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公开(公告)号:US20250059648A1
公开(公告)日:2025-02-20
申请号:US18719726
申请日:2022-12-16
Applicant: POSCO CO., LTD
Inventor: Jungwoo Kim , Bongwoo Ha , Donggyu Lee , Taeyoung No
Abstract: An insulating coating composition for an electrical steel sheet, according to an embodiment of the present invention, comprises, on the basis of 100 wt % of a total composition: 10 to 50 wt % of a first composition including first inorganic material particles and second inorganic material particles; 10 to 50 wt % of a second composition including a metal phosphate; and 20 to 60 wt % of an organic/inorganic composite in which inorganic nano particles are substituted in an organic resin.
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公开(公告)号:US12163232B2
公开(公告)日:2024-12-10
申请号:US17280253
申请日:2019-09-02
Applicant: JFE STEEL CORPORATION
Inventor: Karin Kokufu , Takashi Terashima , Toshito Takamiya
Abstract: A treatment agent for chromium-free insulating coating formation suitable for forming an insulating coating on a surface of a grain-oriented electrical steel sheet. The treatment agent includes components (A), (B), (C), and (D). The component (B) is contained in an amount of 50 to 150 parts by mass on a SiO2 solid basis, and the component (C) is contained in an amount of 5.0 parts by mass or more on an elemental metal basis, the amounts being based on 100 parts by mass, on a solid basis, of the component (A). The component (D) is contained in an amount that a molar ratio of M2+ and M3+, each being a metal element in the treatment agent for chromium-free insulating coating formation, to a phosphorus element P satisfies a specified relationship, and the treatment agent for chromium-free insulating coating formation has a pH of less than 4.5.
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公开(公告)号:US12018389B2
公开(公告)日:2024-06-25
申请号:US16926241
申请日:2020-07-10
Applicant: Ju Teng International Holdings Ltd.
Inventor: Hsiang-Jui Wang , Shun-Jie Yang , Cheng-Ping Hsiao
Abstract: The present invention provides a surface treatment method for magnesium alloy object, the method comprising: providing a magnesium alloy object; preprocessing the magnesium alloy object; performing micro-arc oxidation (MAO) treatment on the magnesium alloy object to form a micro-arc oxidation layer; Sputtering at least one metal layer or at least one non-metal layer on a surface of the micro-arc oxidation layer, the metal layer or non-metal layer which is sputtered on the micro-arc oxidation layer has different angles by using surface roughness of the micro-arc oxidation layer when a light source is projected on the metal layer or non-metal layer; and Sputtering a paint layer on the metal layer or non-metal layer to make the surface metallic lustrous and corrosion-resistant. The present invention further provides a surface structure of a magnesium alloy object.
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公开(公告)号:US11939228B1
公开(公告)日:2024-03-26
申请号:US18141863
申请日:2023-05-01
Applicant: KING FAISAL UNIVERSITY
Inventor: Nagih Shaalan , Chawki Awada , Faheem Ahmed , Shalendra Kumar
CPC classification number: C01G23/047 , C23C22/05 , C23C22/78 , C23C22/82 , C01P2002/82 , C01P2006/80
Abstract: Methods of obtaining a titanium dioxide nanofilm or microfilm are provided herein. A pure sheet of titanium is irradiated with a CO2 laser to produce the titanium dioxide nanofilm or microfilm. The titanium sheet can optionally be doped with an oxide, such as barium oxide. The method produces titanium dioxide nanofilms or microfilms that can be produced in more than one phase, such as a rutile phase, an anatase phase, or both combined. The titanium dioxide nanofilms or microfilms can be directly fabricated with high purity without any further processing.
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公开(公告)号:US20230243060A1
公开(公告)日:2023-08-03
申请号:US17996563
申请日:2021-04-23
Applicant: Novelis Inc.
Inventor: Theresa Elizabeth MacFarlane , Max Scruggs , Lasitha Cumaranatunge , Kevin Mark Johnson , Brian Paradis , Tudor Piroteala , Peter Lloyd Redmond , Duane Bendzinski , Thomas J. Beck , Thomas John Beckman
Abstract: Provided herein are corrosion resistant metal substrates and methods for producing the same by thermal modification. The disclosure provides methods for producing corrosion resistant substrates by producing a pretreatment film on a surface of a metal substrate and heating the pretreated metal substrate. In particular, the metal substrate and/or the pretreated metal substrate of these methods is in an F temper, a T4 temper, or a T6 temper.
