METHOD OF FORMING CURRENT-INJECTING/TUNNELING LIGHT-EMITTING DEVICE
    3.
    发明申请
    METHOD OF FORMING CURRENT-INJECTING/TUNNELING LIGHT-EMITTING DEVICE 有权
    形成电流注入/隧道发光装置的方法

    公开(公告)号:US20110244609A1

    公开(公告)日:2011-10-06

    申请号:US12956640

    申请日:2010-11-30

    Abstract: An apparatus and method for making same. Some embodiments include a light-emitting device having a light-emitting active region; a tunneling-barrier (TB) structure facing adjacent the active region; a TB grown-epitaxial-metal-mirror (TB-GEMM) structure facing adjacent the TB structure, wherein the TB-GEMM structure includes at least one metal is substantially lattice matched to the active region; and a conductivity-type III-nitride crystal structure adjacent facing the active region opposite the TB structure. In some embodiments, the active region includes an MQW structure. In some embodiments, the TB-GEMM includes an alloy composition such that metal current injectors have a Fermi energy potential substantially equal to the sub-band minimum energy potential of the MQW. Some embodiments further include a second mirror (optionally a GEMM) to form an optical cavity between the second mirror and the TB-GEMM structure. In some embodiments, at least one of the GEMM is deposited on, and lattice matched to, a substrate.

    Abstract translation: 一种用于制造它的装置和方法。 一些实施例包括具有发光有源区的发光器件; 面向邻近有源区的隧道势垒(TB)结构; 面向TB结构的TB生长外延金属镜(TB-GEMM)结构,其中TB-GEMM结构包括至少一种金属与活性区基本上晶格匹配; 以及与TB结构相对的有源区域相邻的导电型III族氮化物晶体结构。 在一些实施例中,活动区域包括MQW结构。 在一些实施方案中,TB-GEMM包括合金组合物,使得金属电流注入器具有基本上等于MQW的子带最小能量势的费米能量势。 一些实施例还包括在第二反射镜和TB-GEMM结构之间形成光腔的第二反射镜(可选地为GEMM)。 在一些实施例中,GEMM中的至少一个沉积在衬底上,并且与衬底晶格匹配。

    CURRENT-INJECTING/TUNNELING LIGHT-EMITTING DEVICE AND METHOD
    4.
    发明申请
    CURRENT-INJECTING/TUNNELING LIGHT-EMITTING DEVICE AND METHOD 有权
    电流注入/隧道发光装置及方法

    公开(公告)号:US20090212278A1

    公开(公告)日:2009-08-27

    申请号:US12393029

    申请日:2009-02-25

    Abstract: An apparatus and method for making it. Some embodiments include a light-emitting device having a light-emitting active region; a tunneling-barrier (TB) structure facing adjacent the active region; a TB grown-epitaxial-metal-mirror (TB-GEMM) structure facing adjacent the TB structure, wherein the TB-GEMM structure includes at least one metal is substantially lattice matched to the active region; and a conductivity-type III-nitride crystal structure adjacent facing the active region opposite the TB structure. In some embodiments, the active region includes an MQW structure. In some embodiments, the TB-GEMM includes an alloy composition such that metal current injectors have a Fermi energy potential substantially equal to the sub-band minimum energy potential of the MQW. Some embodiments further include a second mirror (optionally a GEMM) to form an optical cavity between the second mirror and the TB-GEMM structure. In some embodiments, at least one of the GEMM is deposited on, and lattice matched to, a substrate.

    Abstract translation: 一种用于制作它的装置和方法。 一些实施例包括具有发光有源区的发光器件; 面向邻近有源区的隧道势垒(TB)结构; 面向TB结构的TB生长外延金属镜(TB-GEMM)结构,其中TB-GEMM结构包括至少一种金属与活性区基本上晶格匹配; 以及与TB结构相对的有源区域相邻的导电型III族氮化物晶体结构。 在一些实施例中,活动区域包括MQW结构。 在一些实施方案中,TB-GEMM包括合金组合物,使得金属电流注入器具有基本上等于MQW的子带最小能量势的费米能量势。 一些实施例还包括在第二反射镜和TB-GEMM结构之间形成光腔的第二反射镜(可选地为GEMM)。 在一些实施例中,GEMM中的至少一个沉积在衬底上,并且与衬底晶格匹配。

    Method of forming current-injecting/tunneling light-emitting device
    7.
    发明授权
    Method of forming current-injecting/tunneling light-emitting device 有权
    形成电流注入/隧道发光器件的方法

    公开(公告)号:US08865492B2

    公开(公告)日:2014-10-21

    申请号:US12956640

    申请日:2010-11-30

    Abstract: An apparatus and method for making same. Some embodiments include a light-emitting device having a light-emitting active region; a tunneling-barrier (TB) structure facing adjacent the active region; a TB grown-epitaxial-metal-mirror (TB-GEMM) structure facing adjacent the TB structure, wherein the TB-GEMM structure includes at least one metal is substantially lattice matched to the active region; and a conductivity-type III-nitride crystal structure adjacent facing the active region opposite the TB structure. In some embodiments, the active region includes an MQW structure. In some embodiments, the TB-GEMM includes an alloy composition such that metal current injectors have a Fermi energy potential substantially equal to the sub-band minimum energy potential of the MQW. Some embodiments further include a second mirror (optionally a GEMM) to form an optical cavity between the second mirror and the TB-GEMM structure. In some embodiments, at least one of the GEMM is deposited on, and lattice matched to, a substrate.

