公开(公告)号：EP4377682A1

公开(公告)日：2024-06-05

申请号：EP23750059.0

申请日：2023-01-18

Applicant: KLA Corporation

Inventor： JIANG, Youfei ,  STEIGERWALD, Michael ,  SEARS, Christopher

IPC: G01N23/225 ,  G01N23/2204 ,  H01J37/05 ,  H01J37/10 ,  H01J37/20 ,  H01L21/66

CPC classification number: H01J37/3056 ,  H01J2237/3174520130101 ,  H01J37/3005 ,  H01J2237/3174920130101 ,  H01J2237/3047220130101 ,  H01L22/12 ,  H01J37/302

公开(公告)号：EP2852966A1

公开(公告)日：2015-04-01

申请号：EP13723475.3

申请日：2013-05-14

Applicant: Mapper Lithography IP B.V.

Inventor： VAN VEEN, Alexander Hendrik Vincent ,  URBANUS, Willem Henk

IPC: H01J37/30 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

Abstract translation: 本发明涉及一种用于曝光目标物的带电粒子光刻系统。 该系统包括用于产生带电粒子束的带电粒子束发生器; 用于从带电粒子束形成多个子束的孔径阵列（6）; 以及用于将子束投影到目标表面上的小射束投影仪（12）。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3）; 用于折射发散带电粒子束的准直器系统（5a，5b，5c，5d; 72; 300） 以及用于从所述准直器系统去除热的冷却装置（203），所述冷却装置包括围绕所述准直器系统的至少一部分的主体。

公开(公告)号：EP2645402A3

公开(公告)日：2015-03-25

申请号：EP13161508.0

申请日：2013-03-28

Applicant: FEI Company

Inventor： Miller, Tom ,  Kellogg, Sean ,  Zbranek, Jiri

IPC: H01J37/304

CPC classification number: H01J37/08 ,  H01J37/045 ,  H01J37/243 ,  H01J37/302 ,  H01J2237/043 ,  H01J2237/0805 ,  H01J2237/0817 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.

公开(公告)号：EP2197014A3

公开(公告)日：2013-10-23

申请号：EP09178753.1

申请日：2009-12-10

Applicant: Vistec Electron Beam GmbH

Inventor： Döring, Hans-Joachim ,  Elster, Thomas ,  Slodowski, Matthias ,  Heinitz, Joachim

IPC: H01J37/04 ,  H01J37/09 ,  H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  G03F7/20

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0492

Abstract: Die Erfindung betrifft eine Anordnung zur Beleuchtung eines Substrates mit mehreren individuell geformten steuerbaren Partikelstrahlen, insbesondere für die Elektronenstrahllithographie in der Halbleiterindustrie.
Die Aufgabe, eine neue Möglichkeit zur Beleuchtung eines Substrats (91) mit mehreren individuell geformten steuerbaren Partikelteilstrahlen (118) zu finden, die eine hochauflösende Strukturierung von Substraten mit einem hohen Substratdurchsatz gestattet, ohne die Flexibilität der anwendbaren Strukturmuster zu beschränken oder infolge einer geforderten Flexibilität den hohen Substratdurchsatz einzuschränken, wird erfindungsgemäß gelöst, indem ein erstes und ein zweites Aperturblendenarray als Multiformatblendenarrays (41, 42) zur Erzeugung von Partikelteilstrahlen (118) mit unterschiedlichen Strahlquerschnitten ausgebildet sind und dem ersten und dem zweiten Multiformatblendenarray (41,42) mindestens drei Multistrahldeflektorarrays (51, 52, 53) zur individuellen Ablenkung der Partikelteilstrahlen (118) zugeordnet sind, wobei mindestens ein Multistrahldeflektorarray (51) zwischen ersten und zweiten Multiformatblendenarray (41, 42) angeordnet ist, um unterschiedliche Querschnitte der Partikelteilstrahlen (118) zu erzeugen, mindestens ein zweites Multistrahldeflektorarray (52) in der Nähe des zweiten Multiformatblendenarrays (42) angeordnet ist, um einzelnen Partikelteilstrahlen (118) in individuelle Crossover abzulenken oder auszutasten, und mindestens ein drittes Multistrahldeflektorarray (53) in einer Entfernung von 10-20 % des Abstandes zum nächsten Crossover (112) dem zweiten Multiformatblendenarrays (42) nachgeordnet ist, um unterschiedliche Positionen der Partikelteilstrahlen (118) auf dem Substrat (91) zu erzeugen.

