摘要:
The invention concerns a semiconductor device that can be controlled by the field effect comprising a first zone of a first conduction type, at least one gate electrode of polycristalline silicon, insulated from the first zone, at least one source/emitter region built into the first zone, in which the source/emitter region has a first region of the first conduction type which is built into the first zone and connected to a source/emitter terminal, a second region made of insulating material is disposed beneath the first region and has a greater ground area than the first region.
摘要:
The MIS structure contains an n-drift region (1), a base region (3) arranged on one surface of the drift region (1), an ion-implanted n source region (2) in the base region (3), a source electrode (S) short-circuiting the base (3) and source regions (2) and a gate electrode (6) to control the resistance of a channel region (32) of the base region (3) via an insulator region (5). The base region (3) is more highly doped in an ion-implanted p partial region (33) beneath the entire source region (2) than in the channel region (32).
摘要:
The invention relates to an electric switching component with two temperature sensors (6, 7). The first temperature sensor (6) is located at the warmest point of the component and switches the component off when a first upper temperature threshold value (T1) has been reached and turns said component on again when temperature falls below a second lower theshold value (T2). The oscillation arising from the first temperator sensor (6) is switched on and off by the second temperature sensor (7) which is located away from the first temperature sensor (6) in a slightly less warm place and has lower threshold values (T3,T4) than the first temperature sensor.
摘要:
The invention relates to a MOS transistor structure which displaces the current path in the drain zone from the surface to deep within. In the embodiment according to the invention a deflection zone is arranged in the drain region below the drain spacer. In another embodiment, a deflection electrode instead of a deflection zone is incorporated in the drain spacer.
摘要:
The invention relates to a CMOS comparator wherein four p-channel lateral high voltage transistors (T11-T14) form two first current mirrors and two n-channel lateral high voltage transistors form a second current mirror. A depletion transistor (T2) located in the current path of the reference voltage determines the current flowing there. If the input voltage (UIN) is equal to the reference voltage (URef) the same current flows in both current paths. If the input voltage (UIN) deviates from the reference voltage (URef) the output voltage is modified substantially.
摘要:
This invention concerns a combinational circuit device comprising a power MOS-FET, the load link of which is connected in series to a wire wound coil of a repeater, as well as a gate voltage supply circuit, the output signal of which is directed to the gate terminal of the power MOS-FET, in which the power MOS-FET (1) is a high voltage MOS-FET and there are a second MOS-FET (2), the load link of which is connected in series to the load link of high voltage MOS-FET (1) with low ohm construction, and a control circuit (14), which is fed from the signal applied to the gate terminal (G1) of the high voltage MOS-FET (1) and produces a signal for controlling the second MOS-FET (2).
摘要:
The field effect-controllable semiconductor component has a drain zone of the first conductivity type and also at least one gate electrode which is composed of polycrystalline silicon and is insulated from the drain zone. A source region of the second conductivity type is introduced in the drain zone. In addition, there is formed in the drain zone a trench structure, which reach from the surface of the epitaxial layer down into the substrate layer. An additional field plate made of polysilicon and embedded in an oxide layer is introduced in the trench structure. The thickness of the oxide surrounding the field plate increases down in a direction towards the drain.
摘要:
The invention concerns a semiconductor component controllable through field effect with a vertical or lateral construction, i.e. MOSFETs and IGBTs. In the source-drain loading stage, recessed zones and complementary zones of opposing conducting types are made in the semiconductor body, i.e. in the inner zone for vertical components and in the drift zone for lateral components, the concentration in the regions doped by the first conducting type corresponding approximately to the concentration in the regions doped by the second conducting type.
摘要:
A cordless telephone has several mobile elements (MTn) allocated to a fixed element (FT). In order to establish a connection between the fixed element (FT) and one of the mobile elements (MTn), an incoming call (AR) is converted to an outgoing call. The exchange of the required communication data occurs exclusively over speech channels. An identification code with group or individual identification is emitted by the fixed element (FT) as an identification message (KMn) with a call message (RM). The call is signalled by the mobile parts (MTn) connected to one group. Call-indicator messages (RAM) are sent back one by one on a free channel. The fixed element (FT) monitors the channels until an established-connection message (VAM) is sent by a mobile element (MTn), a fork switch having been actuated. Said mobile part (MTn) thereby initiates the establishment of a connection. The fixed part (FT) can also call one mobile part (MTn) after another individually. Each mobile part (MTn) sends back on the same channel the call-indicator message (RAM) and, after the fork switch has been actuated, the established-connection message (VAM).
摘要:
Programming a computer-connectable peripheral is simplified thanks to a process for selecting and programming the functions of such a peripheral. This process also allows the programming and selecting steps to become automatic.