    Abstract translation: 一种用于制造它的装置和方法。 一些实施例包括具有发光有源区的发光器件; 面向邻近有源区的隧道势垒(TB)结构; 面向TB结构的TB生长外延金属镜(TB-GEMM)结构,其中TB-GEMM结构包括至少一种金属与活性区基本上晶格匹配; 以及与TB结构相对的有源区域相邻的导电型III族氮化物晶体结构。 在一些实施例中,活动区域包括MQW结构。 在一些实施方案中,TB-GEMM包括合金组合物,使得金属电流注入器具有基本上等于MQW的子带最小能量势的费米能量势。 一些实施例还包括在第二反射镜和TB-GEMM结构之间形成光腔的第二反射镜(可选地为GEMM)。 在一些实施例中,GEMM中的至少一个沉积在衬底上,并且与衬底晶格匹配。

    MATERIALS, STRUCTURES, AND METHODS FOR OPTICAL AND ELECTRICAL III-NITRIDE SEMICONDUCTOR DEVICES
    8.
    发明申请
    MATERIALS, STRUCTURES, AND METHODS FOR OPTICAL AND ELECTRICAL III-NITRIDE SEMICONDUCTOR DEVICES 审中-公开
    光电三极半导体器件的材料,结构和方法

    公开(公告)号:US20140008660A1

    公开(公告)日:2014-01-09

    申请号:US13831350

    申请日:2013-03-14

    Abstract: The present invention provides materials, structures, and methods for III-nitride-based devices, including epitaxial and non-epitaxial structures useful for III-nitride devices including light emitting devices, laser diodes, transistors, detectors, sensors, and the like. In some embodiments, the present invention provides metallo-semiconductor and/or metallo-dielectric devices, structures, materials and methods of forming metallo-semiconductor and/or metallo-dielectric material structures for use in semiconductor devices, and more particularly for use in III-nitride based semiconductor devices. In some embodiments, the present invention includes materials, structures, and methods for improving the crystal quality of epitaxial materials grown on non-native substrates. In some embodiments, the present invention provides materials, structures, devices, and methods for acoustic wave devices and technology, including epitaxial and non-epitaxial piezoelectric materials and structures useful for acoustic wave devices. In some embodiments, the present invention provides metal-base transistor devices, structures, materials and methods of forming metal-base transistor material structures for use in semiconductor devices.

    Abstract translation: 本发明提供了用于III族氮化物的器件的材料,结构和方法,包括用于包括发光器件,激光二极管,晶体管,检测器,传感器等的III族氮化物器件的外延和非外延结构。 在一些实施方案中,本发明提供用于形成用于半导体器件的金属半导体和/或金属介电材料结构的金属半导体和/或金属介电器件,结构,材料和方法,更特别地用于III 基于氮化物的半导体器件。 在一些实施方案中,本发明包括用于改善在非天然基底上生长的外延材料的晶体质量的材料,结构和方法。 在一些实施例中,本发明提供了用于声波器件和技术的材料,结构,器件和方法,包括用于声波器件的外延和非外延压电材料和结构。 在一些实施例中,本发明提供了用于形成用于半导体器件的金属基晶体管材料结构的金属基晶体管器件,结构,材料和方法。

    Current-injecting/tunneling light-emitting device and method
    10.
    发明授权
    Current-injecting/tunneling light-emitting device and method 有权
    电流注入/隧道发光装置及方法

    公开(公告)号:US07842939B2

    公开(公告)日:2010-11-30

    申请号:US12393029

    申请日:2009-02-25

    Abstract: An apparatus and method for making it. Some embodiments include a light-emitting device having a light-emitting active region; a tunneling-barrier (TB) structure facing adjacent the active region; a TB grown-epitaxial-metal-mirror (TB-GEMM) structure facing adjacent the TB structure, wherein the TB-GEMM structure includes at least one metal is substantially lattice matched to the active region; and a conductivity-type III-nitride crystal structure adjacent facing the active region opposite the TB structure. In some embodiments, the active region includes an MQW structure. In some embodiments, the TB-GEMM includes an alloy composition such that metal current injectors have a Fermi energy potential substantially equal to the sub-band minimum energy potential of the MQW. Some embodiments further include a second mirror (optionally a GEMM) to form an optical cavity between the second mirror and the TB-GEMM structure. In some embodiments, at least one of the GEMM is deposited on, and lattice matched to, a substrate.

    Abstract translation: 一种用于制作它的装置和方法。 一些实施例包括具有发光有源区的发光器件; 面向邻近有源区的隧道势垒(TB)结构; 面向TB结构的TB生长外延金属镜(TB-GEMM)结构,其中TB-GEMM结构包括至少一种金属与活性区基本上晶格匹配; 以及与TB结构相对的有源区域相邻的导电型III族氮化物晶体结构。 在一些实施例中,活动区域包括MQW结构。 在一些实施方案中,TB-GEMM包括合金组合物,使得金属电流注入器具有基本上等于MQW的子带最小能量势的费米能量势。 一些实施例还包括在第二反射镜和TB-GEMM结构之间形成光腔的第二反射镜(可选地为GEMM)。 在一些实施例中,GEMM中的至少一个沉积在衬底上,并且与衬底晶格匹配。

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