OXYGEN DOPING OF SILICON OXYFLUORIDE GLASS
    13.
    发明申请
    OXYGEN DOPING OF SILICON OXYFLUORIDE GLASS 审中-公开
    氧化硅氧化物玻璃的氧气掺杂

    公开(公告)号:WO2002068350A1

    公开(公告)日:2002-09-06

    申请号:PCT/US2002/005237

    申请日:2002-02-11

    IPC分类号: C03B32/00

    摘要: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The doped glass (20) is made by providing an O 2 doping atmosphere (26) to a silicon oxyfluoride glass (22) in a doping vessel (28). The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a "dry," silicon oxyfluoride glass which contains doped O 2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass contains intersticial O 2 molecules which provide improved endurance to laser exposure. Preferably the O 2 doped silicon oxyfluoride glass is characterized by having less than 1x10 17 molecules/cm3 of molecular hydrogen and low chlorine levels.

    摘要翻译: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 掺杂玻璃(20)通过在掺杂容器(28)中向氟氧化硅玻璃(22)提供O 2>掺杂气氛(26)制成。 本发明的氟氧化硅玻璃在157nm波长下是透射的,使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2>分子的“干式”氟氧化硅玻璃,并且在真空紫外(VUV)波长区域中表现出非常高的透射率和激光透射耐久性。 除了含氟并且具有很少或不含OH含量之外,本发明的氟氧化硅玻璃含有间隔的O> 2 <分子,这提供了对激光曝光的改善的耐久性。 优选地,O 2>掺杂的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

    INCREASING THE RETENTION OF GeO2 DURING PRODUCTION OF GLASS ARTICLES
    16.
    发明申请
    INCREASING THE RETENTION OF GeO2 DURING PRODUCTION OF GLASS ARTICLES 审中-公开
    在玻璃制品生产过程中增加GeO2的保留

    公开(公告)号:WO1997009279A1

    公开(公告)日:1997-03-13

    申请号:PCT/US1996014194

    申请日:1996-09-04

    IPC分类号: C03B20/00

    摘要: A method is disclosed for forming a GeO2-doped SiO2 glass article by depositing glass particles to form a porous preform and then drying and sintering the porous preform. A precursor of SnO2 is also present in the reactant stream used to form the particles, whereby the reaction produces particles of glass that contain GeO2, SiO2 and SnO2. The presence of SnO2 in the particles reduces the reaction of GeO2 with chlorine to form GeCl4 during the drying step. The GeC14 that would have formed would have either escaped from the porous preform or caused GeO2 to be re-deposited in an undesirable portion of the preform. The retention of GeO2 in the article is therefore enhanced.

    摘要翻译: 公开了一种通过沉积玻璃颗粒以形成多孔预型体然后干燥和烧结多孔预型体来形成掺杂了GeO 2的SiO 2玻璃制品的方法。 用于形成颗粒的反应物流中也存在SnO 2的前体,由此反应产生含有GeO 2,SiO 2和SnO 2的玻璃颗粒。 在干燥步骤中,SnO 2在颗粒中的存在减少了GeO 2与氯反应形成GeCl4。 将形成的GeC14将从多孔预制件中逸出或使GeO 2重新沉积在预成型件的不期望的部分中。 因此,提高了GeO2在制品中的保留性。