公开(公告)号：US11830747B2

公开(公告)日：2023-11-28

申请号：US16228407

申请日：2018-12-20

申请人： Advanced Micro-Fabrication Equipment Inc, China

发明人： Kui Zhao ,  Hiroshi Iizuka

IPC分类号： H01L21/67 ,  H05H1/46 ,  H01J37/32 ,  H01L21/683

CPC分类号： H01L21/67069 ,  H01J37/32155 ,  H01J37/32174 ,  H01J37/32577 ,  H01J37/32706 ,  H01L21/6719 ,  H01L21/67109 ,  H01L21/6831 ,  H05H1/46 ,  H05H1/466 ,  H05H1/4652 ,  H05H2242/20

摘要： The present disclosure provides a plasma reactor having a function of tuning low frequency RF power distribution, comprising: a reaction chamber in which an electrically conductive base is provided, the electrically conductive base being connected to a low frequency RF source via a first match, an electrostatic chuck being provided on the electrically conductive base, an upper surface of the electrostatic chuck being configured for fixing a to-be-processed substrate, an outer sidewall of the electrically conductive base being coated with at least one layer of plasma corrosion-resistance dielectric layer, a coupling ring made of a dielectric material surrounding an outer perimeter of the base, a focus ring being disposed above the coupling ring, the focus ring being arranged surround the electrostatic chuck and be exposed to a plasma during a plasma processing procedure; the plasma reactor further comprising an annular electrode that is disposed above the coupling ring but below the focus ring; a wire, a first end of which is electrically connected to the base, and a second end of which is connected to the annular electrode, a variable capacitance being serially connected to the wire.

公开(公告)号：US11950831B2

公开(公告)日：2024-04-09

申请号：US17076451

申请日：2020-10-21

申请人： U.S. Patent Innovations LLC

发明人： Jerome Canady ,  Alexey Shashurin ,  Michael Keidar ,  Taisen Zhuang

IPC分类号： A61B18/04 ,  A61B18/12 ,  H05H1/46 ,  A61B17/00 ,  A61B18/00 ,  A61B18/14

CPC分类号： A61B18/1206 ,  A61B18/042 ,  H05H1/46 ,  A61B2017/00973 ,  A61B2018/00083 ,  A61B2018/00172 ,  A61B2018/00583 ,  A61B2018/00702 ,  A61B2018/00732 ,  A61B2018/00744 ,  A61B2018/1286 ,  A61B18/14 ,  H05H1/4645 ,  H05H2242/20 ,  H05H2245/32

摘要： An integrated gas-enhanced electrosurgical generator. The generator comprises a high frequency power module, a low frequency power module and a gas module. The high frequency power module adapted to generate an electrical energy having a band of frequencies centered around a first frequency, wherein the electrical energy has a first power as the first frequency and a second power lower than the first power at a second frequency lower than the first frequency. The low frequency power module having an input connected to an output of the high frequency module. The low frequency module comprises a resonant transformer comprising a ferrite core, a primary coil and a secondary coil, the secondary coil having a larger number of turns than the primary coil, wherein the resonant transformer has a resonant frequency equal to the second frequency. The gas module is adapted to control a flow of an inert gas.

公开(公告)号：US20230345612A1

公开(公告)日：2023-10-26

申请号：US17995349

申请日：2021-03-16

申请人： Wisconsin Alumni Research Foundation

发明人： Cary Brett Forest ,  Jay Keith Anderson ,  John Philip Wallace ,  Robert W. Harvey ,  Yuri V. Petrov

IPC分类号： H05H1/46 ,  G21B1/05 ,  G21B1/23

CPC分类号： H05H1/46 ,  G21B1/05 ,  G21B1/23 ,  H05H2242/20

摘要： An apparatus for generating a highly energetic plasma employs a low-energy neutral beam injected into a magnetically contained mirror plasma to produce plasma ions boosted in energy to fusion levels by a coordinated radiofrequency field.

公开(公告)号：US11877378B2

公开(公告)日：2024-01-16

申请号：US17450285

申请日：2021-10-08

申请人： National Yang Ming Chiao Tung University

发明人： Jong-Shinn Wu ,  Chih-Tung Liu ,  Chun-Ping Hsiao ,  Chun-Hao Chang

IPC分类号： H01J37/32 ,  H05H1/48 ,  H05H1/24 ,  H05H1/52

CPC分类号： H05H1/245 ,  H05H1/48 ,  H05H1/52 ,  H05H2242/20

摘要： An apparatus includes a fine bubble generator, a gas supplying source, a first plasma generator, a second plasma generator, a power source and a control module. The fine bubble generator is configured to generate fine bubbles in a liquid. The gas supplying source is configured to supply a working gas. The first plasma generator is configured to generate a first plasma gas from the working gas. The second plasma generator is configured to generate a second plasma gas from the working gas. The power source is configured to supply electricity to the first plasma generator and the second plasma generator. The control module is configured to adjust the power source to provide power to the first plasma generator and the second plasma generator. The first plasma gas and the second plasma gas are directed into the liquid.

