公开(公告)号：WO2016073962A1

公开(公告)日：2016-05-12

申请号：PCT/US2015/059629

申请日：2015-11-06

Applicant: TEXAS INSTRUMENTS INCORPORATED ,  TEXAS INSTRUMENTS JAPAN LIMITED

Inventor： GUO, Honglin ,  TAYLOR, Tim, A. ,  WEST, Jeff, A. ,  JACKSON, Ricky, A. ,  WILLIAMS, Byron

IPC: H01L21/02 ,  H01L21/033 ,  H01L51/05 ,  H01L51/56

CPC classification number: H01L21/02118 ,  H01G4/14 ,  H01G4/18 ,  H01G4/224 ,  H01G4/236 ,  H01G4/33 ,  H01L21/02164 ,  H01L21/02178 ,  H01L21/0228 ,  H01L23/3121 ,  H01L23/3135 ,  H01L23/3192 ,  H01L23/564 ,  H01L24/05 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L28/40 ,  H01L51/00 ,  H01L2224/02166 ,  H01L2224/0345 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/04042 ,  H01L2224/05567 ,  H01L2224/05568 ,  H01L2224/05573 ,  H01L2224/0558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/05655 ,  H01L2224/05664 ,  H01L2224/05669 ,  H01L2224/291 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2224/8592 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/03 ,  H01L2924/014 ,  H01L2224/45099

Abstract: In described examples, water molecule infiltration from water vapor in the ambient is effectively reduced by a moisture barrier (320) including a layer of aluminum oxide formed by an atomic layer deposition (ALD) process. A microelectronic device (300) includes a capacitor (306) with organic polymer material (314) in the capacitor dielectric (310) and a moisture barrier (320) with a layer of aluminum oxide formed by an ALD process.

Abstract translation: 在所述实施例中，通过包含由原子层沉积（ALD）工艺形成的氧化铝层的防潮层（320）有效地减少了水分子在环境中渗透的渗透。 微电子器件（300）包括在电容器电介质（310）中具有有机聚合物材料（314）的电容器（306）和具有由ALD工艺形成的氧化铝层的防潮层（320）。