公开(公告)号：WO2012107754A3

公开(公告)日：2012-08-16

申请号：PCT/GB2012/050268

申请日：2012-02-07

Applicant: CAMBRIDGE NANOLITIC LIMITED ,  SHASHKOV, Pavel ,  KHOMUTOV, Gennady ,  YEROKHIN, Aleksey ,  USOV, Sergey

Inventor： SHASHKOV, Pavel ,  KHOMUTOV, Gennady ,  YEROKHIN, Aleksey ,  USOV, Sergey

IPC: C25D5/18 ,  C25D11/00 ,  C25D11/04 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D21/12

Abstract: A method of forming a non-metallic coating on a metallic substrate involves the steps of positioning the metallic substrate in an electrolysis chamber and applying a sequence of voltage pulses of alternating polarity to electrically bias the substrate with respect to an electrode. Positive voltage pulses anodically bias the substrate with respect to the electrode and negative voltage pulses cathodically bias the substrate with respect to the electrode. The amplitude of the positive voltage pulses is potentiostatically controlled, wheras the amplitude of the negative voltage pulses is galvanostatically controlled.

公开(公告)号：WO2012107754A2

公开(公告)日：2012-08-16

申请号：PCT/GB2012050268

申请日：2012-02-07

Applicant: CAMBRIDGE NANOLITIC LTD ,  SHASHKOV PAVEL ,  KHOMUTOV GENNADY ,  YEROKHIN ALEKSEY ,  USOV SERGEY

Inventor： SHASHKOV PAVEL ,  KHOMUTOV GENNADY ,  YEROKHIN ALEKSEY ,  USOV SERGEY

IPC: C25D11/00

CPC classification number: C25D5/18 ,  C25D11/00 ,  C25D11/005 ,  C25D11/02 ,  C25D11/024 ,  C25D11/026 ,  C25D11/04 ,  C25D11/06 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D15/00 ,  C25D21/12 ,  H01L23/142 ,  H01L23/3677 ,  H01L23/3735 ,  H01L2224/48227 ,  H01L2224/49109 ,  H01L2924/01327 ,  H01L2924/09701 ,  H01L2924/1305 ,  H01L2924/13055 ,  H05K1/021 ,  H05K1/053 ,  H05K1/115 ,  H05K1/18 ,  H05K2201/0116 ,  H05K2203/0315 ,  H05K2203/1147 ,  Y10T428/1317 ,  Y10T428/24917 ,  Y10T428/249969 ,  H01L2924/00

Abstract: A method of forming a non-metallic coating on a metallic substrate involves the steps of positioning the metallic substrate in an electrolysis chamber and applying a sequence of voltage pulses of alternating polarity to electrically bias the substrate with respect to an electrode. Positive voltage pulses anodically bias the substrate with respect to the electrode and negative voltage pulses cathodically bias the substrate with respect to the electrode. The amplitude of the positive voltage pulses is potentiostatically controlled, wheras the amplitude of the negative voltage pulses is galvanostatically controlled.

Abstract translation: 在金属基材上形成非金属涂层的方法包括以下步骤：将金属基材定位在电解室中，并且施加一系列交替极性的电压脉冲以相对于电极使基板电偏置。 正电压脉冲相对于电极阳极偏置衬底，负电压脉冲相对于电极阴极偏置衬底。 正电压脉冲的幅度被电位控制，从而恒定地控制负电压脉冲的幅度。

公开(公告)号：WO2012107754A9

公开(公告)日：2013-03-07

申请号：PCT/GB2012050268

申请日：2012-02-07

Applicant: CAMBRIDGE NANOLITIC LTD ,  SHASHKOV PAVEL ,  KHOMUTOV GENNADY ,  YEROKHIN ALEKSEY ,  USOV SERGEY

Inventor： SHASHKOV PAVEL ,  KHOMUTOV GENNADY ,  YEROKHIN ALEKSEY ,  USOV SERGEY

IPC: C25D5/18 ,  C25D11/00 ,  C25D11/04 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D21/12

