-
公开(公告)号：US20120327383A1
公开(公告)日：2012-12-27
申请号：US13530065
申请日：2012-06-21
IPC分类号： G03B27/54
CPC分类号： G03F7/70133 , G03F7/705 , G03F7/70525 , G03F7/70616
摘要： The present invention discloses various system and process embodiments where wafer-metrology and direct measurements of the lithography apparatus characteristics are combined to achieve temporal drift reduction in a lithography apparatus/process using a simulation model. The simulation model may have sub-components. For example, a sub-model may represent a first set of optical conditions, and another sub-model may represent a second set of optical conditions. The first set of optical conditions may be a standard set of illumination conditions, and the second set may be a custom set of illumination conditions. Using the inter-relationship of the sub-models, stability control under custom illumination condition can be achieved faster without wafer metrology.
摘要翻译： 本发明公开了各种系统和工艺实施例，其中组合光刻设备特性的晶片计量和直接测量以在使用仿真模型的光刻设备/工艺中实现时间漂移减小。 仿真模型可能具有子组件。 例如，子模型可以表示第一组光学条件，而另一个子模型可以表示第二组光学条件。 第一组光学条件可以是标准的照明条件集合，并且第二组可以是定制的照明条件集合。 使用子模型的相互关系，在没有晶片计量的情况下，可以更快地实现定制照明条件下的稳定性控制。
-
公开(公告)号：US09459537B2
公开(公告)日：2016-10-04
申请号：US13530065
申请日：2012-06-21
CPC分类号： G03F7/70133 , G03F7/705 , G03F7/70525 , G03F7/70616
摘要： The present invention discloses various system and process embodiments where wafer-metrology and direct measurements of the lithography apparatus characteristics are combined to achieve temporal drift reduction in a lithography apparatus/process using a simulation model. The simulation model may have sub-components. For example, a sub-model may represent a first set of optical conditions, and another sub-model may represent a second set of optical conditions. The first set of optical conditions may be a standard set of illumination conditions, and the second set may be a custom set of illumination conditions. Using the inter-relationship of the sub-models, stability control under custom illumination condition can be achieved faster without wafer metrology.
摘要翻译： 本发明公开了各种系统和工艺实施例，其中组合光刻设备特性的晶片计量和直接测量以在使用仿真模型的光刻设备/工艺中实现时间漂移减小。 仿真模型可能具有子组件。 例如，子模型可以表示第一组光学条件，而另一个子模型可以表示第二组光学条件。 第一组光学条件可以是标准的照明条件集合，并且第二组可以是定制的照明条件集合。 使用子模型的相互关系，在没有晶片计量的情况下，可以更快地实现定制照明条件下的稳定性控制。
-
公开(公告)号：US08732625B2
公开(公告)日：2014-05-20
申请号：US12663121
申请日：2008-06-03
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/70666
摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine-tune already-placed SRAFs. The SRAF guidance map can be used directly to place SRAFs in a mask layout. Mask layout data including SRAFs may be generated, wherein the SRAFs are placed according to the SRAF guidance map. The SRAF guidance map can comprise an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of a sub-resolution assist feature.
摘要翻译： 公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。 创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 SRAF引导图可以直接用于将SRAF放置在掩码布局中。 可以生成包括SRAF的掩模布局数据，其中根据SRAF引导图放置SRAF。 SRAF引导图可以包括图像，其中每个像素值指示如果像素被包括为子分辨率辅助特征的一部分，则像素是否将对掩模布局中的特征的边缘行为贡献积极。
-
公开(公告)号：US08694928B2
公开(公告)日：2014-04-08
申请号：US12613244
申请日：2009-11-05
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.
摘要翻译： 本发明一般涉及用于计算光刻模型校准的测试图案选择的方法和装置。 根据一些方面，本发明的模式选择算法可以应用于任何现有的候选测试模式池。 根据一些方面，与设计最佳图案相反，本发明自动选择从现有的候选测试图案池中确定最佳模型参数值最有效的测试图案。 根据另外的方面，根据本发明的所选择的一组测试图案能够激发模型配方中的所有已知物理和化学，确保用于测试图案的晶片数据可以将模型校准驱动到最佳参数值 实现了模型公式对预测精度的上限。
-
公开(公告)号：US20140012671A1
公开(公告)日：2014-01-09
申请号：US13543705
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0251
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression to be provided to a user in a network environment. The request includes a first content and a second content. The method also includes, using a processor, determining a context of the first content and a context of the second content, determining a correlation between the context of the first content and the context of the second content, and identifying a plurality of ads as candidates for consideration. The method further includes, using the processor, ranking the plurality of identified ads, selecting an ad among the plurality of identified ads based at least in part on a result of the ranking, and providing the selected ad as the ad impression to be displayed to the user in response to receiving the request.
