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    PROCESS AND APPARATUS FOR TREATING WASTE ANESTHETIC GAS
    2.
    发明申请
    PROCESS AND APPARATUS FOR TREATING WASTE ANESTHETIC GAS 审中-公开

    公开(公告)号：WO2002026355A3

    公开(公告)日：2002-04-04

    申请号：PCT/JP2001/008441

    申请日：2001-09-27

    Applicant: SHOWA DENKO K.K. ,  HOTTA, Masatoshi ,  OKA, Masakazu ,  FURUSE, Yoshio ,  ATOBE, Hitoshi ,  CHAEN, Shigehiro

    Inventor： HOTTA, Masatoshi ,  OKA, Masakazu ,  FURUSE, Yoshio ,  ATOBE, Hitoshi ,  CHAEN, Shigehiro

    IPC: B01D53/04

    Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder (1) filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively introducing the gas into a catalyst layer filled with a nitrous oxide decomposition catalyst (3), where nitrous oxide is decomposed into nitrogen and oxygen. By using the process and the apparatus for treating a waste anesthetic gas of the present invention, a volatile anesthetic having a possibility of destroying the ozone layer or nitrous oxide as a global warming gas can be made harmless while preventing the release into atmosphere.

    ADSORBENT FOR PURIFYING PERFLUOROCARBON, PROCESS FOR PRODUCING SAME, HIGH PURITY OCTAFLUOROPROPANE AND OCTAFLUOROCYCLOBUTANE, AND USE THEREOF
    3.
    发明申请
    ADSORBENT FOR PURIFYING PERFLUOROCARBON, PROCESS FOR PRODUCING SAME, HIGH PURITY OCTAFLUOROPROPANE AND OCTAFLUOROCYCLOBUTANE, AND USE THEREOF 审中-公开
    用于净化全氟化碳的吸附剂，其生产方法，高纯度OCTAFLORORROPANE和OCTAFLUOROCYCLOBUTANE及其用途

    公开(公告)号：WO0222254A3

    公开(公告)日：2002-10-10

    申请号：PCT/JP0107988

    申请日：2001-09-14

    Applicant: SHOWA DENKO KK ,  SUZUKI YASUHIRO ,  ATOBE HITOSHI ,  HORIBA MINAKO

    Inventor： SUZUKI YASUHIRO ,  ATOBE HITOSHI ,  HORIBA MINAKO

    IPC: B01J20/20 ,  B01J20/30 ,  C01B32/336 ,  C07C17/00 ,  C07C17/389 ,  C01B31/10 ,  C07C19/08 ,  C07C23/06

    CPC classification number: C07C17/389 ,  B01J20/20 ,  B01J20/30 ,  B01J20/3078 ,  C01B32/336 ,  C07C23/06 ,  C07C19/08

    Abstract: To provide a purification adsorbent capable of effectively removing impurities contained in a perfluorocarbon and obtaining a perfluorocarbon reduced in the impurity content to 1 ppm by mass or less; a process for producing the adsorbent; high-purity octafluoropropane or octafluorocyclobutane; processes for purifying and for producing the octafluoropropane or octafluorocyclobutane; and uses thereof. Purification is performed using a purification adsorbent produced by a method comprising (1) washing an original coal with an acid and then with water, (2) deoxidizing and/or dehydrating the original coal, (3) re-carbonizing the original coal at a temperature of from 500 to 700 DEG C and (4) activating the original coal at a temperature of from 700 to 900 DEG C in a mixed gas stream containing an inert gas, carbon dioxide and water vapor.

    Abstract translation: 提供能够有效去除全氟化碳中含有的杂质的纯化吸附剂，得到杂质含量降低至1质量ppm以下的全氟化碳; 一种生产该吸附剂的方法; 高纯度八氟丙烷或八氟环丁烷; 纯化和生产八氟丙烷或八氟环丁烷的方法; 及其用途。 使用通过以下方法进行的纯化进行，所述净化吸附剂通过以下方法进行，所述方法包括：（1）用酸洗涤原始煤，然后用水洗涤，（2）使原煤脱氧和/或脱水，（3）将原煤再次碳化 温度为500-700℃，（4）在含有惰性气体，二氧化碳和水蒸气的混合气流中，在700-900℃的温度下活化原始煤。

    REACTION APPARATUS WITH A HEAT-EXCHANGER
    4.
    发明申请
    REACTION APPARATUS WITH A HEAT-EXCHANGER 审中-公开
    带有换热器的反应装置

    公开(公告)号：WO2003080230A1

    公开(公告)日：2003-10-02

    申请号：PCT/JP2003/003591

    申请日：2003-03-25

    Applicant: SHOWA DENKO K. K. ,  HOTTA, Masatoshi ,  ATOBE, Hitoshi

    Inventor： HOTTA, Masatoshi ,  ATOBE, Hitoshi

    IPC: B01J8/02

    CPC classification number: B01J8/0085 ,  B01D53/74 ,  B01J8/0278 ,  B01J8/0285 ,  B01J2208/00061 ,  B01J2208/00176 ,  B01J2208/00185 ,  B01J2208/00194 ,  B01J2208/00212 ,  B01J2208/00221 ,  B01J2208/00398 ,  B01J2208/00407 ,  B01J2208/0053 ,  B01J2208/00814 ,  F28D7/1669 ,  F28F2009/226

