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公开(公告)号：WO2022233546A1
公开(公告)日：2022-11-10
申请号：PCT/EP2022/059781
申请日：2022-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： BATISTAKIS, Chrysostomos , PISARENCO, Maxim , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , RUTIGLIANI, Vito, Daniele , MIDDLEBROOKS, Scott, Anderson , VERSCHUREN, Coen, Adrianus , GEYPEN, Niels
Abstract: A method of determining a stochastic metric, the method comprising: obtaining a trained model having been trained to correlate training optical metrology data to training stochastic metric data, wherein the training optical metrology data comprises a plurality of measurement signals relating to distributions of an intensity related parameter across a zero or higher order of diffraction of radiation scattered from a plurality of training structures, and the training stochastic metric data comprises stochastic metric values relating to said plurality of training structures, wherein the plurality of training structures have been formed with a variation in one or more dimensions on which said stochastic metric is dependent; obtaining optical metrology data comprising a distribution of the intensity related parameter across a zero or higher order of diffraction of radiation scattered from a structure; and using the trained model to infer a value of the stochastic metric from the optical metrology data.
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公开(公告)号：WO2022233500A1
公开(公告)日：2022-11-10
申请号：PCT/EP2022/058246
申请日：2022-03-29
Applicant: ASML NETHERLANDS B.V.
Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.
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公开(公告)号：WO2022228820A1
公开(公告)日：2022-11-03
申请号：PCT/EP2022/058586
申请日：2022-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , EDWARD, Stephen , DONDERS, Sjoerd, Nicolaas, Lambertus , SCHELLEKENS, Adrianus, Johannes, Hendrikus , O'DWYER, David , NIKIPELOV, Andrey , DE VRIES, Gosse, Charles
Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.
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34.发明申请
公开(公告)号：WO2022223220A1
公开(公告)日：2022-10-27
申请号：PCT/EP2022/057476
申请日：2022-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE MEERENDONK, Remco , DIRECKS, Daniel, Jozef, Maria , NAKIBOGLU, Günes , WATERSON, Nicholas, Peter , KLUGKIST, Joost, André , PEKELDER, Sven , VAN DER NET, Antonius, Johannus , JACOBS, Johannes, Henricus, Wilhelmus , OUDES, Jaap , JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus , VAN LIPZIG, Jeroen, Peterus, Johannes , VAN SANTVOORT, Johannes, Franciscus, Martinus
Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.
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35.发明申请
公开(公告)号：WO2022214267A1
公开(公告)日：2022-10-13
申请号：PCT/EP2022/056091
申请日：2022-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： KARA, Dogacan , JENSEN, Erik , WILDENBERG, Jochem, Sebastiaan , DECKERS, David, Frans, Simon , GULER, Sila , ASTUDILLO RENGIFO, Reinaldo, Antonio , YUDHISTIRA, Yasri , HILHORST, Gijs , CAICEDO FERNANDEZ, David, Ricardo , SPIERING, Frans, Reinier , KHO, Sinatra, Canggih , BLOM, Herman, Martin , KIM, Sang Uk , KIM, Hyun-Su
Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method comprises obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for said first measurement dataset and said second measurement dataset until at least one stopping criterion is met so as to determine said substrate model, said steps comprising: 1. selecting a candidate basis function from said candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on at least one of said first measurement dataset and said second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on 10 the evaluation.
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Patent Agency Ranking
公开(公告)号：WO2022207265A1
公开(公告)日：2022-10-06
申请号：PCT/EP2022/056087
申请日：2022-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： STEENBRINK, Stijn, Wilem, Herman, Karel
IPC: H01J37/02
Abstract: Electron-optical systems comprising a particle trap and methods of operating electron-optical systems using a particle trap are disclosed. In one arrangement, a stage supports a sample. An objective lens arrangement projects electrons towards the sample along an electron-beam path. A particle trap comprises an electrode assembly radially outside of the objective lens arrangement and facing the sample. The electrode assembly draws a particle away from a surface of the sample and/or stage as the sample moves relative to the electron-beam path.
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37.发明申请
公开(公告)号：WO2022207222A1
公开(公告)日：2022-10-06
申请号：PCT/EP2022/055351
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Yongxin , LA FONTAINE, Bruno
IPC: H01J37/26
Abstract: An improved method of performing a self-diagnosis of a charged particle inspection system is disclosed. An improved method comprises triggering a self-diagnosis based on output data of the charged particle inspection system; in response to the triggering of the self-diagnosis, receiving diagnostic data of a sub-system of the charged particle inspection system; identifying an issue associated with the output data based on the diagnostic data of the sub-system; and generating a control signal to adjust an operation parameter of the sub-system according to the identified issue.
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公开(公告)号：WO2022194482A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/053966
申请日：2022-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： OTTEN, Christiaan , TEUNISSEN, Christan , SCHEEPERS, Paul, Hendricus , MEIJER, Joseph, Reinier
Abstract: Disclosed herein is a flood column for projecting a charged particle flooding beam along a beam path towards a sample to flood the sample with charged particles prior to assessment of the flooded sample using an assessment column, the flood column comprising: an anchor body arranged along the beam path; a lens arrangement arranged in a down-beam part of the flood column; and a lens support arranged between the anchor body and the lens arrangement; wherein the lens support is configured to position the lens arrangement and the anchor body relative to each other; the lens support comprises an electrical insulator; and the lens support is in the direct line of sight of at least a portion of the beam path in the down-beam part.
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公开(公告)号：WO2022194448A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/052816
申请日：2022-02-07
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , GOOSEN, Maikel, Robert
Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.
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公开(公告)号：WO2022189250A1
公开(公告)日：2022-09-15
申请号：PCT/EP2022/055393
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： VON FINCK, Alexander , HALM, Simon , MARKEL, Ingo , NEUMANN, Maciej
Abstract: A measuring apparatus (100) which is configured for roughness and/or defect measurement on a plurality of surface sections (2) of a surface of a sample (1) to be investigated comprises an illumination device (10) having at least two light sources (11A, 11B, 11C, 11D) which are arranged for illuminating a measuring region (3) of the surface with measuring light, a detector device (20) having a detector array (21) with a plurality of detector pixels which are arranged for capturing scattered light scattered at the surface, and an evaluation device (30) which is configured for determining at least one roughness feature of the surface, from the captured scattered light, the at least two light sources (11A, 11B, 11C, 11D) being configured for illuminating the measuring region (3) along at least two illumination beam paths (LA, LB, LC, LD) at different angles of incidence relative to a surface normal of the surface, the at least two light sources (11A, 11B, 11C, 11D) being able to be fixed with respect to the detector device (20), the detector device (20) being provided with imaging optics (22) arranged for imaging the measuring region (3) of the surface on the detector array (21), the detector device (20) being configured for detecting at least two scattered light images (4A, 4B, 4C, 4D) of surface sections (2) in the illuminated measuring region (3) at a predetermined viewing angle relative to the surface normal of the surface, portions of the scattered light received by the detector pixels, which portions are formed in each case by the illumination in one of the illumination beam paths (LA, LB, LC, LD), in each case having a common spatial frequency, and the evaluation device (30) being configured for determining the at least one roughness feature of the surface sections (2) from the at least two scattered light images (4A, 4B, 4C, 4D). A method for roughness and/or defect measurement is also described.
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