FLEXIBLE ION GENERATOR DEVICE
    1.
    发明申请

    公开(公告)号:US20230052933A1

    公开(公告)日:2023-02-16

    申请号:US17978622

    申请日:2022-11-01

    IPC分类号: A61L9/22 H01J33/02

    摘要: A flexible ion generator device that includes a dielectric layer having a first end, a second end, a first side, a second side, a top side, and a bottom side, at least one trace positioned on the dielectric layer and having a plurality of emitters engaged to the at least one trace. A plurality of lights disposed on the dielectric layer.

    Isotope production system and cyclotron
    2.
    发明授权
    Isotope production system and cyclotron 有权
    同位素生产系统和回旋加速器

    公开(公告)号:US08153997B2

    公开(公告)日:2012-04-10

    申请号:US12435903

    申请日:2009-05-05

    IPC分类号: H05H13/00 G21K5/00 H01J33/02

    CPC分类号: H05H13/00

    摘要: A cyclotron that includes a magnet yoke having a yoke body that surrounds an acceleration chamber. The cyclotron also includes a magnet assembly to produce magnetic fields to direct charged particles along a desired path. The magnet assembly is located in the acceleration chamber. The magnetic fields propagate through the acceleration chamber and within the magnet yoke, wherein a portion of the magnetic fields escapes outside of the magnet yoke as stray fields. The cyclotron also includes a vacuum pump that is coupled to the yoke body. The vacuum pump is configured to introduce a vacuum into the acceleration chamber. The magnet yoke is dimensioned such that the vacuum pump does not experience magnetic fields in excess of 75 Gauss.

    摘要翻译: 一种回旋加速器,其包括具有围绕加速室的轭体的磁轭。 回旋加速器还包括磁体组件以产生磁场以沿所需路径引导带电粒子。 磁体组件位于加速室中。 磁场通过加速室和磁轭传播,其中一部分磁场作为杂散磁场从磁轭的外部逸出。 回旋加速器还包括耦合到轭体的真空泵。 真空泵构造成将真空引入加速室。 磁轭的尺寸使得真空泵不会经历超过75高斯的磁场。

    Device for shielding of x-rays in electron bombardment of materials on a
sheet, especially ink on a paper sheet
    3.
    发明授权
    Device for shielding of x-rays in electron bombardment of materials on a sheet, especially ink on a paper sheet 失效
    用于屏蔽片材上材料的电子轰击中的x射线的装置,特别是纸张上的油墨

    公开(公告)号:US5473164A

    公开(公告)日:1995-12-05

    申请号:US367692

    申请日:1995-01-03

    摘要: The device shields from X-radiation produced by electron bombardment of printed inks on a paper sheet in an apparatus including a press device, an electron bombardment device following the press device and a conveying device conveying the paper sheet from the press device through the electron bombardment device to the conveying device. To prevent smearing and double images on the paper sheet the device includes an upstream shielding duct device extending between the press device and the electron bombardment device through which the paper sheet is conveyed; a downstream shielding duct device extending between the electron bombardment device and the downstream conveying device through which the paper sheet is conveyed; a mechanism for contactless transport of the paper sheet from the press device, through the shielding duct devices and the electron bombardment device and to the conveying device; shielding components for shielding from X-radiation provided in press device; and shielding components for shielding against X-radiation provided in the downstream conveying device. Advantageously the upstream and downstream shielding duct devices extend into the press device and the conveying device respectively and the entrance of the upstream shielding duct device is adjacent and close to a contact surface of a press cylinder of the press device.