CPC classification number: C25D5/18 ,  C25D11/00 ,  C25D11/005 ,  C25D11/02 ,  C25D11/024 ,  C25D11/026 ,  C25D11/04 ,  C25D11/06 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D15/00 ,  C25D21/12 ,  H01L23/142 ,  H01L23/3677 ,  H01L23/3735 ,  H01L2224/48227 ,  H01L2224/49109 ,  H01L2924/01327 ,  H01L2924/09701 ,  H01L2924/1305 ,  H01L2924/13055 ,  H05K1/021 ,  H05K1/053 ,  H05K1/115 ,  H05K1/18 ,  H05K2201/0116 ,  H05K2203/0315 ,  H05K2203/1147 ,  Y10T428/1317 ,  Y10T428/24917 ,  Y10T428/249969 ,  H01L2924/00

Abstract: A method of forming a non-metallic coating on a metallic substrate involves the steps of positioning the metallic substrate in an electrolysis chamber and applying a sequence of voltage pulses of alternating polarity to electrically bias the substrate with respect to an electrode. Positive voltage pulses anodically bias the substrate with respect to the electrode and negative voltage pulses cathodically bias the substrate with respect to the electrode. The amplitude of the positive voltage pulses is potentiostatically controlled, wheras the amplitude of the negative voltage pulses is galvanostatically controlled.

Abstract translation: 在金属衬底上形成非金属涂层的方法涉及以下步骤：将金属衬底放置在电解室中，并施加交替极性的电压脉冲序列以相对于电极对衬底进行电偏置。 正电压脉冲相对于电极对衬底进行阳极偏置，并且负电压脉冲相对于电极对衬底进行阴极偏置。 正电压脉冲的振幅被恒电位控制，负电压脉冲的振幅被恒流控制。

公开(公告)号：WO2012107755A1

公开(公告)日：2012-08-16

申请号：PCT/GB2012/050269

申请日：2012-02-07

Applicant: CAMBRIDGE NANOLITIC LIMITED ,  SHASHKOV, Pavel ,  KHOMUTOV, Gennady ,  YEROKHIN, Aleksey ,  USOV, Sergey

Inventor： SHASHKOV, Pavel ,  KHOMUTOV, Gennady ,  YEROKHIN, Aleksey ,  USOV, Sergey

IPC: C25D5/18 ,  C25D11/00 ,  C25D11/04 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D21/12 ,  H01L23/14

CPC classification number: C25D5/18 ,  C25D11/00 ,  C25D11/005 ,  C25D11/02 ,  C25D11/024 ,  C25D11/026 ,  C25D11/04 ,  C25D11/06 ,  C25D11/26 ,  C25D11/30 ,  C25D11/32 ,  C25D13/02 ,  C25D15/00 ,  C25D21/12 ,  H01L23/142 ,  H01L23/3677 ,  H01L23/3735 ,  H01L2224/48227 ,  H01L2224/49109 ,  H01L2924/01327 ,  H01L2924/09701 ,  H01L2924/1305 ,  H01L2924/13055 ,  H05K1/021 ,  H05K1/053 ,  H05K1/115 ,  H05K1/18 ,  H05K2201/0116 ,  H05K2203/0315 ,  H05K2203/1147 ,  Y10T428/1317 ,  Y10T428/24917 ,  Y10T428/249969 ,  H01L2924/00

Abstract: An insulated metal substrate (IMS) for supporting a device comprises a metallic substrate having a ceramic coating formed at least in part by oxidation of a portion of the surface of the metallic substrate. The ceramic coating has a dielectric strength of greater than 50 KV mm -1 and a thermal conductivity of greater than 5 Wm -1 K -1 .

Abstract translation: 用于支撑器件的绝缘金属衬底（IMS）包括具有至少部分地通过金属衬底的表面的一部分的氧化而形成的陶瓷涂层的金属衬底。 陶瓷涂层的介电强度大于50KV / mm，热导率大于5Wm-1K-1。