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    Pyroelectric infrared ray sensor
    1.
    发明授权
    Pyroelectric infrared ray sensor 失效
    热电红外线传感器

    公开(公告)号：US5949072A

    公开(公告)日：1999-09-07

    申请号：US972867

    申请日：1997-11-18

    申请人： Yuji Takada ,  Teruki Hatatani ,  Toshio Fujimura ,  Shinji Sakamoto

    发明人： Yuji Takada ,  Teruki Hatatani ,  Toshio Fujimura ,  Shinji Sakamoto

    IPC分类号： G01J5/10 ,  G01J5/00

    CPC分类号： G01J5/10

    摘要： A pyroelectric infrared ray sensor is constituted with a current-voltage converting circuit utilizing an impedance of feedback capacity, obtained by adding the feedback capacity to an operational amplifier receiving as an input an element current from a pyroelectric element, whereby the current-voltage converting circuit can be improved in S/N ratio without altering characteristics of the pyroelectric element.

    摘要翻译： 热电式红外线传感器由利用反馈容量阻抗的电流 - 电压转换电路构成，该电路电压转换电路是通过将反馈电容加到从热电元件接收元件电流作为输入的运算放大器，由此电流 - 电压转换电路 可以提高S / N比，而不改变热电元件的特性。

    Pyroelectric infrared ray sensor
    2.
    发明授权
    Pyroelectric infrared ray sensor 失效
    热电红外线传感器

    公开(公告)号：US5917187A

    公开(公告)日：1999-06-29

    申请号：US972907

    申请日：1997-11-18

    申请人： Yuji Takada ,  Toshio Fujimura ,  Teruki Hatatani ,  Shinji Sakamoto

    发明人： Yuji Takada ,  Toshio Fujimura ,  Teruki Hatatani ,  Shinji Sakamoto

    IPC分类号： G01J1/42 ,  G01J5/02 ,  G01J5/34 ,  H03K17/94 ,  G01J5/10

    CPC分类号： H03K17/941

    摘要： A pyroelectric infrared ray sensor includes a voltage amplifying circuit provided with a signal amplifying part having a non-inverting amplifier, with an integrating circuit, and with voltage dividing resistors connected at a position where an input V.sub.IN to the voltage amplifying circuit and an output V.sub.B of the integrating circuit are resistance-divided to a non-inverting input terminal of the signal amplifying part which is practically formed by an operating amplifier, wherein the signal amplifying part includes a low-pass filter formed by a resistor and a capacitor, whereby the electrostatic capacity of the required capacitor can be minimized, and the entire circuit can be minimized in size and also in manufacturing costs.

    摘要翻译： 热电式红外线传感器包括具有积分电路的设置有具有非反相放大器的信号放大部分的电压放大电路，以及连接到电压放大电路的输入VIN和输出VB的位置的分压电阻 积分电路的电阻分压为实际上由运算放大器形成的信号放大部分的非反相输入端，其中信号放大部分包括由电阻器和电容器形成的低通滤波器，由此， 所需电容器的静电容量可以最小化，整个电路的尺寸和制造成本都可以最小化。

    SPATIAL INFORMATION DETECTING APPARATUS
    3.
    发明申请
    SPATIAL INFORMATION DETECTING APPARATUS 有权
    空间信息检测装置

    公开(公告)号：US20090045359A1

    公开(公告)日：2009-02-19

    申请号：US12096019

    申请日：2007-10-10

    申请人： Minoru Kumahara ,  Yusuke Hashimoto ,  Shinji Sakamoto ,  Yuji Takada

    发明人： Minoru Kumahara ,  Yusuke Hashimoto ,  Shinji Sakamoto ,  Yuji Takada

    IPC分类号： G01N21/84

    CPC分类号： G01S17/36 ,  G01S7/4913 ,  G01S7/4915 ,  G01S7/493 ,  G01S7/497 ,  G01S17/89

    摘要： In an apparatus using an intensity-modulated light for detection of spatial information based upon light intensity of light reflected from a target space, a timing synchronization circuit is provided to synchronize a phase of the intensity-modulated light from a light-emitting element with a timing of operating a light-receiving element receiving the intensity-modulated light. The light-receiving element is caused to operate for enabling the detection of intensity of the received light for each of a plurality of phase regions within one cycle of the intensity-modulated light. The timing synchronization circuit functions to compare a cyclic variation determining the operation of the light-receiving element with a cyclic variation associated with an output from a light-emitting element driving circuit in order to keep a constant phase difference between these two cyclic variations.