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公开(公告)号:US20230142926A1
公开(公告)日:2023-05-11
申请号:US18096347
申请日:2023-01-12
Applicant: Applied Materials, Inc.
Inventor: Yong Wang , Doreen Wei Ying Yong , Bhaskar Jyoti Bhuyan , John Sudijono
CPC classification number: C23C16/0227 , C23C16/04 , C23C22/82 , C23C16/56 , C23C22/77
Abstract: Methods of patterning semiconductor devices comprising selective deposition methods are described. A blocking layer is deposited on a metal surface of a semiconductor device before deposition of a dielectric material on a dielectric surface. Methods include exposing a substrate surface including a metal surface and a dielectric surface to a heterocyclic reactant comprising a headgroup and a tailgroup in a processing chamber and selectively depositing the heterocyclic reactant on the metal surface to form a passivation layer, wherein the heterocyclic headgroup selectively reacts and binds to the metal surface.
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公开(公告)号:US11499237B2
公开(公告)日:2022-11-15
申请号:US16817044
申请日:2020-03-12
Applicant: Henkel AG & Co. KGaA
Inventor: Volker Geick , Kathrin Schaeuble
Abstract: The present invention relates to a method for the anti-corrosion treatment of components produced from aluminum, in particular casting parts such as vehicle rims, comprising a pretreatment stage and subsequent coating, wherein the pretreatment stage in turn includes a pickle on the basis of sulfuric acid aqueous solutions containing water-soluble compounds of the element Ti and at least one α-hydroxycarboxylic acid which is carried out upstream of an acidic conversion treatment on the basis of an acidic aqueous solution containing water-soluble compounds of the elements Zr and/or Ti.
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公开(公告)号:US20220341034A1
公开(公告)日:2022-10-27
申请号:US17240395
申请日:2021-04-26
Applicant: Applied Materials, Inc.
Inventor: Aykut Aydin , Rui Cheng , Karthik Janakiraman
Abstract: Exemplary deposition methods may include delivering a boron-containing precursor to a processing region of a semiconductor processing chamber. The methods may include delivering a dopant-containing precursor with the boron-containing precursor. The dopant-containing precursor may include a metal. The methods may include forming a plasma of all precursors within the processing region of the semiconductor processing chamber. The methods may include depositing a doped-boron material on a substrate disposed within the processing region of the semiconductor processing chamber. The doped-boron material may include greater than or about 80 at. % of boron in the doped-boron material.
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公开(公告)号:US20210355584A1
公开(公告)日:2021-11-18
申请号:US17273522
申请日:2019-09-05
Applicant: Rhodia Operations , Chemetall GmbH
Inventor: Lars Sebralla , Nawel Souad Khelfallah , Axel Schoene , Marie-Pierre Labeau , Guillaume Gody
IPC: C23C22/36 , C23F11/167 , C23C22/82
Abstract: Described herein is a method for treatment of at least one surface of a substrate at least partially made of aluminum and/or an aluminum alloy, including at least a step of contacting the surface with an acidic aqueous composition (A) including one or more metal compounds (M) selected from the group of titanium compounds, zirconium compounds, and hafnium compounds and one or more linear polymers (P) containing (m1) hydroxyethyl- and/or hydroxypropyl-(meth)acrylate, (m2) vinylphosphonic acid, and (m3) (meth)acrylic acid in form of their polymerized monomeric units, the one or more linear polymers (P) being included in the acidic aqueous composition (A) in an amount of 50 to 5000 ppm. Also described herein is an acidic aqueous composition (A), a master batch to produce the acidic aqueous composition (A), a method of using the acidic aqueous composition (A) for treating surfaces, and substrates comprising the treated surfaces.
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公开(公告)号:US20210348278A1
公开(公告)日:2021-11-11
申请号:US17273845
申请日:2019-09-20
Applicant: Raytheon Technologies Corporation
Inventor: Christopher W. Strock , William J. Joost , Promila P. Bhaatia
Abstract: A method (400) for applying a coating to a substrate (124) includes spraying (414) an aluminum-based coating layer (120) on the substrate. The coating layer is then infiltrated (420) with an aqueous solution (610). The solution comprises: a source of chromium; and potassium hexafluorozirconate.
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