摘要:
To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm 2 .ppb) -1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm 2 ) by the laser, to be 0≤R≤0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译:为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学部件的方法,其中根据所使用的激光束的能量密度设置光学部件的OH基浓度,以调节比率R(KJ / cm 2) 光学构件的折射率相对于激光的累积照射能量(KJ / cm 2)的变化的<-1>为0≤R≤0.2,从而控制折射率的变化 通过用激光束照射由合成石英玻璃制成的光学构件的折射率在预定范围内。
摘要:
The invention relates to an electric lamp provided with a light source in a light-transmitting lamp vessel which is closed in a vacuumtight manner, which light source has an envelope of light-transmitting, UV-absorbing quartz glass which comprises silicon oxide, aluminum oxide and cerium oxide, characterized in that the quartz glass of the envelope comprises the aluminum oxide and cerium oxide in a molar ratio of between 0.30 and 0.48. The invention further relates to the quartz glass which is used for said lamp.
摘要:
Glassy articles are prepared by subjecting to hydrolysis and policondensation a solution or suspension of a suitable precursor, mainly comprising a silicon alkoxide, and by drying the obtained gel in a pressure chamber, the gel solvent having been substituted by a non-protic solvent, mainly acetone, under nitrogen flowing, at temperature and pressure conditions lower than the gel solvent critical values. The dried gel is then densified by a thermal treatment.
摘要翻译:用于光学构件的合成石英玻璃用于具有ArF准分子激光器作为能量密度为2mJ / cm 2 /脉冲或更低的光源的光学装置中,或者在具有KrF准分子激光器作为光源的光学装置中 能量密度为30mJ / cm 2 /脉冲以下。 用于光学构件的合成石英玻璃的特征在于氢分子浓度在1×10 16分子/ cm 3以上且小于5×10 16分子/ cm 3的范围内, 3>。
摘要:
Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
摘要:
Methods and apparatus for manufacturing titania-containing fused silica bodies are disclosed. The titania-containing fused silica bodies are subsequently processed to make extreme ultraviolet soft x-ray masks. The methods and apparatus involve providing powders external to a furnace cavity and depositing the powders in the furnace cavity to form a titania-containing fused silica body.
摘要:
A method for manufacturing an optical fiber and the resulting article. The method including the steps of: providing a substrate tube; depositing high purity silica-based cladding layers on the inside of the tube; depositing a germanium-free core comprising a glass including silica, and oxides of Al, La, Er, and Tm; collapsing the substrate tube to form a preform; and drawing the preform to yield an optical fiber. A germanium-free co-doped silicate optical waveguide in accordance with the present invention includes a core material comprising silica, aluminum, lanthanum, erbium and thulium, wherein the concentration of Er is from 15 ppm to 3000 ppm; Al is from 0.5 mol% to 15 mol%; La is less than 2 mol%; and Tm is from 150 ppm to 10000 ppm. In an exemplary specific embodiment the concentration of Al is from 4 mol% to 10 mol%; and the concentration of Tm is from 150 ppm to 3000 ppm. The core may further include F. In an exemplary embodiment, the concentration of F is less than or equal to 6 mol%. The waveguide may be an optical fiber, a shaped fiber or other light-guiding waveguides. An amplifier according to the present invention includes the optical fiber described above.
摘要:
A silica soot preform (12) is inserted into a furnace (30). The preform is then treated with heat and carbon monoxide gas (32) so as to reduce impurities that could effect the final product.