公开(公告)号：US20090192255A1

公开(公告)日：2009-07-30

申请号：US12191248

申请日：2008-08-13

申请人： Yu-Ming Lin ,  Ching-Chang Hsieh ,  Lik-Hang Chau

发明人： Yu-Ming Lin ,  Ching-Chang Hsieh ,  Lik-Hang Chau

IPC分类号： C08K3/34

CPC分类号： C08K9/06 ,  C08K2201/011

摘要： The disclosed is a silica-polymeric resin composite of blending the silicon dioxide nanoparticles in thermoplastic polymer and method for manufacturing the same, thereby improving its scratch-resistance. A thermoplastic polymer is dissolved in solvent to form a thermoplastic polymer solution. The polymer solution is evenly mixed with a silicon dioxide sol, and the solvent is then removed to complete the silica-polymeric resin composite. In the silica-polymeric resin composite, the silicon dioxide nanoparticles and the thermoplastic polymer have no chemical bonding therebetween, and the silicon dioxide nanoparticles are evenly dispersed in the thermoplastic polymer.

摘要翻译： 所公开的是将二氧化硅纳米颗粒混合在热塑性聚合物中的二氧化硅 - 聚合树脂复合材料及其制造方法，从而提高其耐刮擦性。 将热塑性聚合物溶解在溶剂中以形成热塑性聚合物溶液。 将聚合物溶液与二氧化硅溶胶均匀混合，然后除去溶剂以完成二氧化硅 - 聚合物树脂复合材料。 在二氧化硅 - 聚合物树脂复合材料中，二氧化硅纳米颗粒和热塑性聚合物之间没有化学键合，并且二氧化硅纳米颗粒均匀分散在热塑性聚合物中。

公开(公告)号：US07786339B2

公开(公告)日：2010-08-31

申请号：US11882720

申请日：2007-08-03

申请人： Yu-Ming Lin ,  Lik-Hang Chau ,  Da-Hai Lin ,  Chun-Ting Tung

发明人： Yu-Ming Lin ,  Lik-Hang Chau ,  Da-Hai Lin ,  Chun-Ting Tung

IPC分类号： A62D3/00

CPC分类号： A62D3/176 ,  A62D2101/08

摘要： A method of removing organic contaminants from surfaces of solid wastes is disclosed. The method includes the steps of forming a TiO2 sol; mixing the solid wastes and the TiO2 sol by stirring. Furthermore, the mixture undergoes photo-catalytic remediation under illumination of a UV source prior to a solid-liquid separation process of the illuminated TiO2 sol and solid wastes.

摘要翻译： 公开了从固体废物表面除去有机污染物的方法。 该方法包括形成TiO 2溶胶的步骤; 通过搅拌混合固体废物和TiO2溶胶。 此外，在照射的TiO 2溶胶和固体废物的固液分离过程之前，该混合物在UV源的照射下进行光催化修复。

公开(公告)号：US20080161630A1

公开(公告)日：2008-07-03

申请号：US11882720

申请日：2007-08-03

申请人： Yu-Ming Lin ,  Lik-Hang Chau ,  Da-Hai Lin ,  Chun-Ting Tung

发明人： Yu-Ming Lin ,  Lik-Hang Chau ,  Da-Hai Lin ,  Chun-Ting Tung

IPC分类号： A62D3/176

CPC分类号： A62D3/176 ,  A62D2101/08

摘要： A method of removing organic contaminants from surfaces of solid wastes is disclosed. The method includes the steps of forming a TiO2 sol; mixing the solid wastes and the TiO2 sol by stirring. Furthermore, the mixture undergoes photo-catalytic remediation under illumination of a UV source prior to a solid-liquid separation process of the illuminated TiO2 sol and solid wastes.