    摘要翻译: 该装置在包括压制装置,按压装置之后的电子轰击装置和通过电子轰击从压制装置输送纸张的输送装置的设备中屏蔽由印刷油墨在纸张上电子轰击而产生的X射线 装置到输送装置。 为了防止纸张上的拖影和双重图像,该装置包括在按压装置和电子轰击装置之间延伸的上游屏蔽导管装置,通过该电子轰击装置传送纸张; 在电子轰击装置和下游输送装置之间延伸的下游屏蔽导管装置,通过该下游输送装置输送纸张; 用于从压制装置非接触地输送纸张的机构,通过屏蔽通道装置和电子轰击装置以及输送装置; 屏蔽组件,用于屏蔽冲压装置中提供的X辐射; 以及用于屏蔽防止设置在下游输送装置中的X射线的部件。 有利地,上游和下游屏蔽管道装置分别延伸到压力装置和输送装置中,并且上游屏蔽管道装置的入口相邻并靠近压力装置的压缸的接触表面。

    Charged particle beam lithography machine incorporating localized vacuum
envelope
    5.
    发明授权
    Charged particle beam lithography machine incorporating localized vacuum envelope 失效
    带有局部真空包络的带电粒子束光刻机

    公开(公告)号:US4607167A

    公开(公告)日:1986-08-19

    申请号:US701439

    申请日:1985-02-12

    申请人: Paul F. Petric

    发明人: Paul F. Petric

    摘要: A charged particle beam lithography machine includes a beam source and beam steering and forming elements within an evacuated column. A stage assembly for supporting a semiconductor wafer or mask is positioned in ambient and proximate the exit end of said beam steering and forming elements. A vacuum envelope apparatus is affixed to the exit end of the beam steering and forming elements so that the outer surface or tip of the vacuum envelope apparatus rests in spaced apart, close coupled opposition to the wafer or mask supported on the stage. The vacuum envelope apparatus includes internal structural members which define an internal vacuum processing zone and at least one surrounding intermediate vacuum zone. A graded vacuum seal is formed between the tip of the vacuum envelope and the mask or wafer. The seal extends from the internal vacuum processing zone to the external ambient. Lithographic operations are conducted on the mask or wafer as relative motion between the stage assembly and the beam steering and forming elements is accomplished.

    摘要翻译: 带电粒子束光刻机包括一个射束源和一个抽真空柱内的光束转向和成形元件。 用于支撑半导体晶片或掩模的台架组件被定位在环境中并且靠近所述光束转向和成形元件的出口端。 真空包封装置固定到光束转向和成形元件的出口端,使得真空包封装置的外表面或尖端以与支撑在平台上的晶片或掩模隔开,紧密耦合的方式相对。 真空包封装置包括限定内部真空处理区和至少一个周围的中间真空区的内部结构构件。 在真空外壳的尖端和掩模或晶片之间形成渐变的真空密封。 密封件从内部真空处理区域延伸到外部环境。 在平台组件和光束转向和成形元件之间的相对运动完成时,在掩模或晶片上进行平版印刷操作。

    Means for creating an electron curtain
    6.
    发明授权
    Means for creating an electron curtain 失效
    创造电子幕的手段

    公开(公告)号:US4572957A

    公开(公告)日:1986-02-25

    申请号:US606704

    申请日:1984-05-03

    CPC分类号: H01J33/02

    摘要: The invention concerns a device for creating an electron curtain (5). The device consists of a cylindrical chamber (1) in which has been accommodated an elongated, electron-emitting filament (2) and a shell (3) encircling the filament so that the filament is located in an elongated depression (6) formed by the shell. Furthermore, the device comprises members (7) for accelerating the electrons and a window (4) in the wall of the chamber (1), through which the electron curtain can be directed to the outside of the device. The shell (3) encircling the filament (2) has on both margins of the depression (6) been shaped into an accelerating electrode (7) which can be brought to a negative potential with reference to the wall of the chamber (1), and the depression constitutes a diffusion volume for the electrons emitted from the filament and in the region of which there are mouldable parts, such as the accelerating electrodes (7) or the additional electrodes (9) on the bottom of the depression, by the aid of which the admission of electrons into the accelerating electric field and thereby the intensity of the electron curtain (5) that is produced are adjustable. Owing to the diffusion of electrons, it is possible with the means to produce an electron curtain with uniform intensity, and by suitably shaping the parts (7,9), the intensity distribution of the curtain may be adjusted in desired manner.

