公开(公告)号：US20120031337A1

公开(公告)日：2012-02-09

申请号：US13265316

申请日：2010-06-30

申请人： Yuichi Shiina ,  Iwao Watanabe

发明人： Yuichi Shiina ,  Iwao Watanabe

IPC分类号： C23C16/50

CPC分类号： C23C14/564 ,  C23C14/325 ,  H01J37/32357 ,  H01J37/32477

摘要： A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a short circuit. The annular rib for the droplet capture is divided into multiple rib segments. Thus, from the beginning of the formation of the deposited matter on the annular rib due to the aggregation of the material in the plasma stream, it is possible to reduce the size of the deposited matter. By reducing the size of this deposited matter, when a piece of the deposited matter falls into the plasma generation portion, the piece of the deposited matter gets into a groove portion provided between a cathode and a wall surface of the plasma generation portion, thereby preventing the electrical short circuit between the cathode and the wall surface.

摘要翻译： 形成在等离子体处理装置中用于液滴捕获的环形肋上的等离子体流衍生的沉积物被防止落入等离子体产生部分并导致短路。 用于液滴捕获的环形肋被分成多个肋段。 因此，由于等离子体流中的材料的聚集，从形成环形肋上的沉积物的开始开始，可以减小沉积物的尺寸。 通过减小该沉积物的尺寸，当一块沉积物落入等离子体产生部分时，沉积物件进入设置在等离子体产生部分的阴极和壁表面之间的槽部分中，从而防止 阴极和壁表面之间的电气短路。

公开(公告)号：US08833299B2

公开(公告)日：2014-09-16

申请号：US13265316

申请日：2010-06-30

申请人： Yuichi Shiina ,  Iwao Watanabe

发明人： Yuichi Shiina ,  Iwao Watanabe

IPC分类号： C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C14/32 ,  H01J37/32 ,  C23C14/56 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C14/564 ,  C23C14/325 ,  H01J37/32357 ,  H01J37/32477

摘要： A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a short circuit. The annular rib for the droplet capture is divided into multiple rib segments. Thus, from the beginning of the formation of the deposited matter on the annular rib due to the aggregation of the material in the plasma stream, it is possible to reduce the size of the deposited matter. By reducing the size of this deposited matter, when a piece of the deposited matter falls into the plasma generation portion, the piece of the deposited matter gets into a groove portion provided between a cathode and a wall surface of the plasma generation portion, thereby preventing the electrical short circuit between the cathode and the wall surface.

摘要翻译： 形成在等离子体处理装置中用于液滴捕获的环形肋上的等离子体流衍生的沉积物被防止落入等离子体产生部分并导致短路。 用于液滴捕获的环形肋被分成多个肋段。 因此，由于等离子体流中的材料的聚集，从形成环形肋上的沉积物的开始开始，可以减小沉积物的尺寸。 通过减小该沉积物的尺寸，当一块沉积物落入等离子体产生部分时，沉积物件进入设置在等离子体产生部分的阴极和壁表面之间的槽部分中，从而防止 阴极和壁表面之间的电气短路。

公开(公告)号：US08562800B2

公开(公告)日：2013-10-22

申请号：US12736234

申请日：2009-03-25

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： C23C14/00 ,  H01J27/14

CPC分类号： H01J37/32366 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32357 ,  H05H1/50

摘要： A plasma processing apparatus using a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma advancing tube (P0) connected to a plasma generating portion (A); a first plasma advancing tube (P1) connected to the straight plasma advancing tube (P0) in a bent manner; a second plasma advancing tube (P2) connected to a finishing end of the first plasma advancing tube (P1) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P3), which is connected to the finishing end of the second plasma advancing tube (P2) in a bent manner and discharges plasma from a plasma outlet.

摘要翻译： 使用等离子体发生装置的等离子体处理装置可以有效地除去在等离子体中混合的液滴，并且可以提高其中使用高纯度等离子体的成膜中的表面加工精度。 布置在等离子体行进路径中的液滴去除部分由连接到等离子体产生部分（A）的直等离子行进管（P0）组成。 以弯曲的方式连接到直等离子行进管（P0）的第一等离子行进管（P1） 通过相对于第一等离子行进管的管轴以预定的倾斜角倾斜地布置而连接到第一等离子行进管（P1）的末端的第二等离子行进管（P2） 以及第三等离子行进管（P3），其以弯曲的方式连接到第二等离子行进管（P2）的末端，并从等离子体出口排出等离子体。

公开(公告)号：US20100018859A1

公开(公告)日：2010-01-28

申请号：US12311258

申请日：2007-09-27

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： C23C14/00

CPC分类号： H01J37/32357 ,  C23C14/325 ,  H01J37/32055

摘要： Intended is to provide a plasma generating apparatus, which can remove such a droplet efficiently as might otherwise migrate into a plasma and which can constitute a droplet removing portion simply and inexpensively thereby to improve a, surface treating precision such as a filming with a highly pure plasma. In a plasma advancing path (5), there is arranged the droplet removing portion for removing the droplet, which is by-produced from a cathode (4) at the plasma generating time. This droplet removing portion includes a radially enlarged tube (3) forming the plasma advancing path (5), an introduction side radially reduced tube (34) connected to the plasma introducing side initial end of the radially enlarged tube (3), a discharge side radially reduced tube (39) connected to the plasma discharge side terminal end of the radially enlarged tube (3), and stepped portions (40) formed at the initial end and the terminal end of the radially enlarged tube (3).