摘要翻译： 提供目标在线广告的方法包括在网络环境中接收要向用户提供的广告印象的请求。 该请求包括第一内容和第二内容。 该方法还包括使用处理器确定第一内容的上下文和第二内容的上下文，确定第一内容的上下文与第二内容的上下文之间的相关性，以及将多个广告标识为候选 审议。 所述方法还包括：使用所述处理器对所述多个识别的广告进行排名，至少部分地基于所述排名的结果来选择所述多个识别的广告中的广告，并且将所选择的广告提供为要显示的广告展示 用户响应于接收到请求。
-
公开(公告)号：US08584056B2
公开(公告)日：2013-11-12
申请号：US13130548
申请日：2009-11-20
申请人： Luoqi Chen , Jun Ye , Yu Cao
发明人： Luoqi Chen , Jun Ye , Yu Cao
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70083 , G03F7/70125 , G03F7/70441 , G03F7/705 , G06F17/5068
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present invention significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present invention allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present invention allows for free-form optimization, without the constraints required by conventional optimization techniques.
摘要翻译： 本发明涉及光刻设备和工艺，更具体地涉及用于优化用于光刻设备和工艺的照明源和掩模的工具。 根据某些方面，本发明通过允许直接计算成本函数的梯度来显着加快优化的收敛。 根据其他方面，本发明允许同时优化源和掩模，从而显着加速整体收敛。 根据另外的方面，本发明允许自由形式优化，而不需要常规优化技术所要求的限制。
-
公开(公告)号：US08542340B2
公开(公告)日：2013-09-24
申请号：US13003294
申请日：2009-07-07
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
CPC分类号： G03F7/70441 , G03F7/70091 , G03F7/70666
摘要： A method of optimizing an illumination pupil shape for a lithographic process comprises identifying a target pattern to be imaged by said lithographic process. It further comprises identifying at least one optimization point in said target pattern and identifying at least one design for manufacturing metric per optimization point. Additionally, it comprises selecting a set of illumination source points based on the identified at least one design for manufacturing metric and determining the illumination pupil shape based on the selected set of illumination source points.
摘要翻译： 优化用于光刻工艺的照明光瞳形状的方法包括通过所述光刻工艺识别要成像的目标图案。 其还包括识别所述目标图案中的至少一个优化点，并且识别用于制造每个优化点的度量的至少一个设计。 另外，它包括基于所识别的用于制造度量的至少一个设计来选择一组照明源点，并且基于所选择的一组照明源点确定照明光瞳形状。
-
公开(公告)号：US08527255B2
公开(公告)日：2013-09-03
申请号：US13494773
申请日：2012-06-12
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F7/705 , G03F7/70991
摘要： A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.
摘要翻译： 一种有效地模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像，其中模拟图像表示用于光刻工艺的目标设计的成像结果。
-
公开(公告)号：US08516405B2
公开(公告)日：2013-08-20
申请号：US13533942
申请日：2012-06-26
申请人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
发明人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.
摘要翻译： 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。
-
公开(公告)号：US08379991B2
公开(公告)日：2013-02-19
申请号：US12614180
申请日：2009-11-06
申请人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
发明人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
IPC分类号： G06K9/68
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F1/70 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70991 , G06F17/5068
摘要： A method for determining a difference between a reference image and a further image of a pattern, the method including determining a reference imaging function; determining parameters of a difference function representative of a difference between the reference imaging function and a further imaging function; calculating a difference between the reference image and the further image of the pattern based on the difference function and the determined parameters.
摘要翻译： 一种用于确定参考图像与图案的另一图像之间的差异的方法，所述方法包括确定参考成像功能; 确定代表参考成像功能和另外的成像功能之间的差异的差分函数的参数; 基于差分函数和确定的参数来计算参考图像和图像的另外图像之间的差。
-
-
-
-
-
-
-
-
-
搜索结果
241 条记录 (耗时 0.046 秒)
