公开(公告)号：WO2003080525A1

公开(公告)日：2003-10-02

申请号：PCT/JP2003/003618

申请日：2003-03-25

Applicant: 株式会社ニコン ,  水口 雅史 ,  藤原 誠志 ,  小峯 典男

Inventor： 水口 雅史 ,  藤原 誠志 ,  小峯 典男

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1469 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C23/0025 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: A process for producing a quartz glass member, wherein a sample from a quartz glass base material is exposed to F2 laser under given conditions and whether or not the peak intensity of H2 Raman scattering radiation is decreased by 80% or more from the peak intensity of H2 Raman scattering radiation with respect to a sample not exposed to F2 laser is judged. When the decrease of the peak intensity of H2 Raman scattering radiation is less than 80%, the laser resistance of the quartz glass base material is judged as being satisfactory, and a synthetic quartz glass member is worked from the base material. The compaction of the sample is also measured.

Abstract translation: 一种用于制造石英玻璃构件的方法，其中来自石英玻璃基材的样品在给定条件下暴露于F2激光，并且H2拉曼散射辐射的峰值强度是否从峰值强度降低80％以上 判断相对于未暴露于F2激光的样品的H2拉曼散射辐射。 当H2拉曼散射辐射的峰值强度的降低小于80％时，石英玻璃基材的激光电阻被认为是令人满意的，并且从基材加工合成石英玻璃部件。 也测量样品的压实度。

公开(公告)号：WO2003048059A1

公开(公告)日：2003-06-12

申请号：PCT/US2002/035404

申请日：2002-11-05

Applicant: PILKINGTON NORTH AMERICA, INC.

Inventor： MACLACHLAN, Julia

IPC: C03C17/00

CPC classification number: C03C17/22 ,  C03C17/002 ,  C03C17/28 ,  C03C17/30 ,  C03C17/3405 ,  C03C23/002 ,  C03C2218/31 ,  C03C2218/328 ,  C03C2218/355 ,  Y10T428/24802

Abstract: A method of selectively removing a functional organic coating from a substrate by exposure of the coating to short wavelength ultraviolet light. The UV light utilized in the invention preferably has a dominant wavelength of from 5 nm to 254 nm. The method is particularly useful for removing selected portions of a hydrophobic coating on a glass substrate for use as an automotive glazing.

Abstract translation: 通过将涂层暴露于短波长紫外光来从基板选择性地除去功能性有机涂层的方法。 本发明中使用的UV光优选具有5nm至254nm的主波长。 该方法对于去除用作汽车玻璃的玻璃基板上的疏水涂层的选定部分特别有用。

公开(公告)号：WO0230610A8

公开(公告)日：2002-05-10

申请号：PCT/DE0103827

申请日：2001-10-09

Applicant: RODENSTOCK OPTIK G ,  SIMKE GEROLD

Inventor： SIMKE GEROLD

IPC: B23K26/066 ,  B23K26/08 ,  B44B7/00 ,  C03C23/00 ,  B23K26/00 ,  B23K26/073 ,  B23K26/10 ,  B24B13/005 ,  G02C7/02

CPC classification number: B23K26/0861 ,  B23K26/066 ,  B23K2201/007 ,  B44B7/00 ,  C03C23/002 ,  C03C23/0025

Abstract: The invention relates to a method and to a device for characterizing and especially for labeling the surfaces of optical glasses (6) by means of UV light which is especially generated by an excimer laser (1). The inventive method and the corresponding device are characterized by a combination of the following features: focusing the light beam by means of an individual optical element (5), displacing the surfaces to be characterized and the point of focus of the light beam in a direction of the tangential plane in the vertex of the surface relative one another, and additionally displacing the surface to be characterized in a direction of the normal in the vertex in such a manner that the point of focus lies on the surface.