    Abstract: A reaction apparatus comprising a heat exchanger 5 and a reactor 1 with a heater 2, which are enclosed in an outer casing 6, the top of the heat exchanger 5 being connected to the reactor 1, the other end part of the heat exchanger 5 and the bottom of the outer casing 6 being fixed to each other by a flange 4, and a double piping 7 for introducing a gas to be treated and discharging the treated gas being connected to the other end part of the heat exchanger 5, such that the gas passes through the heat exchanger 5, the reactor 1 and the heat exchanger 5 during the process from introducing gas through one of the inner tube and the outer tube in the double piping to discharging the gas through the other tube, and reaction method using the apparatus. Using the apparatus of the present invention, the temperature distribution inside the reactor can be kept uniform and efficiency in energy recovery is enhanced.

    Abstract translation: 一种反应装置，包括热交换器5和具有加热器2的反应器1，其包封在外壳6中，热交换器5的顶部连接到反应器1，热交换器5的另一端部和 外壳6的底部通过凸缘4彼此固定，并且用于引入待处理气体并排出与热交换器5的另一端连接的处理气体的双重配管7，使得 气体通过热交换器5，反应器1和热交换器5，在引入气体通过双管道中的内管和外管之一通过另一个管排出气体，并且使用 仪器。 使用本发明的装置，反应器内的温度分布可以保持均匀，能量回收的效率提高。

    HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS
    5.
    发明申请
    HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS 审中-公开
    高纯度氟气，其生产和使用方法，以及分析高纯度氟气中痕量污染物的方法

    公开(公告)号：WO03002454A3

    公开(公告)日：2003-05-30

    申请号：PCT/JP0206519

    申请日：2002-06-27

    Applicant: SHOWA DENKO KK ,  TORISU JUNICHI ,  ATOBE HITOSHI ,  HOSHINO YASUYUKI

    Inventor： TORISU JUNICHI ,  ATOBE HITOSHI ,  HOSHINO YASUYUKI

    IPC: C01B7/20 ,  G01N21/03 ,  G01N21/09 ,  G01N21/35 ,  G01N30/14 ,  H01S3/036 ,  H01S3/225 ,  C01G53/08

    CPC classification number: G01N21/3504 ,  C01B7/20 ,  G01N21/0303 ,  G01N21/09 ,  G01N2030/143 ,  H01S3/036 ,  H01S3/225 ,  Y10T436/19

    Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.

    Abstract translation: 将氟化合物加热以释放氟气的步骤（1），允许氟气封闭到氟化合物中的步骤（2）和加热氟化合物并降低内部压力的步骤（3） 分别在容器中进行至少一次，然后在步骤（1）中获得高纯度氟气。 此外，将氟化合物的加热步骤（5）和内部压力降低，以及将氟化氢含量降低的氟气阻挡在氟化合物中的步骤（6）在具有氟化层的容器中进行 在其表面上分别至少形成一次，进一步进行步骤（5），然后将含有杂质气体的氟气与氟化合物化合物接触以固定和除去氟气，并通过气相色谱分析杂质 。

    HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS
    7.
    发明申请
    HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS 审中-公开
    高纯氟气体及其生产和用途以及高纯氟气体中微量杂质分析方法

    公开(公告)号：WO2003002454A2

    公开(公告)日：2003-01-09

    申请号：PCT/JP2002/006519

    申请日：2002-06-27

    Applicant: SHOWA DENKO K. K. ,  TORISU, Junichi ,  ATOBE, Hitoshi ,  HOSHINO, Yasuyuki

    Inventor： TORISU, Junichi ,  ATOBE, Hitoshi ,  HOSHINO, Yasuyuki

    IPC: C01B7/20

    CPC classification number: G01N21/3504 ,  C01B7/20 ,  G01N21/0303 ,  G01N21/09 ,  G01N2030/143 ,  H01S3/036 ,  H01S3/225 ,  Y10T436/19

    Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.

    Abstract translation: 加热氟化镍化合物以释放氟气的步骤（1），允许氟气吸收到含氟化合物中的步骤（2）和加热步骤（3） 氟化镍化合物和降低内压分别在容器中分别至少进行一次，然后在步骤（1）中获得高纯度氟气。 此外，加热氟化镍化合物并降低内压的步骤（5）和使氟化氢含量减少的氟气被氟化镍化合物吸收的步骤（6）在具有氟化层 在其表面上分别形成至少一次，然后进一步进行步骤（5），然后使含有杂质气体的氟气与氟化镍化合物接触以固定和除去氟气，并且通过气相色谱分析杂质

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