    摘要翻译： 在使用强度调制光用于基于从目标空间反射的光的光强度来检测空间信息的装置中，提供定时同步电路以使来自发光元件的强度调制光的相位与 操作接收强度调制光的光接收元件的定时。 导致光接收元件操作，以便能够在强度调制光的一个周期内检测多个相位区域中的每一个的接收光的强度。 定时同步电路用于将确定光接收元件的操作的循环变化与与发光元件驱动电路的输出相关联的循环变化进行比较，以便在这两个循环变化之间保持恒定的相位差。

    Spatial information detecting apparatus
    4.
    发明授权
    Spatial information detecting apparatus 有权
    空间信息检测装置

    公开(公告)号：US07755743B2

    公开(公告)日：2010-07-13

    申请号：US12096019

    申请日：2007-10-10

    申请人： Minoru Kumahara ,  Yusuke Hashimoto ,  Shinji Sakamoto ,  Yuji Takada

    发明人： Minoru Kumahara ,  Yusuke Hashimoto ,  Shinji Sakamoto ,  Yuji Takada

    IPC分类号： G01C3/08

    CPC分类号： G01S17/36 ,  G01S7/4913 ,  G01S7/4915 ,  G01S7/493 ,  G01S7/497 ,  G01S17/89

    摘要： In an apparatus using an intensity-modulated light for detection of spatial information based upon light intensity of light reflected from a target space, a timing synchronization circuit is provided to synchronize a phase of the intensity-modulated light from a light-emitting element with a timing of operating a light-receiving element receiving the intensity-modulated light. The light-receiving element is caused to operate for enabling the detection of intensity of the received light for each of a plurality of phase regions within one cycle of the intensity-modulated light. The timing synchronization circuit functions to compare a cyclic variation determining the operation of the light-receiving element with a cyclic variation associated with an output from a light-emitting element driving circuit in order to keep a constant phase difference between these two cyclic variations.

    摘要翻译： 在使用强度调制光用于基于从目标空间反射的光的光强度来检测空间信息的装置中，提供定时同步电路以使来自发光元件的强度调制光的相位与 操作接收强度调制光的光接收元件的定时。 导致光接收元件操作，以便能够在强度调制光的一个周期内检测多个相位区域中的每一个的接收光的强度。 定时同步电路用于将确定光接收元件的操作的循环变化与与发光元件驱动电路的输出相关联的循环变化进行比较，以便在这两个循环变化之间保持恒定的相位差。

    WAFER CONVEYANCE METHOD AND WAFER CONVEYANCE DEVICE
    6.
    发明申请
    WAFER CONVEYANCE METHOD AND WAFER CONVEYANCE DEVICE 审中-公开
    波浪输送方法和波浪输送装置