摘要翻译： 公开了从固体废物表面除去有机污染物的方法。 该方法包括以下步骤：形成TiO 2溶胶; 通过搅拌混合固体废物和TiO 2溶胶。 此外，在照射的TiO 2溶胶和固体废物的固液分离过程之前，该混合物在UV源的照射下进行光催化修复。

公开(公告)号：US08926853B2

公开(公告)日：2015-01-06

申请号：US13592370

申请日：2012-08-23

申请人： Xin Zhao ,  Yu-Ming Lin

发明人： Xin Zhao ,  Yu-Ming Lin

IPC分类号： B44C1/22 ,  B05D3/10

CPC分类号： H01M4/133 ,  B82Y30/00 ,  H01M4/96 ,  H01M8/04216 ,  H01M10/0525 ,  Y10T29/49115 ,  Y10T29/49885 ,  Y10T428/30

摘要： Aspects of the invention are directed to a method of forming graphene structures. Initially, a cluster of particles is received. The cluster of particles comprises a plurality of particles with each particle in the plurality of particles contacting one or more other particles in the plurality of particles. Subsequently, one or more layers are deposited on the cluster of particles with the one or more layers comprising graphene. The plurality of particles are then etched away without substantially etching the deposited one or more layers. Lastly, the remaining one or more layers are dried. The resultant graphene structures are particularly resistant to the negative effects of aggregation and compaction.

摘要翻译： 本发明的方面涉及形成石墨烯结构的方法。 最初，接收到一群粒子。 颗粒簇包括多个颗粒，多个颗粒中的每个颗粒与多个颗粒中的一个或多个其它颗粒接触。 随后，一层或多层沉积在颗粒簇上，其中一层或多层包含石墨烯。 然后蚀刻掉多个颗粒，而基本上不蚀刻沉积的一个或多个层。 最后，将剩余的一层或多层干燥。 所得到的石墨烯结构特别抵抗聚集和压实的负面影响。

公开(公告)号：US08803130B2

公开(公告)日：2014-08-12

申请号：US13492097

申请日：2012-06-08

申请人： Ali Afzali-Ardakani ,  Phaedon Avouris ,  Damon B. Farmer ,  Yu-Ming Lin ,  Yu Zhu

发明人： Ali Afzali-Ardakani ,  Phaedon Avouris ,  Damon B. Farmer ,  Yu-Ming Lin ,  Yu Zhu

IPC分类号： H01L29/06

CPC分类号： H01L29/1606 ,  H01L29/42376 ,  H01L29/66431 ,  H01L29/7781 ,  Y10S977/734

摘要： Graphene transistor devices and methods of their fabrication are disclosed. One such graphene transistor device includes source and drain electrodes and a gate structure including a dielectric sidewall spacer that is disposed between the source and drain electrodes. The device further includes a graphene layer that is adjacent to at least one of the source and drain electrodes, where an interface between the source/drain electrode(s) and the graphene layer maintains a consistent degree of electrical conductivity throughout the interface.

摘要翻译： 公开了石墨烯晶体管器件及其制造方法。 一种这样的石墨烯晶体管器件包括源电极和漏电极以及包括设置在源极和漏极之间的电介质侧壁间隔物的栅极结构。 该器件还包括与源极和漏极电极中的至少一个相邻的石墨烯层，其中源/漏电极和石墨烯层之间的界面在整个界面处保持一致的电导率。

公开(公告)号：US20140060726A1

公开(公告)日：2014-03-06

申请号：US13603786

申请日：2012-09-05

申请人： Yijing Yin Stehle ,  Xuesong Li ,  Yu-Ming Lin ,  Chun-Yung Sung

发明人： Yijing Yin Stehle ,  Xuesong Li ,  Yu-Ming Lin ,  Chun-Yung Sung

IPC分类号： B32B38/10 ,  B82Y40/00

CPC分类号： B32B37/26 ,  B32B2037/268 ,  B32B2457/00 ,  B82Y40/00

摘要： Aspects of the invention are directed to a method of forming a thin film adhered to a target substrate. The method comprises the steps of: (i) forming the thin film on a deposition substrate; (ii) depositing a support layer on the thin film; (iii) removing the deposition substrate without substantially removing the thin film and the support layer; (iv) drying the thin film and the support layer while the thin film is only adhered to the support layer; (v) placing the dried thin film and the dried support layer on the target substrate such that the thin film adheres to the target substrate; and (vi) removing the support layer without substantially removing the thin film and the target substrate.

