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公开(公告)号：WO2022069019A1
公开(公告)日：2022-04-07
申请号：PCT/EP2020/077217
申请日：2020-09-29
Applicant: CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V.
Inventor： SCHMITT, Jan , QUINTANILHA, Richard , WEGE, Stephan
Abstract: To produce a structured transmissive optical element, a blank (6) of trans- missive optical material is provided and coated with a chrome layer (7) which itself is coated with a hard mask layer (8). The chrome and hard mask layer coated blank (6) then is coated with a resist which is exposed to a structurized beam. The resist is developed and portions of the developed resist are removed according to the structurized exposition. The hard mask layer (8) is etched via the removed portions of the resist with a hard mask etching process gas which is oxygen-free and chlorine-free. Via such etch- ing, portions of the hard mask layer (8) are removed at positions which cor- respond to the positions of the removed portions of the resist. In a compa- rable manner, the chrome layer (7) is etched via a chrome etching process gas containing oxygen and/or chlorine. Again in a comparable manner, the blank (6) is etched via removed portions of the chrome layer (7) with an oxygen-free and chlorine-free blank etching process gas (13) to remove portions of the blank (6) at positions which correspond to the positions of the removed portions of the chrome layer (7). In a last step, the remaining hard mask and chrome layer portions (8, 7) are removed from the etched blank (6). With such method, a structured transmissive optical element having a well-defined pattern structure with high definition and resolution can be produced.
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公开(公告)号：WO2022058253A2
公开(公告)日：2022-03-24
申请号：PCT/EP2021/075019
申请日：2021-09-10
Applicant: ASML NETHERLANDS B.V.
Inventor： WIELAND, Marco, Jan-Jaco
IPC: H01J37/04 , H01J37/10 , H01J37/28 , H01J2237/04756 , H01J2237/0492 , H01J2237/1205
Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to control a parameter of a respective sub-beam. The plurality of objective lenses are configured to project one of the plurality of charged-particle beams onto a sample. The controller controls the control lenses and the objective lenses so that the charged particles are incident on the sample with a desired landing energy, demagnification and/or beam opening angle.
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公开(公告)号：WO2022058131A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/073423
申请日：2021-08-24
Applicant: ASML NETHERLANDS B.V.
Inventor： SIMMONS, Rodney, D.
IPC: H05G2/00
Abstract: A pressure vessel is configured to retain a fluid that includes tin. The pressure vessel includes a liner made of molybdenum, the liner defining a liner cavity that retains the tin fluid and is in contact with the tin fluid, and a pressure bearing shell defining a shell cavity in which the liner is fixed. The pressure bearing shell is made of a material having a coefficient of thermal expansion that matches a coefficient of thermal expansion of the molybdenum.
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公开(公告)号：WO2022058120A2
公开(公告)日：2022-03-24
申请号：PCT/EP2021/073051
申请日：2021-08-19
Applicant: ASML NETHERLANDS B.V.
IPC: H01J37/248 , H01R13/53 , H01R13/533
Abstract: Disclosed herein is a connector (401) for electrically connecting a feedthrough (411) of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly (405+406) configured to be in electrical connection with a high voltage power source, the wire assembly comprising a plug for receiving the end of a feedthrough pin (408); and a connector insulator (402) comprising a channel (407) configured to extend into the connector insulator and to receive the feedthrough pin so as to electrically connect the connector wire assembly with the feedthrough pin; wherein the connector insulator is configured to engage with the feedthrough so that a boundary surface of the connector insulator extends substantially bi-directionally in the direction of the longitudinal axis of the channel, the boundary surface substantially extending into the connector insulator.
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公开(公告)号：WO2022058111A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/072787
申请日：2021-08-17
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , SCOTUZZI, Marijke , FARAMARZI, Vina , VAN DEN BROEK, Bastiaan, Maurice
Abstract: Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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Patent Agency Ranking
公开(公告)号：WO2022058094A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/072239
申请日：2021-08-10
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20 , H01L21/683
Abstract: The invention provides a base plate configured to be attached to a semiconductor substrate, whereby the base plate is configured to remain attached to the semiconductor substrate during a sequence of processing steps performed on the semiconductor substrate, and whereby the base plate is made from a material having a Young's modulus larger than 300 GPa.
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公开(公告)号：WO2022053491A1
公开(公告)日：2022-03-17
申请号：PCT/EP2021/074669
申请日：2021-09-08
Applicant: ASML NETHERLANDS B.V.
Inventor： GAURY, Benoit, Herve , VAN RENS, Jasper, Frans, Mathijs
IPC: G01R27/26 , G01R31/305
Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.
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公开(公告)号：WO2022037980A1
公开(公告)日：2022-02-24
申请号：PCT/EP2021/072129
申请日：2021-08-09
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Yongxin , LAI, Rui-Ling , STEPANENKO, Nickolay , BEX, Jan , HENDRIX, Ronny , CORNELISSEN, Lidewij, Elisa , BROOKHUIS, Robert Anton
IPC: H01J37/16 , H01J37/244 , H05K1/02
Abstract: Detector modules, systems and methods for detecting signal beams are disclosed using a detector module and a support comprising a feedthrough. Furthermore, apparatuses, systems, and methods for sealing a vacuum system configured to provide an atmospheric environment and a vacuum chamber environment are disclosed. In some embodiments, a printed circuit board (PCB) comprising a first side for exposing to the atmospheric environment and a second side for exposing to the vacuum chamber environment and for covering an aperture in the vacuum chamber environment, wherein the second side is opposite to the first side. The apparatuses, systems, and methods may include a rigid body on the first side of the PCB and a device connected to the second side of the PCB and positioned on a portion of the PCB that covers the aperture. The PCB may be configured to provide an interface between the device and the rigid body.
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公开(公告)号：WO2022033941A1
公开(公告)日：2022-02-17
申请号：PCT/EP2021/071804
申请日：2021-08-04
Applicant: ASML NETHERLANDS B.V.
Inventor： WALVOORT, Derk, Ferdinand , SMITS, Marc , VAN DE PEUT, Teunis
Abstract: Disclosed herein is an actuator arrangement (70) comprising: a wall (504) defining a cavity (71); a casing (72) protruding from the wall (504) and defining an interior (73) in fluid communication with the cavity (71); an actuator (901) comprising: a force imparter (74) configured to impart force on a component in the cavity (71); and an actuation mechanism (75) configured to drive the force imparter (74), wherein at least part of the actuation mechanism (75) is within said interior of the casing (72) and exposed to the cavity (71); and a control element (76) configured to control the actuation mechanism (75), wherein the control element (76) extends through the casing (72) via a seal (77).
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公开(公告)号：WO2022033793A1
公开(公告)日：2022-02-17
申请号：PCT/EP2021/069613
申请日：2021-07-14
Applicant: ASML NETHERLANDS B.V.
Inventor： COLLIGNON, Tijmen, Pieter , SMAL, Pavel , TABERY, Cyrus, Emil , DOS SANTOS GUZELLA, Thiago , BASTANI, Vahid
Abstract: Methods and associated apparatus for identifying contamination in a semiconductor fab are disclosed. The methods comprise determining contamination map data for a plurality of semiconductor wafers clamped to a wafer table after being processed in the semiconductor fab. Combined contamination map data is determined based, at least in part, on a combination of the contamination map data of the plurality of semiconductor wafers. The combined contamination map data is combined to reference data. The reference data comprises one or more values for the combined contamination map data that are indicative of contamination in one or more tools in the semiconductor fab.
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