METHOD OF INDUCING CHEMICAL REACTIONS
    1.
    发明申请
    METHOD OF INDUCING CHEMICAL REACTIONS 审中-公开
    诱发化学反应的方法

    公开(公告)号:WO2012003490A1

    公开(公告)日:2012-01-05

    申请号:PCT/US2011042871

    申请日:2011-07-01

    Abstract: A method for inducing chemical reactions using X-ray radiation comprises generating an irradiation voiume within the interior of a reaction vessel by introducing X-ray radiation into the volume, in which two or more reactants are introduced, With respect to the two or more reactants and any subsequentiy created intermediate reactani or reactants, the aggregate extent to which the foregoing reactants are to be ionized to any degree is selectively controlled, and the average degree of ionization in the irradiation volume, from partial to total, of that portion of the foregoing reactants which is to be ionized is selectively controlled, through control of the fiuence and energy of the X-ray radiation, to thereby induce selective reactions of reactants to occur in the irradiation volume. One or more reactants may be delivered through a double-wailed pipe containing X-ray shielding to prevent their premature irradiation before being infected into the irradiation volume.

    Abstract translation: 使用X射线辐射诱导化学反应的方法包括通过将X射线辐射引入其中引入两种或更多种反应物的体积中,在反应容器内部产生辐照空气,相对于两种或更多种反应物 以及任何后续产生的中间反应物或多种反应物的情况下,选择性地控制前述反应物要被离子化到任何程度的聚集程度,并且照射体积中部分前述的部分到总体的平均电离程度 通过控制X射线辐射的能量和能量,选择性地控制要离子化的反应物,从而引起反应物在照射体积中发生选择性反应。 一种或多种反应物可以通过含有X射线屏蔽的双壁管输送,以防止它们在被感染到照射体积之前的过早照射。

    METHOD AND APPARATUS FOR IRRADIATING ACTIVE ENERGY RAY
    2.
    发明申请
    METHOD AND APPARATUS FOR IRRADIATING ACTIVE ENERGY RAY 审中-公开
    辐射活性能量辐射的方法和装置

    公开(公告)号:WO01026803A1

    公开(公告)日:2001-04-19

    申请号:PCT/JP2000/007052

    申请日:2000-10-11

    Abstract: In a method for irradiating an active energy ray wherein an article to be irradiated is conveyed in from an entrance, the article is irradiated with an active energy ray under an inert gas atmosphere in an active energy ray irradiation section and then the article is carried out from an exit, an improvement which comprises controlling the resistance to gas flow at the entrance and the exit in such a manner that the article is irradiated under a condition wherein X/Y ≥1, where X represents the amount of a gas passing through the entrance and Y represents the amount of a gas passing through the exit.

    Abstract translation: 在用于照射从入射口输送被照射物品的活性能量射线的方法中,在活性能量射线照射部分的惰性气体气氛下用活性能量射线照射物品,然后进行制品 在出口处,包括在X /Y≥1的条件下照射照射入口和出口处的气流阻力的改进,其中X表示通过 入口,Y表示通过出口的气体的量。

    IN-SITU GENERATION OF THE MOLECULAR ETCHER CARBONYL FLUORIDE OR ANY OF ITS VARIANTS AND ITS USE
    6.
    发明申请
    IN-SITU GENERATION OF THE MOLECULAR ETCHER CARBONYL FLUORIDE OR ANY OF ITS VARIANTS AND ITS USE 审中-公开
    分子氧化碳氟化物或任何其变体及其使用的现场生成

    公开(公告)号:WO2014039425A1

    公开(公告)日:2014-03-13

    申请号:PCT/US2013/057796

    申请日:2013-09-03

    Abstract: The molecular etcher carbonyl fluoride (COF2) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of materials such as the unwanted film and/or deposits on the chamber walls and other components in a process chamber or substrate (collectively referred to herein as "materials"). The methods of the present invention involve igniting and sustaining a plasma, whether it is a remote or in-situ plasma, by stepwise addition of additives, such as but not limited to,. a saturated, unsaturated or partially unsaturated perfluorocarbon compound (PFC) having the general formula (CyFz) and/or an oxide of carbon (COx) to a nitrogen trifluoride (NF3) plasma into a chemical deposition chamber (CVD) chamber, thereby generating COF2.

    Abstract translation: 根据本发明,提供分子蚀刻剂碳酰氟(COF 2)或其任何变体,以提高蚀刻和/或清洁和/或去除诸如不需要的膜和/或沉积物之类的材料的效率 处理室或基板(这里统称为“材料”)中的室壁和其它部件。 本发明的方法包括通过逐步添加添加剂(例如但不限于)来点燃和维持等离子体,无论其是远距离还是原位等离子体。 具有通式(CyFz)的饱和,不饱和或部分不饱和全氟化碳化合物(PFC)和/或与三氟化氮(NF 3)等离子体的碳(CO x)氧化物进入化学沉积室(CVD)室,从而产生COF 2 。

    METHOD AND APPARATUS FOR ELECTROMAGNETIC IRRADIATION OF LIQUID
    8.
    发明申请
    METHOD AND APPARATUS FOR ELECTROMAGNETIC IRRADIATION OF LIQUID 审中-公开
    液体电磁辐射的方法和装置

    公开(公告)号:WO01062671A1

    公开(公告)日:2001-08-30

    申请号:PCT/JP2001/001401

    申请日:2001-02-26

    Abstract: An electromagnetic irradiation device comprises an electromagnetic source (13) such as an ultraviolet lamp; a cylindrical member (15) enclosing the electromagnetic source; a liquid tank provided outside the cylindrical member (16); and an opening (17) for allowing the overflow from the tank to fall in the form of thin film along the inner wall of the cylindrical member, which is irradiated by a lamp (11). Means is provided for allowing the liquid through the opening (17) to fall spirally along the inner wall of the cylindrical member. The irradiation device achieves stabilized electromagnetic irradiation of large amounts of liquid without causing the contamination of an electromagnetic source such as an ultraviolet lamp.

    Abstract translation: 电磁辐射装置包括诸如紫外灯的电磁源(13); 围绕所述电磁源的圆柱形构件(15); 设置在所述圆筒构件(16)的外侧的液体容器; 以及用于允许来自罐的溢流沿着由灯(11)照射的圆柱形构件的内壁以薄膜的形式落下的开口(17)。 提供了用于使液体通过开口(17)沿着圆柱形构件的内壁螺旋地下降的装置。 照射装置实现了大量液体的稳定的电磁照射,而不会引起诸如紫外线灯的电磁源的污染。

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