    公开(公告)号：US20090297302A1

    公开(公告)日：2009-12-03

    申请号：US12468576

    申请日：2009-05-19

    申请人： Shinji Sakamoto

    发明人： Shinji Sakamoto

    IPC分类号： H01L21/677

    CPC分类号： H01L21/6735 ,  H01L21/67712 ,  H01L21/67718

    摘要： In order to make it possible to reduce the occurrence of physical damage to wafers during conveyance, a state is established in which wafers W are contained in a wafer cassette 1 standing approximately vertically, and the wafer cassette 1 is conveyed, in this state in which the wafers W are contained in the wafer cassette 1 standing approximately vertically, so that the planes of the wafers W are approximately parallel to the direction of conveyance. Since the wafers are kept in the state of standing approximately vertically, it is possible to reduce the occurrence of bending, as happens when they are held horizontally. Moreover, since the wafer cassette 1 is conveyed while keeping the planes of the wafers approximately parallel to the direction of conveyance, accordingly it is possible to reduce the increase of weight which acts upon the wafers W in the direction perpendicular to their planes caused by acceleration due to vertical shifting, horizontal shifting, or vertical vibration; and therefore it is possible to reduce the occurrence of bending of the wafers W.

    摘要翻译： 为了减少在输送过程中对晶片的物理损坏的可能性，建立了一种状态，其中晶片盒1被容纳在大致垂直放置的晶片盒1中，晶片盒1被传送，在这种状态下 晶片盒1容纳在大致垂直放置的晶片盒1中，使得晶片W的平面大致平行于输送方向。 由于晶片保持大致垂直地站立的状态，因此可以在水平保持时发生弯曲的发生。 此外，由于晶片盒1被输送，同时保持晶片的平面大致平行于输送方向，因此可以减少由加速度引起的垂直于它们的平面的方向作用在晶片W上的重量的增加 由于垂直移动，水平移动或垂直振动; 因此可以减少晶片W的弯曲的发生。

    Method for measuring semiconductor wafer profile and device for measuring the same used therefor
    8.
    发明授权
    Method for measuring semiconductor wafer profile and device for measuring the same used therefor 有权
    用于测量半导体晶片轮廓的方法和用于测量其的装置

    公开(公告)号：US08339594B2

    公开(公告)日：2012-12-25

    申请号：US12953523

    申请日：2010-11-24

    申请人： Shinji Sakamoto

    发明人： Shinji Sakamoto

    IPC分类号： G01N21/00

    CPC分类号： G01B11/24

    摘要： Disclosed is a method for measuring a profile using a device for measuring the profile in which included are: a distance measuring means 2 for measuring the distance to an edge region of a semiconductor wafer 12 in such a manner that light is emitted to be reflected at the edge region and to be detected; a first swing mechanism swingably supporting the distance measuring means 2; and a second swing mechanism swingably supporting the first swing mechanism, the method comprising the steps of: locating angles of the first swing mechanism each of which gives a maximum intensity of received light at each of predetermined angles of the second swing mechanism thereof; calculating contour points using coordinate transformation, thereby enabling points-related data to be acquired to represent a contour profile of the edge region. Thus, the method can be used for edge profile measurement of large-diameter wafers.

    摘要翻译： 公开了一种使用用于测量轮廓的装置来测量轮廓的方法，其中包括：距离测量装置2，用于测量与半导体晶片12的边缘区域的距离，使得发射光以在 边缘区域并被检测; 可摆动地支撑距离测量装置2的第一摆动机构; 以及可摆动地支撑所述第一摆动机构的第二摆动机构，所述方法包括以下步骤：将所述第一摆动机构的角度定位，其中，所述第一摆动机构在其第二摆动机构的每个预定角度处给出最大的接收光强度; 使用坐标变换计算轮廓点，从而能够获取点相关数据以表示边缘区域的轮廓线。 因此，该方法可用于大直径晶片的边缘轮廓测量。

    Charged particle beam drawing apparatus and proximity effect correction method thereof
    9.
    发明授权
    Charged particle beam drawing apparatus and proximity effect correction method thereof 有权
    带电粒子束绘图装置及其接近效应校正方法

    公开(公告)号：US08207514B2

    公开(公告)日：2012-06-26

    申请号：US12882713

    申请日：2010-09-15

    申请人： Shigehiro Hara ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    发明人： Shigehiro Hara ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    IPC分类号： G21K5/10

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/31769 ,  H01J2237/31776

    摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.

    摘要翻译： 带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量 在每个网格中每个代表人物的面积的基础上。 如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积， 代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。