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    Method for producing silanol compound and hydrogen
    4.
    发明授权
    Method for producing silanol compound and hydrogen 有权

    公开(公告)号：US11505460B2

    公开(公告)日：2022-11-22

    申请号：US16345199

    申请日：2017-09-08

    Applicant: OSAKA UNIVERSITY ,  DAICEL CORPORATION

    Inventor： Kiyotomi Kaneda ,  Takato Mitsudome ,  Yasuteru Kajikawa ,  Yuuichirou Hirai ,  Keisuke Ono

    IPC: C01B3/32 ,  B01J23/52 ,  B01J27/18 ,  C07F7/08 ,  H01M8/0612 ,  H01M8/0606 ,  C07B61/00 ,  C01B3/02

    Abstract: Provided is a method for generating hydrogen at a desired rate, using a hydrogen storage material that can be stored and transported safely and inexpensively. The method according to the present invention for producing a silanol compound and hydrogen includes subjecting a hydrosilane compound and water to a reaction with each other in the presence of a solid catalyst to give a silanol compound and hydrogen. The solid catalyst includes hydroxyapatite and gold particles supported on the hydroxyapatite, where the gold particles have an average particle size of 2.5 nm or less. The reaction in the method according to the present invention for producing a silanol compound and hydrogen is preferably performed in an air atmosphere. The reaction in the method according to the present invention for producing a silanol compound and hydrogen can be performed with application of substantially no heat and no activated energy rays.

    A SERIES OF CATALYSTS FOR THE HYPERPOLARISATION OF SUBSTRATES
    8.
    发明申请
    A SERIES OF CATALYSTS FOR THE HYPERPOLARISATION OF SUBSTRATES 有权

    公开(公告)号：US20220009854A1

    公开(公告)日：2022-01-13

    申请号：US17291851

    申请日：2019-11-06

    Applicant: UNIVERSITY OF YORK

    Inventor： Soumya Singha Roy ,  Wissam Iali ,  Ben Tickner ,  Simon Benedict Duckett

    IPC: C07B61/00 ,  A61K49/06

    Abstract: There is described a method for the preparation of a hyperpolarised agent, wherein said agent comprises at least one —N−, —O− or —S− moiety (optionally protonated) and a secondary binding site; said method comprising: (i) preparing a fluid containing a polarisation transfer precatalyst and parahydrogen; (ii) introducing a co-ligand to interact with the transfer precatalyst to form a polarisation transfer catalyst; (iii) applying a magnetic field or radio frequency excitation to (ii), such that hyperpolarisation is transferred from parahydrogen to a target molecule; (iv) introducing a target molecule containing at least at least one —N−, —O− or —S− moiety, in conjunction with a secondary binding to form a hyperpolarised agent; wherein the co-ligand is selected from the group consisting of one or more of a sulfoxide, a thioester, a phosphine, an amine, CO, an isonitrile and a nitrogen heterocycle.

    Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method
    10.
    发明授权
    Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method 有权

    公开(公告)号：US11067889B2

    公开(公告)日：2021-07-20

    申请号：US15757268

    申请日：2016-09-02

    Applicant: Mitsubishi Gas Chemical Company, Inc.

    Inventor： Masatoshi Echigo

    IPC: G03F7/021 ,  C07D303/28 ,  C07C43/23 ,  G03F7/11 ,  C08L63/00 ,  G03F7/09 ,  C07B61/00 ,  H01L21/311 ,  H01L21/033

    Abstract: A compound represented by the following formula (1) and a method for producing the same, and a composition, a composition for optical component formation, a film forming composition for lithography, a resist composition, a method for forming a resist pattern, a radiation-sensitive composition, a method for producing an amorphous film, an underlayer film forming material for lithography, a composition for underlayer film formation for lithography, a method for producing an underlayer film for lithography, a resist pattern formation method, a circuit pattern formation method, and a purification method. wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms, an aryl group of 6 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, a group represented by the following formula (A), a group represented by the following formula (B), a thiol group, or a hydroxy group, wherein at least one selected from the group consisting of R2 to R5 is a group selected from the group consisting of a group represented by the following formula (A) and a group represented by the following formula (B); m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2: wherein each R6 is independently an alkylene group of 1 to 4 carbon atoms; and m′ is an integer of 1 or larger, and wherein R6 is as defined above; R7 is a hydrogen atom or a methyl group; and m″ is 0 or an integer of 1 or larger.

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