公开(公告)号：EP2250474A4

公开(公告)日：2011-11-02

申请号：EP09707645

申请日：2009-02-06

申请人： FEI CO

发明人： CORBETT DANIEL ROY ,  GOTTLIEB PAUL ,  OWEN MICHAEL JAMES ,  MENZIES ANDREW HARLEY

IPC分类号： G01J3/28 ,  G01J3/30 ,  G01J3/46 ,  G01N23/207 ,  G01N23/223

CPC分类号： G01N23/2076 ,  H01J37/28

公开(公告)号：EP2024732A4

公开(公告)日：2011-03-30

申请号：EP07798251

申请日：2007-06-07

申请人： FEI CO

发明人： BIERHOFF MART PETRUS MARIA ,  BUIJSSE BART ,  KOOIJMAN CORNELIS SANDER ,  VAN LEEUWEN HUGO ,  TAPPEL HENDRIK GEZINUS ,  SANFORD COLIN AUGUST ,  STOKS SANDER RICHARD MARIE ,  BERGER STEVEN ,  BORMANS BEN JACOBUS MARIE ,  DRIESSEN KOEN ARNOLDUS WILHELMUS ,  PERSOON JOHANNES ANTONIUS HENDRICUS WILHELMUS G

IPC分类号： H01J37/28 ,  F16J15/50

CPC分类号： H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP1683163A4

公开(公告)日：2009-12-02

申请号：EP04796047

申请日：2004-10-16

申请人： FEI CO ,  UNIV AUSTRALIAN

发明人： BOSWELL RODERICK ,  SUTHERLAND ORSON

IPC分类号： G21K1/00 ,  G21K20060101 ,  H01J37/08

CPC分类号： H01J3/00 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/121 ,  H01J2237/31749

公开(公告)号：EP1428006A4

公开(公告)日：2009-09-02

申请号：EP02749692

申请日：2002-06-28

申请人： FEI CO

发明人： LEZEC HENRI J ,  MUSIL CHRISTIAN R

IPC分类号： C23C16/04 ,  G01N1/00 ,  G01N23/225 ,  G21K5/00 ,  H01J37/147 ,  H01J37/21 ,  H01L21/02 ,  H01L21/285

CPC分类号： H01L28/24 ,  C23C16/047 ,  G01N23/225 ,  H01J2237/28 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31749

摘要： Methods and apparatus for calibration of a scanned beam system (8) are provided by sampling a calibration specimen (22) containing an array of targets with a spacing between samples that is greater than the spacing between targets in an array and forming an image from the samples to reduce calibration specimen degradation and to magnify calibration errors to enable very fine calibration of the scanned beam system (8).

公开(公告)号：EP1586007A4

公开(公告)日：2009-06-10

申请号：EP04702994

申请日：2004-01-16

申请人： FEI CO

发明人： STEWART DIANE K ,  CASEY J DAVID JR ,  BEATY JOHN ,  MUSIL CHRISTIAN R ,  BERGER STEVEN ,  SIJBRANDIJ SYBREN J

IPC分类号： B01J19/08 ,  C03C15/00 ,  C23F1/00 ,  C23F1/02 ,  C23F3/00 ,  G03F20060101 ,  G03F1/00 ,  G03F9/00 ,  G21K5/10 ,  H01L21/027

CPC分类号： G03F1/74 ,  H01J2237/31744

摘要： Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentration of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100% although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolitography masks.

公开(公告)号：EP1540692A4

公开(公告)日：2009-04-22

申请号：EP03759297

申请日：2003-09-18

申请人： FEI CO

发明人： SCHOLTZ JACOB JOHANNES ,  KNOWLES WILLIAM RALPH ,  THIEL BRADLEY LAMAR ,  VAN VEEN GERARDUS ,  SCHROEMGES RENE PETER MARIE

IPC分类号： H01J37/244 ,  G01N23/00 ,  G01Q30/20 ,  G01Q70/10 ,  H01J20060101 ,  H01J37/00 ,  H01J37/26 ,  H01J37/28

CPC分类号： H01J37/26 ,  H01J37/244 ,  H01J2237/0045 ,  H01J2237/2448 ,  H01J2237/2605

公开(公告)号：EP1332510A4

公开(公告)日：2007-04-04

申请号：EP01973743

申请日：2001-09-20

申请人： FEI CO

发明人： CHAO PETER S ,  ROSENBERG STEVE

IPC分类号： H01J37/22 ,  H01J37/30 ,  G01Q20/04 ,  H01J37/304 ,  H01J37/317

CPC分类号： H01J37/3005 ,  H01J37/304 ,  H01J2237/30466 ,  H01J2237/3175

摘要： A beam processing system, such as a focused ion beam or an electron beam (232) system addressing an arbitrary series of points and receives data from the point in real time. The data can be used to image or to alter the processing, even within a single dwell period, thereby allowing closed feedback loop for processing. A delay calculator (324) automatically determines the delay between instructing the system to move the beam and detecting a signal from the work piece surface so that the detector signal can be matched with the location on the work piece (239) at which the signal was generated.

公开(公告)号：EP2313231A4

公开(公告)日：2017-04-05

申请号：EP09795202

申请日：2009-07-09

申请人： FEI CO

发明人： STRAW MARCUS ,  SAMSAVAR AMIN ,  UTLAUT MARK ,  TOTH MILOS

IPC分类号： B23K26/14 ,  B23K26/03 ,  B23K26/0622 ,  B23K26/08 ,  H01J37/30

CPC分类号： B23K26/03 ,  B23K26/0622 ,  B23K26/0853 ,  B23K26/14 ,  B23K26/1423 ,  B23K26/1429 ,  H01J2237/2813

公开(公告)号：EP2939261A4

公开(公告)日：2016-02-10

申请号：EP13868669

申请日：2013-12-30

申请人： FEI CO

发明人： LEE SANG HOON ,  BLACKWOOD JEFFREY ,  STONE STACEY

IPC分类号： H01L21/205

CPC分类号： H01L21/2605 ,  C23C16/045 ,  C23C16/047 ,  H01L21/02115 ,  H01L21/02277 ,  H01L21/0243 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/28556 ,  H01L21/76879 ,  H01L21/76898

公开(公告)号：EP2939260A4

公开(公告)日：2016-01-20

申请号：EP13867351

申请日：2013-12-30

申请人： FEI CO

发明人： SCHMIDT MICHAEL ,  BLACKWOOD JEFFREY ,  STONE STACEY ,  LEE SANG HOON ,  KELLEY RONALD ,  LANDIN TREVAN

IPC分类号： H01L21/205

CPC分类号： G01N1/32 ,  G01N1/28 ,  H01L21/30655