摘要翻译： 本发明的方面涉及一种形成粘附到目标基底上的薄膜的方法。 该方法包括以下步骤：（i）在沉积衬底上形成薄膜; （ii）在薄膜上沉积支撑层; （iii）除去沉积基板，而基本不除去薄膜和支撑层; （iv）在薄膜仅粘附到支撑层的同时干燥薄膜和支撑层; （v）将干燥的薄膜和干燥的支撑层放置在目标基板上，使得薄膜粘附到目标基板; 和（vi）除去支撑层而基本上不去除薄膜和目标基底。

公开(公告)号：US20130207080A1

公开(公告)日：2013-08-15

申请号：US13369901

申请日：2012-02-09

申请人： Christos D. Dimitrakopoulos ,  Damon B. Farmer ,  Alfred Grill ,  Yu-Ming Lin ,  Deborah A. Neumayer ,  Dirk Pfeiffer ,  Wenjuan Zhu

发明人： Christos D. Dimitrakopoulos ,  Damon B. Farmer ,  Alfred Grill ,  Yu-Ming Lin ,  Deborah A. Neumayer ,  Dirk Pfeiffer ,  Wenjuan Zhu

IPC分类号： H01L29/775 ,  H01L21/336

CPC分类号： H01L21/0237 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/02378 ,  H01L21/02527 ,  H01L21/02617 ,  H01L21/02661 ,  H01L29/1606 ,  H01L29/4908 ,  H01L29/513 ,  H01L29/66045 ,  H01L29/7781 ,  H01L29/78684

摘要： A silicon nitride layer is provided on an uppermost surface of a graphene layer and then a hafnium dioxide layer is provided on an uppermost surface of the silicon nitride layer. The silicon nitride layer acts as a wetting agent for the hafnium dioxide layer and thus prevents the formation of discontinuous columns of hafnium dioxide atop the graphene layer. The silicon nitride layer and the hafnium dioxide layer, which collectively form a low EOT bilayer gate dielectric, exhibit continuous morphology atop the graphene layer.

摘要翻译： 在石墨烯层的最上表面上设置氮化硅层，然后在氮化硅层的最上表面上设置二氧化铪层。 氮化硅层用作二氧化铪层的润湿剂，从而防止在石墨烯层顶上形成不连续的二氧化铪塔。 共同形成低EOT双层栅极电介质的氮化硅层和二氧化铪层在石墨烯层的顶部呈现连续的形态。

公开(公告)号：US08455297B1

公开(公告)日：2013-06-04

申请号：US12831656

申请日：2010-07-07

申请人： Phaedon Avouris ,  Kuan-Neng Chen ,  Yu-Ming Lin

发明人： Phaedon Avouris ,  Kuan-Neng Chen ,  Yu-Ming Lin

IPC分类号： H01L51/40

CPC分类号： H01L21/768 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/50 ,  H01L21/6835 ,  H01L21/76885 ,  H01L23/4827 ,  H01L2221/1094 ,  H01L2221/68359 ,  H01L2224/83894 ,  H01L2924/01025 ,  H01L2924/01029 ,  H01L2924/01046

摘要： Techniques for fabricating carbon nanotube-based devices are provided. In one aspect, a method for fabricating a carbon nanotube-based integrated circuit is provided. The method comprises the following steps. A first wafer comprising carbon nanotubes is provided. A second wafer comprising one or more device elements is provided. One or more of the carbon nanotubes are connected with one or more of the device elements by bonding the first wafer and the second wafer together. A carbon nanotube-based integrated circuit is also provided.

