarized light is irradiated to the orientation film formed on the substrate which is transported to a main irradiation region, thus imparting orientation control performance to the orientation film. Subsequently, the substrate is transported to a sub-irradiation region, and sub-polarized light is irradiated to the orientation film to which orientation control performance is already imparted, thus imparting a pretilt angle to the orientation film.
摘要翻译： 可以在短的处理时间内提高光源的利用效率并赋予取向膜的取向控制性能和预倾角。 将施加取向膜的基板安装在依次传送到主照射区域和副照射区域的台上。 从具有单个光源的光源装置照射的光束在偏振单元处接收偏振处理，从而产生主偏振光和亚偏振光。 将主偏振光照射到形成在基板上的取向膜，该取向膜被输送到主照射区域，从而赋予取向膜定向控制性能。 随后，将基板输送到副照射区域，并且将亚偏振光照射到已经赋予取向控制性能的取向膜，从而赋予取向膜预倾斜角。
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公开(公告)号：US06335146B1
公开(公告)日：2002-01-01
申请号：US09542071
申请日：2000-04-03
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F700
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, forming the excimer laser in a particular shape, illuminating a pattern on a mask for a phase shifter method with the particular shaped excimer laser, and exposing a resist on a wafer with the excimer laser which passed through the mask. The resist on the wafer is developed and the wafer is etched to form a pattern.
摘要翻译： 半导体器件的制造方法包括以下步骤：从光源发射准分子激光，形成特定形状的准分子激光器，照射具有特定形状的准分子激光器的移相器方法的掩模上的图案，以及曝光 具有通过掩模的准分子激光器的晶片上的抗蚀剂。 显影晶片上的抗蚀剂，蚀刻晶片以形成图案。
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公开(公告)号：US6094268A
公开(公告)日：2000-07-25
申请号：US315841
申请日：1994-09-30
CPC分类号： G03F9/7049
摘要： A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
摘要翻译： 投影曝光装置（1）包括入射光学系统，用于使从光源1发射的光在对角线方向进入曝光对象（4）;检测装置（3），用于使反射光 从曝光对象（4）和参考光中检测所得的干涉条纹，处理电路用于根据干涉条纹的光学信息确定曝光物体（4）的表面的倾斜度和高度，以及 舞台（7）支持曝光对象（4）。 曝光对象（4）通过根据计算出的曝光对象的倾斜度和高度来驱动舞台（7）进行投影曝光（4）。
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9.发明授权Method and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interference 失效用于通过从光栅衍射并从光栅反射到外差干涉的被摄体光来测量微小位移的方法和装置
公开(公告)号：US5164789A
公开(公告)日：1992-11-17
申请号：US789006
申请日：1991-11-07
IPC分类号： G01B9/02
CPC分类号： G01B9/02028 , G01B9/02002 , G01B9/02003 , G01B2290/30 , G01B2290/70
摘要： The present invention resides in method and apparatus for measuring a minute displacement, comprising applying a light of a first wavelength at a predetermined angle to a diffraction grating formed on an object whose position is to be detected, subjecting each of the resulting diffracted light and regular reflected light and a light of a second wavelength different from the first wavelength to heterodyne interference with each other to generate a measurement signal and a reference signal, and measuring a phase difference between the measurement signal and the reference signal to thereby determine a minute displacement of the object.
摘要翻译： 本发明在于用于测量微小位移的方法和装置，包括以预定角度将第一波长的光施加到形成在要检测的位置的物体上的衍射光栅，对所得衍射光和规则 反射光和不同于第一波长的第二波长的光与彼此的外差干涉产生测量信号和参考信号，并测量测量信号和参考信号之间的相位差，从而确定 物体。
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公开(公告)号：US4795261A
公开(公告)日：1989-01-03
申请号：US944524
申请日：1986-12-22
CPC分类号： G03F9/7076
摘要： A reduction projection type aligner in a reduction projection exposing device for exposing a circuit pattern on a mask through a reduction projection lens onto a wafer by the step and repeat of the wafer, which comprises: a light source for irradiating coherent irradiation light, a reflection mirror for reflecting the coherent irradiation light irradiated from the light source, a detection optical system for detecting an interference pattern by optically causing interference between an alignment pattern reflection light obtained by entering the coherent irradiation light irradiated from the light source through the reduction projection lens to the alignment pattern portion of the wafer, which is then reflected at the alignment pattern portion and then passed through the reduction projection lens and a reflection light reflected at the reflection mirror, and means for aligning a mask and a wafer relatively by detecting the position of the wafer by the video image signals in the interference pattern detected by the detection optical system.
摘要翻译： 一种还原投影型对准器，用于通过晶片的步骤和重复将通过还原投影透镜将还原投影透镜上的电路图案曝露在晶片上的还原投影曝光装置中，包括：用于照射相干照射光的光源，反射 用于反射从光源照射的相干照射光的反射镜;检测光学系统，用于通过光学地引起通过将从光源经过还原投影透镜照射的相干照射光进入的对准图案反射光之间的干涉，检测干涉图案， 晶片的对准图案部分然后在对准图案部分反射然后通过还原投影透镜和在反射镜处反射的反射光，以及用于通过检测掩模和晶片的位置相对地对准掩模和晶片的位置 晶片由视频信号在干涉中 检测光学系统检测到的图案。
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