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    Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements
    2.
    发明授权
    Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements 有权
    计量系统的照明子系统，计量系统以及用于计量测量的照明样本的方法

    公开(公告)号：US09080990B2

    公开(公告)日：2015-07-14

    申请号：US13061936

    申请日：2009-09-29

    Applicant: Yung-Ho (Alex) Chuang ,  Vladimir Levinski ,  Xuefeng Liu

    Inventor： Yung-Ho (Alex) Chuang ,  Vladimir Levinski ,  Xuefeng Liu

    IPC: G01N21/55 ,  G01N21/95 ,  G01N21/47

    CPC classification number: G01N21/9501 ,  G01N2021/479

    Abstract: Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen positioned in the metrology system.

    Abstract translation: 提供了计量系统的照明子系统，计量系统和用于度量测量的照明样本的方法。 一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性 光的脉冲。 照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。 照明子系统被配置为将来自电光调制器的光的脉冲引导到位于计量系统中的样本。

    Illuminating a specimen for metrology or inspection
    4.
    发明授权
    Illuminating a specimen for metrology or inspection 有权
    照亮样本进行计量或检查

    公开(公告)号：US09080991B2

    公开(公告)日：2015-07-14

    申请号：US13073986

    申请日：2011-03-28

    Applicant: Yung-Ho (Alex) Chuang ,  Vladimir Levinski ,  Xuefeng Liu ,  John Fielden

    Inventor： Yung-Ho (Alex) Chuang ,  Vladimir Levinski ,  Xuefeng Liu ,  John Fielden

    IPC: G01N21/00 ,  G01N21/95 ,  G01N21/47

    CPC classification number: G01N21/9501 ,  G01N2021/479

    Abstract: Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen.

    Abstract translation: 提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。 一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性 光的脉冲。 照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。 照明子系统被配置为将来自电光调制器的光脉冲引导到样本。

    Apparatus and methods for reducing tool-induced shift during overlay metrology
    9.
    发明授权
    Apparatus and methods for reducing tool-induced shift during overlay metrology 有权
    在重叠计量时减少工具引起的移位的装置和方法

    公开(公告)号：US07433039B1

    公开(公告)日：2008-10-07

    申请号：US10913188

    申请日：2004-08-06

    Applicant: Vladimir Levinski ,  Ilan Sela

    Inventor： Vladimir Levinski ,  Ilan Sela

    IPC: G01B11/00

    CPC classification number: G03F7/70633 ,  G03F7/70616

    Abstract: Disclosed are apparatus and methods for determining a minimum tool-induced shift (TIS) during an overlay metrology procedure. In a specific embodiment, a method of determining overlay or misalignment error on a target is disclosed. For a predefined number of positions of a target within a field of view (FOV) of a metrology tool, the following operations are performed: (i) determining a tool-induced shift (TIS) parameter value for each predefined position of the target within the FOV based on at least one overlay measurement obtained from the target at the each position (for example, based on overlay measurements at 0 and 180 degrees of wafer orientation) and (ii) determining a minimum TIS parameter value and its corresponding FOV position from the plurality of determined TIS parameters values at the predefined positions of the target within the FOV. The FOV position that corresponds to the minimum TIS is then defined as an appropriate position for the actual overlay measurement and the value of minimum TIS is used for overlay correction.

    Abstract translation: 公开了用于在覆盖计量过程期间确定最小工具引起的移动（TIS）的装置和方法。 在具体实施例中，公开了一种确定目标上的重叠或未对准误差的方法。 对于计量工具的视场（FOV）中的目标的预定数量的位置，执行以下操作：（i）确定目标的每个预定义位置的工具引起的移动（TIS）参数值， 基于从每个位置处的目标获得的至少一个覆盖测量的FOV（例如，基于在0和180度晶片取向的覆盖测量），以及（ii）确定最小TIS参数值及其对应的FOV位置 在FOV内的目标的预定义位置处的多个确定的TIS参数值。 然后将对应于最小TIS的FOV位置定义为实际覆盖测量的适当位置，并且将最小TIS的值用于覆盖校正。

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