    摘要翻译: 本发明涉及一种用于产生电子幕(5)的装置。 该装置由圆柱形的腔室(1)组成,其中已经容纳有细长的电子发射丝(2)和围绕细丝的壳体(3),使得细丝位于由 贝壳。 此外,该装置包括用于加速电子的构件(7)和在室(1)的壁中的窗口(4),电子窗可以通过该窗口被引导到装置的外部。 围绕灯丝(2)的外壳(3)在凹部(6)的两边缘上形成加速电极(7),加速电极(7)可相对于腔室(1)的壁而变为负电位, 并且凹陷构成从灯丝发射的电子的扩散体积,并且在其中具有可模制部分的区域中,例如加速电极(7)或在凹陷的底部上的附加电极(9)的帮助 其中电子进入加速电场以及由此产生的电子幕(5)的强度是可调节的。 由于电子的扩散,可以通过手段产生具有均匀强度的电子窗帘,并且通过适当地成形部件(7,9),可以以期望的方式调节帘幕的强度分布。

    Field-emission ion source with spiral shaped filament heater
    7.
    发明授权
    Field-emission ion source with spiral shaped filament heater 失效
    具有螺旋形灯丝加热器的场发射离子源

    公开(公告)号:US4551650A

    公开(公告)日:1985-11-05

    申请号:US443642

    申请日:1982-11-22

    CPC分类号: H01J27/26

    摘要: The field-emission-type ion source according to the present invention comprises an emitter tip, a heater, a reservoir which stores material to be ionized, an extracting electrode situated at the front end of the emitter tip, and a coating-layer which is refractory and anti-reactive with the material to be ionized and which is coated on at least the heater of the emitter tip and heater, in order to prevent their reactions with the material to be ionized.

    摘要翻译: 根据本发明的场致发射型离子源包括发射极尖端,加热器,存储待离子化材料的储存器,位于发射极尖端前端的提取电极和涂覆层, 耐火材料和与待离子化的材料具有抗反应性,并且至少涂覆在发射极尖端和加热器的加热器上,以防止它们与材料的离子化反应。

    Gap control system for localized vacuum processing
    8.
    发明授权
    Gap control system for localized vacuum processing 失效
    用于局部真空处理的间隙控制系统

    公开(公告)号:US4528451A

    公开(公告)日:1985-07-09

    申请号:US435177

    申请日:1982-10-19

    CPC分类号: H01J37/30 H01L21/68

    摘要: Apparatus for controlling the gap between localized vacuum processing envelope apparatus and a workpiece as the workpiece, typically a semiconductor wafer, is moved laterally with respect to the envelope apparatus. The envelope apparatus includes an envelope which defines an internal vacuum processing zone and a generally planar tip spaced from the workpiece during processing by the gap. The gap control apparatus includes a gap sensor for measuring the gap, a control circuit for comparing the measured gap with a required gap and generating an error signal, and an actuating means for varying the gap in response to the error signal. The gap can be sensed by sensing the pressure level in the vacuum processing apparatus. The actuating means can include a plurality of piezoelectric actuators which can vary both the gap and the angle of the workpiece with respect to the tip of the vacuum processing apparatus. The disclosed apparatus is particularly useful in connection with particle beam systems such as electron beam lithography systems. In another embodiment, the gap is controlled by an air bearing between the envelope apparatus and the workpiece.

    摘要翻译: 用于控制局部真空处理包络装置和作为工件(通常为半导体晶片)的工件之间的间隙的装置相对于包络装置横向移动。 信封装置包括限定内部真空处理区域的封套和在由间隙处理期间与工件间隔开的大致平面的尖端。 间隙控制装置包括用于测量间隙的间隙传感器,用于将所测量的间隙与所需间隙进行比较并产生误差信号的控制电路,以及响应于误差信号改变间隙的致动装置。 可以通过感测真空处理装置中的压力水平来感测间隙。 致动装置可以包括多个压电致动器,其能够相对于真空处理装置的尖端改变工件的间隙和角度。 所公开的装置对于诸如电子束光刻系统的粒子束系统是特别有用的。 在另一个实施例中,间隙由包封装置和工件之间的空气轴承控制。