Ridge-waveguide semiconductor laser device
    2.
    发明授权
    Ridge-waveguide semiconductor laser device 失效
    脊波导半导体激光器件

    公开(公告)号:US06768760B2

    公开(公告)日:2004-07-27

    申请号:US10260280

    申请日:2002-10-01

    IPC分类号: H01S500

    摘要: A laser device includes a double hetero-structure element constructed by depositing a p-type cladding layer, a quantum well active layer, an n-type thin first cladding layer and an n-type thick second cladding layer sequentially. A ridge-waveguide is shaped between two trenches formed in the second cladding layer. The first cladding layer serves as an etching stopper while etching the second cladding layer to form the two trenches. The trenches reach to or reach in vicinity to the surface of the first cladding layer. High-resistance regions may be formed in portions of the first cladding layer directly underneath the trenches. The thin first cladding layer, suppresses leakage current and improves the temperature characteristics and the operating speed characteristics of the laser device.

    摘要翻译: 激光器件包括通过依次沉积p型包覆层,量子阱有源层,n型薄第一覆层和n型厚第二覆层而构成的双异质结构元件。 脊形波导形成在形成在第二覆层中的两个沟槽之间。 第一覆层在蚀刻第二覆层以形成两个沟槽时用作蚀刻停止层。 沟槽到达或到达第一包层的表面附近。 高电阻区域可以形成在第一包层的直接在沟槽下方的部分中。 薄的第一包层抑制漏电流,提高激光装置的温度特性和工作速度特性。

    Distributed feedback laser device and method for manufacturing the same
    3.
    发明授权
    Distributed feedback laser device and method for manufacturing the same 有权
    分布式反馈激光装置及其制造方法

    公开(公告)号:US06674784B2

    公开(公告)日:2004-01-06

    申请号:US09861651

    申请日:2001-05-22

    IPC分类号: H01S308

    CPC分类号: H01S5/22 H01S5/12

    摘要: A distributed feedback laser device includes a semiconductor base having a ridge waveguide structure projecting from its principal plane. The ridge waveguide structure extends with a predetermined width from one edge of the semiconductor base to an opposite edge. A diffraction grating layer is confined within the ridge structure. The ridge waveguide structure is formed by etching using an SiO2 film and a resist film as masks so that the diffraction grating layer is produced with substantially the same width as, or a less width than, the width of the ridge waveguide structure. A &lgr;/4 shift diffraction grating or a chirped diffraction grating is preferably employed.

    摘要翻译: 分布式反馈激光装置包括具有从其主平面突出的脊波导结构的半导体基座。 脊形波导结构以从半导体基底的一个边缘到相对边缘的预定宽度延伸。 衍射光栅层被限制在脊结构内。 通过使用SiO 2膜和抗蚀剂膜作为掩模进行蚀刻来形成脊波导结构,使得衍射光栅层以与脊波导结构的宽度基本相同的宽度或更小的宽度制造。 优选使用λ/ 4移动衍射光栅或者啁啾衍射光栅。

    Semiconductor laser device
    5.
    发明申请
    Semiconductor laser device 有权
    半导体激光器件

    公开(公告)号:US20060018358A1

    公开(公告)日:2006-01-26

    申请号:US11144772

    申请日:2005-06-06

    IPC分类号: H01S3/097 H01S5/00

    摘要: A semiconductor laser device includes: an electrically insulating film, on the top face of a laser chip; and a metal film, on the electrically insulating film. The electrically insulating film and/or the metal film has, in plan, a polygonal shave with five or more apexes, each of the apexes having an interior angle less than 180 degrees. Stress due to a change of temperature during operation is reduced, resulting in a semiconductor laser device having a longer life and higher reliability.

    摘要翻译: 半导体激光器件包括:激光芯片的顶面上的电绝缘膜; 和金属膜,在电绝缘膜上。 电绝缘膜和/或金属膜在平面上具有五个或更多个顶点的多边形刮削,每个顶点具有小于180度的内角。 由于操作期间的温度变化引起的应力减小,导致寿命更长,可靠性更高的半导体激光器件。

    Semiconductor laser device
    6.
    发明授权
    Semiconductor laser device 有权
    半导体激光器件

    公开(公告)号:US07675954B2

    公开(公告)日:2010-03-09

    申请号:US11144772

    申请日:2005-06-06

    IPC分类号: H01S5/00 H01S5/02

    摘要: A semiconductor laser device includes: an electrically insulating film on the top face of a laser chip; and a metal film, on the electrically insulating film. The electrically insulating film and/or the metal film has, in plan, a polygonal shape with five or more apexes, each of the apexes having an interior angle less than 180 degrees. Stress due to a change of temperature during operation is reduced, resulting in a semiconductor laser device having a longer life and higher reliability.

    摘要翻译: 半导体激光装置包括:激光芯片的顶面上的电绝缘膜; 和金属膜,在电绝缘膜上。 电绝缘膜和/或金属膜在平面上具有五个或更多个顶点的多边形,每个顶点具有小于180度的内角。 由于操作期间的温度变化引起的应力减小,导致寿命更长,可靠性更高的半导体激光器件。

    Method of fabricating semiconductor optical device
    7.
    发明授权
    Method of fabricating semiconductor optical device 失效
    制造半导体光学器件的方法

    公开(公告)号:US5763287A

    公开(公告)日:1998-06-09

    申请号:US593348

    申请日:1996-01-29

    摘要: A method of making a semiconductor optical device, including an integrated laser diode and optical waveguide lens with a continuous resonator extending along a resonator length direction between a pair of resonator facets, includes forming a pair of dielectric films disposed on a surface of a substrate on which a semiconductor layer of the optical waveguide is to be grown, the dielectric films having a linear symmetry about a hypothetical line extending in the resonator length direction, having edges opposing each other and parallel to the hypothetical line, and widths perpendicular to the resonator length direction that gradually narrow toward one facet from a position in the resonator length direction of the films. A mask pattern that produces a precise layer thickness profile is easily designed.