公开(公告)号：EP2226830A3

公开(公告)日：2011-04-06

申请号：EP10155688.4

申请日：2010-03-05

Applicant: FEI Company

Inventor： Toth, Milos ,  Young, Richard ,  Henstra, Alexander ,  De Jong, Alan ,  Mulders, Johannes

IPC: H01J37/04 ,  H01J37/30 ,  H01J37/302

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate (54). The beam (12,13) preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

公开(公告)号：EP2024733A4

公开(公告)日：2011-04-06

申请号：EP07798253

申请日：2007-06-07

Applicant: FEI CO

Inventor： BIERHOFF MART PETRUS MARIA ,  BUIJSSE BART ,  KOOIJMAN CORNELIS SANDER ,  VAN LEEUWEN HUGO ,  TAPPEL HENDRIK GEZINUS ,  SANFORD COLIN AUGUST ,  STOKS SANDER RICHARD MARIE ,  BERGER STEVEN ,  BORMANS BEN JACOBUS MARIE ,  DRIESSEN KOEN ARNOLDUS WILHELMUS ,  PERSOON JOHANNES ANTONIUS HENDRICUS W G

IPC: H01J37/28 ,  F16J15/50

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP2209047A1

公开(公告)日：2010-07-21

申请号：EP10159048.7

申请日：2007-02-14

Applicant: FEI COMPANY

Inventor： Schmidt, Michael ,  Blackwood, Jeff

IPC: G03F1/00 ,  H01L21/3213 ,  H01J37/317 ,  C23C14/22 ,  B23K15/00

CPC classification number: B23K15/06 ,  B23K15/0086 ,  B23K2201/40 ,  C23C14/30 ,  H01J37/302 ,  H01J37/3056

Abstract: A coating is applied to a work piece (222) in a charged particle beam system (200) without directing the beam (218) to the work piece. The coating is applied by sputtering, either within the charged particle beam vacuum chamber (226) or outside the charged particle beam vacuum chamber. In one embodiment, the sputtering is performed by directing the charged particle beam (218) to a sputter material source (242), such as a needle (240) from a gas injection system. Material is sputtered from the sputter material source onto the work piece to form, for example, a protective or conductive coating, without requiring the beam to be directed to the work piece, thereby reducing or eliminating damage to the work piece.

公开(公告)号：EP1563381A4

公开(公告)日：2009-10-28

申请号：EP03783335

申请日：2003-11-12

Applicant: FEI CO

Inventor： TESHIMA JANET ,  PARTIN DANIEL E ,  HUDSON JAMES E

IPC: G06F11/00 ,  G01N23/225 ,  H01J37/28 ,  H01J37/302 ,  H01J37/304 ,  H01J37/305 ,  H01L21/00 ,  H01L21/66

CPC classification number: H01J37/28 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/31745 ,  H01L21/67253 ,  H01L21/67276

公开(公告)号：EP2024733A2

公开(公告)日：2009-02-18

申请号：EP07798253.6

申请日：2007-06-07

Applicant: FEI COMPANY

Inventor： BIERHOFF, Mart Petrus Maria ,  BUIJSSE, Bart ,  KOOIJMAN, Cornelis Sander ,  VAN LEEUWEN, Hugo ,  TAPPEL, Hendrik Gezinus ,  SANFORD, Colin August ,  STOKS, Sander Richard Marie ,  BERGER, Steven ,  BORMANS, Ben Jacobus Marie ,  DRIESSEN, Koen Arnoldus Wilhelmus ,  PERSOON, Johannes Antonius Hendricus W.G.

IPC: G01N23/00

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

Abstract translation: 紧凑的电子显微镜结实耐用，操作简单，并且最好不需要特殊的工具。 成像可以在插入样本后不久开始。 优选的简化设计包括用于聚焦的永磁体，没有真空控制器和真空计，并且使用背散射电子探测器并且没有二次电子探测器。

公开(公告)号：EP1710828A2

公开(公告)日：2006-10-11

申请号：EP06005921.9

申请日：2006-03-23

Applicant: Carl Zeiss NTS GmbH

Inventor： Principe, Edward L.

IPC: H01J37/28

CPC classification number: H01J37/28 ,  G01N1/32 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/226

Abstract: A method and an apparatus are for three-dimensional tomographic image generation in a scanning electron microscope system. At least two longitudinal marks are provided on the top surface of the sample which include an angle therebetween. In consecutive image recordings, the positions of these marks are determined and are used to quantify the slice thickness removed between consecutive image recordings.

Abstract translation: 一种用于扫描电子显微镜系统中的三维断层图像生成的方法和装置。 在样品的顶表面上提供至少两个纵向标记，其包括它们之间的角度。 在连续的图像记录中，确定这些标记的位置并用于量化连续图像记录之间去除的切片厚度。