摘要:
A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO 2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.
摘要:
La présente invention concerne une fibre optique comprenant un milieu amplificateur muni d'un cœur (22) formé d'une matériau transparent et de nanoparticules (24) comprenant un élément dopant et au moins un élément améliorant l’utilisation de ce dopant, et d'une gaine externe (26) entourant le cœur, caractérisé en ce que l'élément dopant est l'erbium (Er) et en ce que l'élément d'amélioration est choisi parmi Pantimoine (Sb), le bismuth (Bi) et une combinaison d'antimoine (Sb) et de bismuth (Bi). Conformément à l'invention, une telle fibre est caractérisée en ce que la faille des nanoparticules est variable et comprise entre 1 et 500 nanomètres, et de préférence supérieure à 20 nm.
摘要:
It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100°C, and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass% of Sn calculated as SnO 2 and from 3 to 10 mass% of Ti calculated as TiO 2 , which has a homogeneity of the coefficient of thermal expansion from 0 to 100°C to the temperature of from 50 to 200 ppb/°C, a coefficient of thermal expansion from 0 to 100°C of 0 ±250 ppb/°C, and a Vickers hardness of at most 650.
摘要:
A quartz glass to be used through exposure to an ultraviolet ray having a wave length of 200 nm or less, characterized in that it is produced from natural rock-crystal or silica sand, has a total content of sodium, potassium, titanium and iron of 2.5 ppm or less and contains an OH group in an amount of 10 ppm or more; and an ultraviolet irradiation apparatus wherein the quartz glass is used as the material of a bulb (11) of a light emitting tube of an ultraviolet discharge lamp (L), and as the material of an ultraviolet-transmittable outer tube or protecting tube (20) housing the ultraviolet discharge lamp. The quartz glass is improved with respect to the lowering of the transmittance of an ultraviolet ray in a shorter wave length region with the elapse of time, which leads to the provision of a discharge lump and an ultraviolet irradiation apparatus which are greatly improved in the degree of retention of ultraviolet ray strength, and thus can be operated at a reduced cost and with saving energy.
摘要:
Es wird ein optisches Filtermaterial aus dotiertem Quarzglas angegeben, das bei geringer Dotierstoffkonzentration eine möglichst hohe spektrale Transmission von mindestens 80% cm -1 für Arbeitsstrahlung von 254 nm, eine möglichst geringe Transmission im Wellenlängenbereich unterhalb von etwa 250 nm und eine Kantenwellenlänge λ c im Wellenlängenbereich von 230 bis 250 nm aufweist. Es wurde gefunden, dass diese Aufgabe von einer Dotierung gelöst wird, die eine Galliumverbindung umfasst, die im Wellenlängenbereich unterhalb von 250 nm ein Maximum einer Absorptionsbande aufweist und dadurch die Kantenwellenlänge λ c bestimmt.
摘要翻译:有在具有低掺杂浓度的波长范围内提供掺杂石英玻璃的光学过滤材料一样高的至少80%的可能的光谱透射-1用于操作为254nm,在波长范围内的最低可能的传输低于约250 nm和截止波长的辐射4 C 具有230-250纳米。 已经发现,该目的通过包含镓化合物的掺杂剂实现的,处具有的波长范围内的吸收带,从而最大的低于250的截止波长λC被确定。
摘要:
The present invention provides a TiO 2 -containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO 2 -containing silica glass for optical member for EUV lithography, having a TiO 2 concentration of from 3 to 14 % by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T 400-700 , of 97 % or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T 400-3000 , of 70 % or more.
摘要:
Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.
摘要:
Methods, apparatus and precursors for producing substantially water-free silica soot, preforms and glass. The methods and apparatus make substantially water-free fused silica preforms or glass by removing water as a reaction product, removing water from the atmosphere, removing water from the transport process, or combinations thereof. In a first embodiment, substantially water-free soot, preforms or glass are achieved by using a hydrogen-free fuel, such as carbon monoxide, in the deposition process. In another embodiment, a soot producing burner has parameters that enable operation on a substantially hydrogen-free fuel. End burners, which minimize water production, are also described. Such water-free methods are useful in depositing fluorine-doped soot because of the low water present and the efficiency in which fluorine is incorporated. In another embodiment, glassy barrier layer methods and apparatus are described for minimizing dopant migration, especially fluorine. Laser and induction methods and apparatus for forming the barrier layer are depicted. A chlorine, fluorine and silica precursor, such as chlorofluorosilane, may be utilized to form fluorinated soot. Other methods and apparatus are directed to combinations of conventional and substantially water-free processes. One embodiment is directed to combustion enhancing additives for addition to the substantially hydrogen-free fuels. The methods and apparatus in accordance with the invention are particularly useful for producing photomask substrates and optical fiber preforms.