Abstract translation: 描述了一种用于识别的方法和装置，特别是用UV光，这产生特别是受激准分子激光器（1）标记的光学透镜（6）的表面上。 本发明的方法和装置的特征为特征的以下组合：所述光束是由一个单一的光学元件（5）的被聚焦; 到的特征表面与光束的焦点在在表面的顶点的切向平面的方向上彼此相对移位; 并在除了所述焦点位于表面上的特征性表面被移位在顶点法线的方向以这样的方式。

公开(公告)号：WO02029492A1

公开(公告)日：2002-04-11

申请号：PCT/US2001/042292

申请日：2001-09-25

IPC: G03F7/00 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  C03C23/00 ,  G02B1/00 ,  G03F7/20 ,  H01L21/027 ,  C03B19/09 ,  C03C3/04 ,  G02B13/14

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm /pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02 x 1018 molecules/cm3 and about 0.18 x 1018 molecules/cm are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外线辐射源，以及浓度高于10mJ / cm 2的高纯度熔融石英光刻玻璃 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3之间的分子氢。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将减小的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

公开(公告)号：WO01068545A1

公开(公告)日：2001-09-20

申请号：PCT/JP2001/001885

申请日：2001-03-09

IPC: C03C3/095 ,  C03C4/08 ,  C03C23/00

CPC classification number: C03C3/095 ,  C03C4/085 ,  C03C23/002

Abstract: A soda-lime-silica type glass having a property of absorbing ultraviolet rays and also being colorless and transparent which has been prepared by irradiating a cerium containing soda-lime-silica glass with a light having a wave length in far-ultraviolet to near-ultraviolet region and is reduced in the transmittance of lights having a wave length in the range of 300 to 400 nm.

Abstract translation: 具有吸收紫外线的性质的钠钙二氧化硅型玻璃也是无色透明的，其通过用波长为远紫外光的光照射到含有钠钙石英玻璃的铈， 紫外线区域，波长在300〜400nm范围内的光的透射率降低。

公开(公告)号：WO1997023426A1

公开(公告)日：1997-07-03

申请号：PCT/DK1996000517

申请日：1996-12-09

Applicant: A/S BRÜEL & KJÆR ,  STORGAARD-LARSEN, Torben ,  POULSEN, Christian, Vestergaard

Inventor： A/S BRÜEL & KJÆR

IPC: C03C21/00

CPC classification number: G02B6/13 ,  C03C3/111 ,  C03C23/002 ,  C23C16/401 ,  C23C16/56 ,  G02B6/124 ,  G02B6/125

Abstract: A method of manufacturing germanium doped glasses, the refractive index of which can be changed preferably by exposure to UV-light by depositing a gas mixture. According to the invention, compounds containing N and H, such as NH3, which may be incorporated into the glass, are added to the gas mixture to be deposited. The invention further relates to the use of the method for the manufacture of an optical transducer, utilizing the fact that the filter frequency or frequencies is/are changed in response to the strain of the glass material.

Abstract translation: 制造锗掺杂玻璃的方法，其折射率可以通过沉积气体混合物而优选通过暴露于UV光而改变。 根据本发明，可将待掺入玻璃中的含有N和H的化合物（例如NH 3）加入待沉积的气体混合物中。 本发明还涉及使用这种用于制造光学传感器的方法，利用这样的事实，即根据玻璃材料的应变来改变滤波器的频率或频率。

公开(公告)号：WO1994020223A1

公开(公告)日：1994-09-15

申请号：PCT/FI1993000079

申请日：1993-03-08

Applicant: TAMGLASS ENGINEERING OY ,  SHAFIR, Aaron

Inventor： TAMGLASS ENGINEERING OY

IPC: B05D03/06

CPC classification number: C03C23/002 ,  B05B12/20 ,  B05D1/32 ,  C03C23/001 ,  G03F7/201 ,  G03F9/00

Abstract: A method and apparatus for exposing a substrate of relatively large surface area to radiation according to a predetermined pattern recorded on a mask, particularly useful in applying a painted border to an automobile windshield, includes the steps of progressively recording the predetermined pattern on a mask in the form of a continuous strip, and moving the radiation source to progressively scan the surface of the substrate with radiation, while at the same time moving the continuous strip mask relative to the radiation source, such that portions of the pattern on the continuous strip mask progressively become aligned with their corresponding portions of the substrate as the substrate is progressively scanned by the radiation source.

Abstract translation: 根据记录在掩模上的预定图案将相对较大的表面积的基底曝光于辐射的方法和装置，特别是在向汽车挡风玻璃施加涂漆边界时特别有用的方法和装置包括以下步骤：将预定图案逐渐记录在掩模上 连续条带的形式，并且移动辐射源以用辐射逐渐地扫描基片的表面，同时相对于辐射源移动连续带状掩模，使得连续条形掩模上的图案的部分 随着基板被辐射源逐渐扫描，它逐渐地与基板的相应部分对齐。