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1.发明授权公开(公告)号：US06608061B2
公开(公告)日：2003-08-19
申请号：US09424352
申请日：2000-02-14
申请人： Yoshiyuki Yonetani , Takeshi Takahashi , Yuko Kanda , Tamio Mizukami , Tatsuya Tamaoki , Shun-ichi Ikeda , Masanobu Takashima , Naoki Asanuma , Tadashi Inaba , Hiroshi Takeuchi , Hiroshi Kawamoto , Yoshihisa Tsukada , Masato Satomura , Hiroshi Kitaguchi
发明人： Yoshiyuki Yonetani , Takeshi Takahashi , Yuko Kanda , Tamio Mizukami , Tatsuya Tamaoki , Shun-ichi Ikeda , Masanobu Takashima , Naoki Asanuma , Tadashi Inaba , Hiroshi Takeuchi , Hiroshi Kawamoto , Yoshihisa Tsukada , Masato Satomura , Hiroshi Kitaguchi
IPC分类号： A61K3110
CPC分类号： C07D207/08 , C07C323/16 , C07C323/25 , C07C323/40 , C07D211/58 , C07D211/60 , C07D213/32 , C07D215/06 , C07D233/64 , C07D239/42 , C07D239/58 , C07D251/38 , C07D277/56 , C07D309/38 , C07D317/22 , C07D317/28 , C07D319/06 , C07H5/06 , C07H15/18
摘要： A medicament for treatment of cancer comprising a compound represented by the following general formula (I) or a physiologically acceptable salt thereof: Ar1—S—R1—S—Ar2 wherein R1 represents a nonmetal bridging group; Ar1 and Ar2 independently represent a group selected from the group consisting of an aryl group which has, on its ring, one to three hydroxyl groups optionally substituted with a monovalent group and said aryl group may have one to three substituents other than hydroxyl group on its ring; and a heteroaryl group which has, on its ring, one to three hydroxyl groups optionally substituted with a monovalent group, and said heteroaryl group may have one to three substituents other than hydroxyl group on its ring.
摘要翻译： 一种用于治疗癌症的药物，其包含由以下通式（I）表示的化合物或其生理学上可接受的盐：其中R1表示非金属桥连基团; Ar 1和Ar 2独立地表示选自以下的基团：在其环上具有1〜3个任选被一价基团取代的羟基的芳基，所述芳基可以在其上具有1-3个除羟基以外的取代基 环; 和在其环上具有任选被一价基团取代的一至三个羟基的杂芳基，并且所述杂芳基可以在其环上具有一至三个除羟基以外的取代基。
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公开(公告)号：US07244551B2
公开(公告)日：2007-07-17
申请号：US11315092
申请日：2005-12-23
CPC分类号： G03C1/46 , G03C7/30558 , Y10S430/156
摘要： A silver halide color photosensitive material comprising a support and, superimposed thereon, a blue-sensitive layer unit, a green-sensitive layer unit and a red-sensitive layer unit, each of these light-sensitive layer units composed of at least one silver halide emulsion layer, together with at least one non-sensitive layer, wherein compound (A) is contained in at least one layer in the silver halide color photosensitive material, compound (A) being a compound capable of releasing compound (Ac1) by oxidation coupling reaction with a color developing agent, compound (Ac1) being a heterocyclic compound which when added, is capable of enhancing the sensitivity of the photosensitive material as compared with that exhibited when not added, provided that the heterocyclic ring of the heterocyclic compound has 1 or 2 hetero atoms.
摘要翻译： 一种卤化银色感光材料，其包含支撑体，并叠加有蓝色感光层单元，感光层单元和红色感光层单元，这些感光层单元由至少一种卤化银 乳剂层，以及至少一个非敏感层，其中化合物（A）包含在卤化银色感光材料中的至少一层中，化合物（A）是能够通过氧化偶合来释放化合物（Ac1）的化合物 与彩色显影剂反应，化合物（Ac1）是杂环化合物，当加入时，与不加入时所显示的相比，能够提高感光材料的敏感性，条件是杂环化合物的杂环具有1或 2个杂原子。
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公开(公告)号：US20060115973A1
公开(公告)日：2006-06-01
申请号：US11287386
申请日：2005-11-28
IPC分类号： H01L21/44
CPC分类号： C09G1/02 , H01L21/3212
摘要： A metal polishing composition comprising at least one of the compound represented by formula (1) defined herein and the compound represented by formula (2) defined herein, and an oxidizing agent, and a chemical mechanical polishing method comprising bringing the metal polishing composition into contact with a surface to be polished and providing a relative movement between the surface to be polished and a polishing surface.