公开(公告)号：US20240008162A1

公开(公告)日：2024-01-04

申请号：US18252764

申请日：2021-11-19

申请人： DAPHNE TECHNOLOGY SA

发明人： Juan Mario MICHAN ,  William Jamieson RAMSAY ,  Dominik NEUMAYR

IPC分类号： H05H1/24

CPC分类号： H05H1/2406 ,  H05H2242/20

摘要： There is provided a drive circuit for a dielectric barrier discharge device. The drive circuit comprises: a power supply connectable in use across a dielectric discharge gap, the dielectric discharge gap providing a capacitance; and an inductance between the power supply and the dielectric discharge gap when connected thereby establishing a resonant tank in use, wherein power is provided in use to the tank in pulse-trains and only during a pulse-train, a pulse frequency of each pulse-train being tuneable in use to a resonant frequency of the tank, power provided by each pulse-train charging and maintaining the tank to a threshold at which discharge ignition occurs, discharge ignition events per pulse-train being limited to a maximum number based on the drive circuit being arranged in use to prohibit each pulse-train transferring power to the resonant tank after the maximum number has occurred.

公开(公告)号：US11770892B2

公开(公告)日：2023-09-26

申请号：US17176414

申请日：2021-02-16

申请人： COMET AG

发明人： Anton Labanc ,  Daniel Gruner

IPC分类号： H05H1/46 ,  H03F3/19

CPC分类号： H05H1/46 ,  H03F3/19 ,  H05H2242/20

摘要： The high-frequency amplifier assembly for a high-frequency generator, in particular for a high-frequency generator for operating a plasma generator, is provided with a signal generator for generating a high-frequency signal; a first amplifier transistor for amplifying the signal generated by the signal generator; an output terminal for outputting the amplified signal to an external load; an input network arranged between the signal generator and the first amplifier transistor for providing the high-frequency signal at the input of the amplifier transistor; an output network arranged between the amplifier transistor and the external load for providing a desired load impedance for the amplifier transistor; and an electronic voltage-limiting assembly arranged at the output terminal for limiting the output voltage at the output terminal.

公开(公告)号：US11749506B2

公开(公告)日：2023-09-05

申请号：US17837767

申请日：2022-06-10

申请人： COMET TECHNOLOGIES USA, INC.

发明人： Gary Russell ,  Keith Rouse ,  Dean Maw

IPC分类号： H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32183 ,  H05H1/46 ,  H05H2242/20

摘要： A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matching network. Also, finding a prior solution and to the condition when the condition is the known condition for the matching network; and replicating the prior solution for the condition in the matching network.

公开(公告)号：US12018361B2

公开(公告)日：2024-06-25

申请号：US17858592

申请日：2022-07-06

申请人： Applied Materials, Inc.

发明人： Shouyin Zhang ,  Keith A. Miller

IPC分类号： C23C14/54 ,  C23C14/28 ,  H01J37/32 ,  H05H1/00

CPC分类号： C23C14/54 ,  C23C14/28 ,  H01J37/32917 ,  H05H1/0081 ,  H05H2242/20

摘要： Power supplies, waveform function generators and methods for controlling a plasma process are described. The power supplies or waveform function generators include a component for executing the method in which a waveform shape change index is determined during a plasma process and evaluated for compliance with a predetermined tolerance.

公开(公告)号：US11885315B2

公开(公告)日：2024-01-30

申请号：US17620455

申请日：2020-06-17

申请人： THRUSTME

发明人： Stanislav Dudin ,  Dmytro Rafalskyi

IPC分类号： F03H1/00 ,  H05H1/46 ,  B64G1/40

CPC分类号： F03H1/0081 ,  H05H1/466 ,  H05H1/4652 ,  B64G1/405 ,  H05H2242/20

摘要： Disclosed is a radio-frequency plasma generating system including a radio-frequency generator and a plasma source, the radio-frequency generator being inductively or capacitively coupled to the plasma source through a resonant electric circuit, the radio-frequency generator being adapted to receive direct current power from a direct current power supply and for generating radio-frequency power at a frequency f, the radio-frequency power including a reactive radio-frequency power oscillating in the resonant electric circuit and an active radio-frequency power absorbed by the plasma. The radio-frequency plasma generating system includes a unit for measuring an efficiency of conversion E of direct-current power to active radio-frequency power absorbed by the plasma and a unit for adjusting the frequency f as a function of the measured efficiency of conversion E to maintain the efficiency of conversion E in a predetermined range within a RF plasma operational range.

公开(公告)号：US11810762B2

公开(公告)日：2023-11-07

申请号：US17643866

申请日：2021-12-13

申请人： MKS Instruments, Inc.

发明人： Jin Huh ,  Aaron T. Radomski ,  Duy Nguyen ,  Soohan Kim

IPC分类号： H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32183 ,  H05H1/46 ,  H05H2242/20

摘要： A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching network section for providing an impedance match between the first power supply and the load. The matching network also includes a second matching network section for providing an impedance match between the second power supply and the load. The first matching network section includes a first variable reactance, and the variable reactance is controlled in accordance with IMD sensed in the signal applied to the load by the first RF power supply. The variable reactance is adjusted in accordance with the IMD to reduce the detected IMD.