摘要翻译： 提供了制造基于碳纳米管的器件的技术。 一方面，提供一种制造碳纳米管集成电路的方法。 该方法包括以下步骤。 提供了包括碳纳米管的第一晶片。 提供包括一个或多个器件元件的第二晶片。 一个或多个碳纳米管通过将第一晶片和第二晶片结合在一起而与一个或多个器件元件连接。 还提供了一种基于碳纳米管的集成电路。

公开(公告)号：US08344358B2

公开(公告)日：2013-01-01

申请号：US12876454

申请日：2010-09-07

申请人： Phaedon Avouris ,  Damon B. Farmer ,  Yu-Ming Lin ,  Yu Zhu

发明人： Phaedon Avouris ,  Damon B. Farmer ,  Yu-Ming Lin ,  Yu Zhu

IPC分类号： H01L29/76

CPC分类号： H01L29/1606 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/778 ,  H01L29/78684

摘要： A graphene-based field effect transistor includes source and drain electrodes that are self-aligned to a gate electrode. A stack of a seed layer and a dielectric metal oxide layer is deposited over a patterned graphene layer. A conductive material stack of a first metal portion and a second metal portion is formed above the dielectric metal oxide layer. The first metal portion is laterally etched employing the second metal portion, and exposed portions of the dielectric metal oxide layer are removed to form a gate structure in which the second metal portion overhangs the first metal portion. The seed layer is removed and the overhang is employed to shadow proximal regions around the gate structure during a directional deposition process to form source and drain electrodes that are self-aligned and minimally laterally spaced from edges of the gate electrode.

摘要翻译： 基于石墨烯的场效应晶体管包括与栅电极自对准的源极和漏极。 在图案化的石墨烯层上沉积种子层和电介质金属氧化物层的堆叠。 第一金属部分和第二金属部分的导电材料堆叠形成在电介质金属氧化物层的上方。 使用第二金属部分横向蚀刻第一金属部分，去除电介质金属氧化物层的暴露部分以形成其中第二金属部分悬垂在第一金属部分上的栅极结构。 移除晶种层并且在定向沉积工艺期间使用突出部来遮蔽栅极结构周围的近端区域，以形成与栅电极的边缘自对准且最小程度地横向间隔的源电极和漏电极。

公开(公告)号：US20120326129A1

公开(公告)日：2012-12-27

申请号：US13604254

申请日：2012-09-05

申请人： Yu-Ming Lin ,  Jeng-Bang Yau

发明人： Yu-Ming Lin ,  Jeng-Bang Yau

IPC分类号： H01L29/78

CPC分类号： H01L29/1606 ,  B82Y10/00 ,  H01L27/124 ,  H01L29/0665 ,  H01L29/45 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/7781 ,  H01L29/78618 ,  H01L29/78684

摘要： An integrated circuit includes a graphene layer, the graphene layer comprising a region of undoped graphene, the undoped graphene comprising a channel of a transistor, and a region of doped graphene, the doped graphene comprising a contact of the transistor; and a gate of the transistor, the gate comprising a carbon nanotube film. A method of fabricating an integrated circuit comprising graphene and carbon nanotubes, includes forming a graphene layer; doping a portion of the graphene layer, resulting in doped graphene and undoped graphene; forming a carbon nanotube film; and etching the carbon nanotube film to form a gate of a transistor, wherein the transistor further comprises a channel comprising the undoped graphene and a contact comprising the doped graphene. A transistor includes a gate, the gate comprising a carbon nanotube film; a channel, the channel comprising undoped graphene; and a contact, the contact comprising doped graphene.

摘要翻译： 集成电路包括石墨烯层，所述石墨烯层包括未掺杂的石墨烯的区域，所述未掺杂的石墨烯包括晶体管的沟道和掺杂的石墨烯的区域，所述掺杂的石墨烯包括所述晶体管的接触; 和晶体管的栅极，所述栅极包括碳纳米管膜。 一种制造包括石墨烯和碳纳米管的集成电路的方法，包括形成石墨烯层; 掺杂一部分石墨烯层，导致掺杂的石墨烯和未掺杂的石墨烯; 形成碳纳米管膜; 以及蚀刻所述碳纳米管膜以形成晶体管的栅极，其中所述晶体管还包括包含所述未掺杂的石墨烯的沟道和包含所述掺杂石墨烯的接触。 晶体管包括栅极，栅极包括碳纳米管膜; 通道，通道包括未掺杂的石墨烯; 和触点，所述触点包括掺杂的石墨烯。