    摘要翻译: 一种制造半导体光学器件的方法,包括集成激光二极管和具有在一对谐振器面之间沿谐振器长度方向延伸的连续谐振器的光波导透镜,包括:形成一对电介质膜,该电介质膜设置在衬底的表面上 该光波导的半导体层将被生长,该电介质膜围绕在谐振器长度方向上延伸的假想线具有线性对称性,具有彼此相对并平行于假想线的边缘以及垂直于谐振器长度的宽度 从薄膜的谐振器长度方向的位置向一个小面逐渐变窄的方向。 产生精确的层厚度轮廓的掩模图案是容易设计的。

    Semiconductor optical device having an improved current blocking layer and manufacturing method thereof
    8.
    发明授权
    Semiconductor optical device having an improved current blocking layer and manufacturing method thereof 有权
    具有改进的电流阻挡层的半导体光学器件及其制造方法

    公开(公告)号:US07504664B2

    公开(公告)日:2009-03-17

    申请号:US11373167

    申请日:2006-03-13

    申请人: Tohru Takiguchi

    发明人: Tohru Takiguchi

    IPC分类号: H01L27/15

    摘要: A semiconductor optical device includes an active layer, a current blocking layer on both sides of the active layer, and a cladding layer on both the active layer and the current blocking layer. The current blocking layer includes a buried layer, at least one intermediate layer of Al(Ga)InAs and a cover blocking layer. The cover blocking layer is located between the cladding layer and the Al(Ga)InAs layers and has a higher oxidation resistance than the Al(Ga)InAs layer. The current blocking layer is grown such that each Al(Ga)InAs layer is not exposed at the surface of the current blocking layer.

    摘要翻译: 半导体光学器件包括有源层,有源层两侧的电流阻挡层以及有源层和电流阻挡层两者上的覆层。 电流阻挡层包括掩埋层,Al(Ga)InAs的至少一个中间层和覆盖物阻挡层。 覆盖阻挡层位于包覆层和Al(Ga)InAs层之间,并且具有比Al(Ga)InAs层更高的抗氧化性。 生长电流阻挡层,使得每个Al(Ga)InAs层不暴露在电流阻挡层的表面。

    Semiconductor optical device having an improved current blocking layer and manufacturing method thereof
    9.
    发明申请
    Semiconductor optical device having an improved current blocking layer and manufacturing method thereof 有权
    具有改进的电流阻挡层的半导体光学器件及其制造方法

    公开(公告)号:US20070045633A1

    公开(公告)日:2007-03-01

    申请号:US11373167

    申请日:2006-03-13

    申请人: Tohru Takiguchi

    发明人: Tohru Takiguchi

    IPC分类号: H01L33/00

    摘要: A semiconductor optical device includes an active layer, a current blocking layer on both sides of the active layers and a cladding layer on both the active layer and the current blocking layer. The current blocking layer includes a buried layer, at least one intermediate layer of Al(Ga)InAs and a cover blocking layer. The cover blocking layer is located between the cladding layer and the Al(Ga)InAs layers and has a higher oxidation resistance than the Al(Ga)InAs layer. The current blocking layer is grown such that each Al(Ga)InAs layer is not exposed at the surface of the current blocking layer.

    摘要翻译: 半导体光学器件包括有源层,有源层两侧的电流阻挡层和有源层和电流阻挡层两者上的覆层。 电流阻挡层包括掩埋层,Al(Ga)InAs的至少一个中间层和覆盖物阻挡层。 覆盖阻挡层位于包覆层和Al(Ga)InAs层之间,并且具有比Al(Ga)InAs层更高的抗氧化性。 生长电流阻挡层,使得每个Al(Ga)InAs层不暴露在电流阻挡层的表面。

    Ridge waveguide distributed feedback laser
    10.
    发明授权
    Ridge waveguide distributed feedback laser 有权
    脊波导分布式反馈激光器

    公开(公告)号:US06741630B2

    公开(公告)日:2004-05-25

    申请号:US10245495

    申请日:2002-09-18

    申请人: Tohru Takiguchi

    发明人: Tohru Takiguchi

    IPC分类号: H01S500

    CPC分类号: H01S5/12 H01S5/22 H01S5/3054

    摘要: A ridge waveguide distributed feedback laser includes a p-type InGaAsP grating layer having a p-type carrier density ranging from 1.5×1018 cm−3 to 4.0×10−3 cm−3 and preferably from 2.0×1018 cm−3 to 3.0×1018 cm−3. In combination with such raised levels of p-type carrier density in the InGaAsP grating layer, the p-type carrier density may also be enhanced both in a p-type InP layer between the grating layer and a contact layer, and in another p-type InP layer between the grating layer and a quantum well active layer, the density ranging from 1.5×1018 cm−3 to 4.0×1018 cm−3 and preferably from 2.0×1018 cm−3 to 3.0×1018 cm−3.

    摘要翻译: 脊波导分布反馈激光器包括p型InGaAsP光栅层,其具有范围为1.5×10 18 cm -3至4.0×10 -3 cm -3的p型载流子密度,优选为2.0×10 <18>厘米-3 -3.0×10 18 cm -3。 结合InGaAsP光栅层中p型载流子浓度的这种升高的水平,p型载流子密度也可以在光栅层和接触层之间的p型InP层中增强, 在光栅层和量子阱活性层之间的InP层的密度范围为1.5×10 18 cm -3至4.0×10 18 cm -3,优选为2.0×10 18 cm -3, 3> 3.0×10 18 cm -3。