摘要翻译： 旨在提供一种等离子体产生装置，其可以有效地去除这样的液滴，否则其将迁移到等离子体中，并且可以简单且廉价地构成液滴去除部，从而提高表面处理精度，例如高纯度的成膜 等离子体。 在等离子体行进路径（5）中，布置有用于去除在等离子体产生时从阴极（4）产生的液滴的液滴去除部分。 该液滴除去部包括形成等离子体行进路径（5）的放大管（3），与放大管（3）的等离子体引入侧初始端连接的引入侧径向缩径管（34） 连接到放大管（3）的等离子体放电侧终端的径向缩径管（39）和形成在放大管（3）的初始端和末端的阶梯部（40）。

公开(公告)号：US20110109227A1

公开(公告)日：2011-05-12

申请号：US12736308

申请日：2009-03-04

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： H05H1/24

CPC分类号： C23C14/3464 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3435

摘要： The objective of the present invention is to provide a target exchange type plasma generating apparatus in which the positions of two targets can be adjusted independent of each other. A target exchanging mechanism (6) of a plasma generating apparatus for generating plasma by vacuum arc discharge comprises a main holder (32) driven half a rotation by a main motor (M), containing sections (32a, 32b) arranged opposite to each other across the diameter of the main holder, auxiliary holders (16, 18) rotatably contained in the containing sections (32a, 32b), two auxiliary motors (M1, M2) for spinning the auxiliary holders, sliders (S1, S2) for vertically moving the auxiliary holders (16, 18) in the direction of the spinning shafts of the auxiliary holders, and targets (T1, T2) fitted to the auxiliary holders (16, 18). The positions of the targets (T1, T2) are exchanged by rotating the main holder (32) by half a rotation. When the main holder (32) is stationary, the targets (T1, T2) are driven so as to be rotated and vertically moved independent of each other to a discharge position and a polishing position.

摘要翻译： 本发明的目的是提供一种目标交换式等离子体生成装置，其中可以彼此独立地调节两个目标的位置。 用于通过真空电弧放电产生等离子体的等离子体产生装置的目标交换机构（6）包括由主电动机（M）驱动半转的主保持器（32），包含彼此相对布置的容纳部分（32a，32b） 横跨主支架的直径，可旋转地容纳在容纳部分（32a，32b）中的辅助保持器（16,18），用于旋转辅助支架的两个辅助电动机（M1，M2），用于垂直移动的滑块（S1，S2） 辅助保持器（16,18）沿着辅助保持器的纺纱轴的方向，以及装配到辅助保持器（16,18）的目标（T1，T2）。 通过使主保持器（32）旋转半个旋转来交换目标（T1，T2）的位置。 当主保持器（32）静止时，目标（T1，T2）被驱动以便彼此独立地旋转和垂直移动到排出位置和抛光位置。

公开(公告)号：US20110068004A1

公开(公告)日：2011-03-24

申请号：US12736234

申请日：2009-03-25

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： C23C14/35 ,  C23C16/50

CPC分类号： H01J37/32366 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32357 ,  H05H1/50

摘要： Provided is a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A plasma processing apparatus using such plasma generating apparatus is also provided. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma straightly advancing tube (P0) connected to a plasma generating portion (A); a first plasma advancing tube (P1) connected to the straight plasma straightly advancing tube (P0) in a bent manner; a second plasma advancing tube (P2) connected to a finishing end of the first plasma advancing tube (P1) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P3), which is connected to the finishing end of the second plasma advancing tube (P2) in a bent manner and discharges plasma from a plasma outlet.

摘要翻译： 提供了一种等离子体产生装置，通过该等离子体产生装置可以有效地除去在等离子体中混合的液滴，并且可以在使用高纯度等离子体的成膜中提高表面处理精度。 还提供了使用这种等离子体生成装置的等离子体处理装置。 布置在等离子体行进路径中的液滴去除部分由连接到等离子体产生部分（A）的直的等离子体直行管（P0）组成。 以弯曲的方式连接到直的等离子体直进管（P0）的第一等离子行进管（P1） 通过相对于第一等离子行进管的管轴以预定的倾斜角倾斜地布置而连接到第一等离子行进管（P1）的末端的第二等离子行进管（P2） 以及第三等离子体行进管（P3），其以弯曲的方式连接到第二等离子体行进管（P2）的末端，并从等离子体出口排出等离子体。

公开(公告)号：US07823537B2

公开(公告)日：2010-11-02

申请号：US10592286

申请日：2005-02-17

申请人： Yuichi Shiina ,  Hirofumi Takikawa

发明人： Yuichi Shiina ,  Hirofumi Takikawa

IPC分类号： C23C16/00

CPC分类号： C23C14/325 ,  H01J37/32055 ,  H01J37/32614 ,  H05H1/50

摘要： A plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-and-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-and-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation.