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公开(公告)号：US20060035181A1
公开(公告)日：2006-02-16
申请号：US11209733
申请日：2005-08-24
IPC分类号： G03C1/00
CPC分类号： G03C1/49845
摘要： The present invention provides a photothermographic material, comprising a photosensitive silver halide, a non-photosensitive organic solvent salt, a reducing agent for a silver ion, and a binder on one face of a support, for being applied by using an organic solvent, the photothermographic material further comprising at least one compound selected from the group of compounds consisting of: a compound represented by the following general formula (1), a compound having a β-lactam ring, a compound having a group that is adsorptive to a silver halide and a group that reduces a silver halide and a precursor thereof:
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公开(公告)号：US06638705B1
公开(公告)日：2003-10-28
申请号：US10208826
申请日：2002-08-01
IPC分类号： G03C109
CPC分类号： G03C1/09 , G03C2001/091
摘要： A silver halide emulsion chemically sensitized by at least one compound having a bond of anionic chalcogenide to gold(I) cation and capable of releasing a gold-chalcogen anion species and a method for chemically sensitizing a silver halide emulsion, comprising adding at least one compound having a bond of anionic chalcogenide to gold(I) cation and capable of releasing a gold-chalcogen anion species are disclosed.
摘要翻译： 通过至少一种具有阴离子硫族化物键与金（I）阳离子并且能够释放金 - 硫族化合物阴离子物质的化合物和用于对卤化银乳剂进行化学增感的方法化学致敏的卤化银乳剂，包括将至少一种化合物 公开了具有阴离子硫属元素与金（I）阳离子并能释放金 - 硫族元素阴离子物质的键。
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公开(公告)号：US5520789A
公开(公告)日：1996-05-28
申请号：US364749
申请日：1994-12-27
IPC分类号： G01N27/41 , G01N27/406 , G01N27/407 , G01N27/409
CPC分类号： G01N27/4075
摘要： A gas sensor using an ionic conductor has a thin-film gas detection portion on an alumina substrate. The gas detection portion comprises a zirconia ionic conductor layer, a pair of platinum electrodes provided with the ionic conductor layer interposed therebetween, and a pair of junction layers positioned between the ionic conductor layer and each electrode and formed in a state in which the substances of the ionic conductor layers and the electrodes are mixed therein.The gas sensor using an ionic conductor is formed by sequentially forming a first electrode, a first junction layer, an ionic conductor layer, a second junction layer, and a second electrode by a physical vapor deposition method on a substrate, wherein the first and second junction layers are formed to be in a state in which the substances of the ionic conductor layers and the electrodes are both present.
摘要翻译： 使用离子导体的气体传感器在氧化铝基板上具有薄膜气体检测部。 气体检测部分包括氧化锆离子导体层，设置有介于其间的离子导体层的一对铂电极和位于离子导体层与每个电极之间的一对接合层，并且形成在其中物质 离子导体层和电极混合在一起。 使用离子导体的气体传感器通过在基板上通过物理气相沉积法依次形成第一电极，第一接合层，离子导体层，第二接合层和第二电极而形成，其中第一和第二 接合层形成为处于离子导体层和电极的物质都存在的状态。
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7.发明授权
公开(公告)号：US5123472A
公开(公告)日：1992-06-23
申请号：US774829
申请日：1991-10-11
CPC分类号： E06B9/307 , E06B9/322 , E06B2009/3225
摘要： According to the present invention, there is provided an apparatus for lifting and tilting slats in a venetian blind, comprising: a head box; a rotating shaft; ladder drums rotating together with the shaft; drum holders for supporting the ladder drums; ladder rings of an open ring shape and fitted around each of the ladder drums; ladder cords being put on, and secured to, each of the ladder rings; lifting drums; lift cords, wound around each of the lifting drums; slats; and elements for stopping the rotation of the shaft. The apparatus is characterized in that the elements for stopping the rotation of the shaft comprises: a stopper holder on a head box; a drum stopper of a ring shape, axially not slidably, but rotatably, attached to the stopper holder; a stop ring of a ring shape, axially slidably, but not rotatably, attached to the stopper holder; and a spring for axially pressing the stop ring against the drum stopper, the drum stopper and the stop ring having teeth formed on the mutually opposite ends of the drum stopper and the stop ring so that the teeth are engageable with each other. The lifting drum and the drum stopper are engaged so that the drum stopper rotates together with the lifting drum. The lift cord is put on the stop ring, and is hung downward.
