公开(公告)号：EP0211180A2

公开(公告)日：1987-02-25

申请号：EP86107744.4

申请日：1986-06-06

Applicant: SHIPLEY COMPANY INC.

Inventor： Shipley, Charles R., Jr.

IPC: H05K3/46

CPC classification number: H05K3/465 ,  H05K3/0023 ,  H05K3/184 ,  H05K3/205 ,  H05K3/4661 ,  H05K3/4682 ,  H05K2201/09563 ,  H05K2203/0565 ,  H05K2203/1407

Abstract: The invention is for the formation of multilayer circuit boards where layers are formed sequentially using selective plating techniques and photoimaging of permanent dielectric materials to achieve fine line resolution and interconnections between circuits. The invention permits the sequential formation of multilayers of higher density using photoimaging techniques.

Abstract translation: 本发明用于形成多层电路板，其中使用选择性电镀技术和永久介电材料的光成像顺序地形成层，以实现细线分辨率和电路之间的互连。 本发明允许使用光成像技术顺序形成更高密度的多层。

公开(公告)号：EP0060294B1

公开(公告)日：1985-12-27

申请号：EP81902671.7

申请日：1981-09-11

Applicant: SHIPLEY COMPANY INC.

Inventor： GULLA, Michael ,  DUTKEWYCH, Oleh B.

IPC: C23C18/52

CPC classification number: H05K3/181 ,  C23C18/48 ,  Y10S428/901 ,  Y10T428/24273 ,  Y10T428/31507 ,  Y10T428/31529 ,  Y10T428/31533 ,  Y10T428/31678 ,  Y10T428/31681 ,  Y10T428/31692 ,  Y10T428/31703 ,  Y10T428/31707

公开(公告)号：EP0163202A2

公开(公告)日：1985-12-04

申请号：EP85105992.3

申请日：1985-05-15

Applicant: SHIPLEY COMPANY INC.

Inventor： Martin, Robert ,  Perkins, Majorie

IPC: G03F7/42

CPC classification number: G03F7/425

Abstract: A composition for stripping a photoresist from a substrate comprising a mixture of lactams where a first Lactam comprises at least 60% of the stripping solution and a second, different lactam comprises the balance. The use of the mixed lactam solution enhances the rate of removal of the resist from a substrate. The preferred lactams are pyrrolidones.

Abstract translation: 一种用于从包含内酰胺的混合物的底物中剥离光致抗蚀剂的组合物，其中第一内酰胺包含至少60％的剥离溶液和第二种不同的内酰胺，其包含余量。 使用混合的内酰胺溶液增加了抗蚀剂从基底上的去除速率。 优选的内酰胺是吡咯烷酮。

公开(公告)号：EP0047895B1

公开(公告)日：1985-12-04

申请号：EP81106690.1

申请日：1981-08-28

Applicant: SHIPLEY COMPANY INC.

Inventor： Martin, Robert L. ,  Gibson, George A.

IPC: C11D7/34 ,  C11D1/755 ,  C23G5/02 ,  G03F7/10 ,  G03F7/00 ,  G03F7/02 ,  G03F7/26

CPC classification number: G03F7/426 ,  C09D9/005 ,  C09D9/04

公开(公告)号：EP0097282A3

公开(公告)日：1984-07-25

申请号：EP83105619

申请日：1983-06-08

Applicant: SHIPLEY COMPANY INC.

Inventor： Cawston, John D. ,  Becker, Paul E., Jr.

IPC: G03F07/26

CPC classification number: G03F7/322

Abstract: An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

公开(公告)号：EP0027603B1

公开(公告)日：1984-05-23

申请号：EP80106133.4

申请日：1980-10-09

Applicant: SHIPLEY COMPANY INC.

Inventor： Oddi, Michael J. ,  Orio, Alfred P.

IPC: H05K3/06

CPC classification number: H05K3/28 ,  G03F7/16 ,  H05K3/064 ,  H05K3/108 ,  H05K3/1216 ,  H05K2203/0759 ,  Y10S430/136

公开(公告)号：EP0097282A2

公开(公告)日：1984-01-04

申请号：EP83105619.7

申请日：1983-06-08

Applicant: SHIPLEY COMPANY INC.

Inventor： Cawston, John D. ,  Becker, Paul E., Jr.

IPC: G03F7/26

CPC classification number: G03F7/322

Abstract: An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

Abstract translation: 一种含金属离子的显影剂组合物，用于显影光致抗蚀剂，其包含不含金属离子的碱和作为季铵化合物的无金属离子的表面活性剂。 显影剂允许将曝光光刻胶所需的能量从20％减少到50％，而对图像质量和图像分辨率没有有害影响。

公开(公告)号：EP0718693B1

公开(公告)日：2003-07-02

申请号：EP96102977.4

申请日：1987-12-22

Applicant: SHIPLEY COMPANY INC.

Inventor： Daniels, Brian Kenneth ,  Madoux, David Charles ,  Templeton, Michael Karpovich ,  Trefonas III, Peter ,  Woodbrey, James Calvin ,  Zampani, Anthony

IPC: G03F7/004 ,  G03F7/022

CPC classification number: G03F7/0226 ,  G03F7/0048 ,  G03F7/022

公开(公告)号：EP0763781A3

公开(公告)日：1997-07-16

申请号：EP96116990.1

申请日：1992-10-22

Applicant: SHIPLEY COMPANY INC.

Inventor： Thackeray, James W. ,  Orsula, George W.

IPC: G03F7/09

CPC classification number: G03F7/091 ,  G03F7/038 ,  G03F7/38

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract translation: 用于减少光致抗蚀剂的曝光辐射反射的防光晕组合物和方法在所述组合物上涂覆。 本发明的防光晕组合物包含树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。

公开(公告)号：EP0763781A2

公开(公告)日：1997-03-19

申请号：EP96116990.1

申请日：1992-10-22

Applicant: SHIPLEY COMPANY INC.

Inventor： Thackeray, James W. ,  Orsula, George W.

IPC: G03F7/09

CPC classification number: G03F7/091 ,  G03F7/038 ,  G03F7/38

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract translation: 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。