摘要翻译： 用于形成薄膜的等离子体发生器包括用于供应电弧等离子体的构成颗粒的阴极（4）和用于启动和维持电弧等离子体的触发和阳极（6）。 阴极（4）的阴极表面（4a）是平坦的或细微的，并且与阴极表面（4a）接触的触发器和阳极（6）的阳极表面（6c）是平坦的。 阳极表面（6c）被布置成当开始等离子体时与整个阴极表面（4a）接触。 阴极表面（4a）的细突出端（4b）和阳极表面（6c）之间的接触点被制成等离子体发射点。 当通过等离子体发射消耗投影时，可以将与阳极表面（6c）接触的另一突出端用作另一等离子体发射点，从而能够间歇地操作持续重复序列操作。

公开(公告)号：US20100059369A1

公开(公告)日：2010-03-11

申请号：US12449951

申请日：2008-03-27

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： C23C14/32 ,  H05H1/32

CPC分类号： H01J37/32633 ,  H01J37/147 ,  H01J37/3178 ,  H01J37/32055 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/3142 ,  H05H1/48

摘要： There is provided a plasma generating apparatus having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing portion can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of a cathode (407) of said plasma gun is surrounded by an enclosure member (420) and a droplet removing device (406) constituted by laying a plurality of droplet collecting members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the collecting member (411) and a plasma advancing path (402) have no relation connected with an arc power supply (409) and are held in an electrically neutral floating state.

摘要翻译： 提供了一种具有等离子体枪的等离子体发生装置，其能够有效地除去与等离子体混合的液滴，而不会减少由真空电弧放电产生的等离子体的有效量，并且其中可以容易且廉价地构成液滴除去部分，并且表面处理的精度 的高纯度等离子体膜可以提高。 所述等离子体枪的阴极（407）的周边被封闭构件（420）包围，并且通过将多个液滴收集构件（411）放置在多层中而构成的液滴去除装置（406）设置在外壳的内部 会员（420）。 封闭构件（420），收集构件（411）和等离子体行进路径（402）与电弧电源（409）没有关联，并且保持在电中性浮动状态。

公开(公告)号：US20070193518A1

公开(公告)日：2007-08-23

申请号：US10592286

申请日：2005-02-17

申请人： Yuichi Shiina ,  Hirofumi Takikawa

发明人： Yuichi Shiina ,  Hirofumi Takikawa

IPC分类号： C23C16/00

CPC分类号： C23C14/325 ,  H01J37/32055 ,  H01J37/32614 ,  H05H1/50

摘要： A plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-and-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-and-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation.

摘要翻译： 用于形成薄膜的等离子体发生器包括用于供应电弧等离子体的构成颗粒的阴极（4）和用于启动和维持电弧等离子体的触发和阳极（6）。 阴极（4）的阴极表面（4a）是平坦的或细微的，并且与阴极表面（4a）接触的触发器和阳极（6）的阳极表面（6c）是平的 。 阳极表面（6c）被布置成当等离子体开始时与整个阴极表面（4a）接触。 阴极表面（4a）的微小突出端（4b）和阳极表面（6c）之间的接触点被制成等离子体发射点。 当通过等离子体发射消耗投影时，可以将与阳极表面（6c）接触的另一突出端用作另一等离子体发射点，从而能够间歇地操作持续重复序列操作。

公开(公告)号：US08999122B2

公开(公告)日：2015-04-07

申请号：US13122392

申请日：2010-02-10

申请人： Yuichi Shiina

发明人： Yuichi Shiina

IPC分类号： C23C14/00 ,  H01J37/32

CPC分类号： H01J37/32422 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32376 ,  H01J37/32669 ,  H01J37/32871

摘要： Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought.In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically. The electric potential of the plasma transport tube or the small transport tubes is set to GND, a variable positive electric potential, or a variable negative electric potential, by putting the plasma transport tube or the multiple small transport tubes in an electric floating state, or connecting bias power supplies EB 01, EB 23 for transport tube. Also, the small transport tubes are connected in a bent manner, and droplets are removed by the geometric structure.

摘要翻译： 以更高的效率除去与等离子体混合的电荷液滴和中性液滴，并且寻求通过高纯度等离子体对成膜的表面处理精度的改善。 在包括等离子体产生部分A，等离子体输送管B和等离子体处理部分C的等离子体处理装置中，构成了一种绝缘体插入等离子体处理装置，其中等离子体输送管B与等离子体产生部分A和等离子体处理部分C电 通过在等离子体输送管的起始端侧和最终端侧之间插入绝缘体IS和绝缘体IF。 等离子体输送管B通过中间绝缘体II1分成多个小输送管B01，B23，每个小输送管是独立的。 等离子输送管或小输送管的电位通过将等离子体输送管或多个小输送管置于电浮动状态而设定为GND，可变正电位或可变负电位，或 连接偏置电源EB 01，EB 23用于运输管。 此外，小的输送管以弯曲的方式连接，并且通过几何结构去除液滴。