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公开(公告)号：US09202709B2
公开(公告)日：2015-12-01
申请号：US12399984
申请日：2009-03-09
申请人： Takamitsu Tomiga , Tomoo Kato , Tadashi Inaba , Masaru Yoshikawa
发明人： Takamitsu Tomiga , Tomoo Kato , Tadashi Inaba , Masaru Yoshikawa
IPC分类号： C09K13/06 , H01L21/321 , C09G1/02 , C09K3/14
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1454 , C09K3/1463
摘要： A liquid for polishing a metal is provided that is used for chemically and mechanically polishing a conductor film including copper or a copper alloy in production of a semiconductor device, and a polishing method using the metal-polishing liquid is also provided. The liquid includes: (a) colloidal silica particles having an average primary particle size of from 10 nm to 25 nm and an average secondary particle size of from 50 nm to 70 nm; (b) a metal anticorrosive agent; (c) at least one compound selected from the group consisting of a surfactant and a water-soluble polymer compound; (d) an oxidizing agent; and (e) an organic acid.
摘要翻译： 提供了一种用于抛光金属的液体，其用于在制造半导体器件时用于化学和机械抛光包括铜或铜合金的导体膜，并且还提供了使用该金属抛光液的抛光方法。 液体包括：（a）平均一次粒径为10nm〜25nm，平均二次粒径为50nm〜70nm的胶态二氧化硅粒子; （b）金属防腐剂; （c）至少一种选自表面活性剂和水溶性高分子化合物的化合物; （d）氧化剂; 和（e）有机酸。
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公开(公告)号：US08083964B2
公开(公告)日：2011-12-27
申请号：US12055930
申请日：2008-03-26
申请人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
发明人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
IPC分类号： C03C15/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1436 , C09K3/1463
摘要： A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 represents an alkylene group having 1 to 4 carbon atoms.
摘要翻译： 1.一种金属抛光液，其特征在于，在所述半导体装置的制造方法中，对铜或铜合金的导体膜进行化学机械研磨的金属研磨液，所述金属抛光液含有：（1）式 ）; 和（2）表面活性剂，其中，在式（I）中，R 1表示碳原子数1〜4的烷基，R 2表示碳原子数1〜4的亚烷基。
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公开(公告)号：US20090082240A1
公开(公告)日：2009-03-26
申请号：US12210721
申请日：2008-09-15
申请人： Katsuyuki NUKUI , Hiroyuki Seki , Tadashi Inaba
发明人： Katsuyuki NUKUI , Hiroyuki Seki , Tadashi Inaba
IPC分类号： G03F7/42
摘要： A stripping liquid for a semiconductor device is provided that includes an aqueous solution containing a quaternary ammonium hydroxide, an oxidizing agent, an alkanolamine, and an alkali metal hydroxide. There is also provided a stripping method that includes a stripping liquid preparation step of preparing the stripping liquid and a stripping step of removing at least one deposit selected from the group consisting of a photoresist, an anti-reflection film, and an etching residue by means of the stripping liquid obtained in the stripping liquid preparation step.
摘要翻译： 提供一种用于半导体器件的剥离液，其包括含有季铵氢氧化物，氧化剂，链烷醇胺和碱金属氢氧化物的水溶液。 还提供了一种剥离方法，其包括制备剥离液的剥离液制备步骤和剥离步骤，通过装置除去选自光致抗蚀剂，抗反射膜和蚀刻残渣中的至少一种沉积物 的汽提液制备步骤中获得的汽提液。
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