公开(公告)号：EP2383769A1

公开(公告)日：2011-11-02

申请号：EP10161243.0

申请日：2010-04-28

申请人： FEI COMPANY

发明人： Luecken, Uwe ,  Van Hoften, Gerald ,  Schuurmans, Frank ,  De Jong, Alan

IPC分类号： H01J37/26 ,  H01J37/295 ,  G01N23/20 ,  H01J49/00 ,  H01J37/244 ,  H01J37/256

CPC分类号： H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/05 ,  H01J2237/221 ,  H01J2237/2446

摘要： The invention relates to a method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.

摘要翻译： 本发明涉及在TEM中使用直接电子检测器的方法，其中具有高强度峰值的图像（例如衍射图或EELS光谱）在所述检测器上成像。 众所周知，高强度峰值可能会损坏检测器。 为了避免这种损伤，图像的中心被移动，结果是检测器的一个位置没有暴露于高强度，但是高强度被污染在检测器上，在损坏结果之前移位高强度峰值。

公开(公告)号：EP2267752A2

公开(公告)日：2010-12-29

申请号：EP10012462.7

申请日：2006-09-06

申请人： Carl Zeiss SMT AG ,  Applied Materials Israel, Ltd.

发明人： Kemen, Thomas ,  Knippelmeyer, Rainer ,  Schubert, Stefan

IPC分类号： H01J37/09 ,  H01J37/04 ,  H01J37/317

CPC分类号： H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

摘要： A charged particle system comprises at least one charged particle source; a first multi aperture plate disposed downstream of the at least one charged particle source, the first multi aperture plate comprising a plurality of apertures; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate comprising a plurality of apertures; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the at least one charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate.

摘要翻译： 带电粒子系统包括至少一个带电粒子源; 设置在所述至少一个带电粒子源的下游的第一多孔板，所述第一多孔板包括多个孔; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板包括多个孔; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述至少一个带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第一多孔径板的一个孔 第二多孔板，其中多个孔径对布置成使得当沿着穿过第一多孔板的孔的带电粒子束的入射方向观察时，第一多孔板的孔的中心位移相对 到第二多孔板的孔的中心。

公开(公告)号：EP2256780A2

公开(公告)日：2010-12-01

申请号：EP10008339.3

申请日：2008-01-24

申请人： Hitachi High-Technologies Corporation

发明人： Terada, Shohei ,  Taniguchi, Yoshifumi

IPC分类号： H01J37/26 ,  H01J37/295

CPC分类号： H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0453 ,  H01J2237/057 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802

摘要： In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis; a method for correcting magnification and position and a system for correcting magnification and position, both of which are capable of correcting measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis, are provided.

摘要翻译： 为了使用电子分光镜和透射型电子显微镜，对于作为能量损失轴和测量位置的两个正交轴上形成的光谱图像，以高效率和高精度来校正光谱图像的测量倍率和测量位置 信息轴; 用于校正放大率和位置的方法以及用于校正倍率和位置的系统，它们都能够使用电子分光镜和透射电子显微镜来高效率和高精度地校正光谱图像的测量倍率和测量位置 提供了作为能量损失轴的量和测量位置信息轴的两个正交轴中形成的光谱图像。

公开(公告)号：EP2166345A1

公开(公告)日：2010-03-24

申请号：EP08778225.6

申请日：2008-07-10

申请人： Toyota Jidosha Kabushiki Kaisha

发明人： KISHITA, Keisuke ,  SAKAI, Hisashi

IPC分类号： G01N23/207 ,  G01T1/18 ,  H01J37/18 ,  G01N1/00 ,  G01T7/02

CPC分类号： H01J37/265 ,  G01N33/0011 ,  H01J37/18 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/182 ,  H01J2237/186 ,  H01J2237/188 ,  H01J2237/2445 ,  H01J2237/2446

摘要： Gas is supplied from positive pressure (10 5 Pa or more) to an analysis device of high vacuum (10 -2 Pa or less) precisely and stably, while keeping conditions constant and replicating the conditions, and performing switching to a desired gas within a short time. According to a gas introducing device and a method, a plurality of types of gases are synthesized in a mixing chamber, the synthesized gas is introduced and the pressure of the gas is reduced by a pressure reducing pump to a pressure ranging from 0.1 Pa to 0.1 MPa, and the depressurized gas is introduced to a gas analysis device through a switching operation using a gas switching valve.

摘要翻译： 在保持条件恒定并复制条件的同时，将气体从正压（10 5 Pa以上）提供到高真空（10 -2 Pa以下）的分​​析装置，并且稳定地进行，并进行切换到期望的气体 短时间。 根据气体导入装置和方法，在混合室中合成多种气体，导入合成气体，通过减压泵将气体的压力降低至0.1Pa〜0.1的压力 并且通过使用气体切换阀的切换操作将减压气体导入气体分析装置。

公开(公告)号：EP1965407A3

公开(公告)日：2010-01-27

申请号：EP08001366.7

申请日：2008-01-24

申请人： Hitachi High-Technologies Corporation

发明人： Terada, Shohei ,  Taniguchi, Yoshifumi

IPC分类号： H01J37/26 ,  H01J37/295

CPC分类号： H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0453 ,  H01J2237/057 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802

摘要： In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis; a method for correcting magnification and position and a system for correcting magnification and position, both of which are capable of correcting measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis, are provided.

摘要翻译： 为了使用电子分光镜和透射电子显微镜关于在作为能量损失轴的量和测量位置的量的两个正交轴上形成的光谱图像以高效率和高准确度校正光谱图像的测量放大率和测量位置 信息轴; 用于校正倍率和位置的方法以及用于校正倍率和位置的系统和这两种系统都能够使用电子分光镜和透射电子显微镜以高效率和高准确度校正光谱图像的测量放大率和测量位置， 提供在作为能量损失轴的量和测量位置信息轴的两个正交轴上形成的光谱图像。

公开(公告)号：EP1914787A4

公开(公告)日：2009-11-25

申请号：EP06782616

申请日：2006-08-10

申请人： EBARA CORP

发明人： HATAKEYAMA MASAHIRO ,  YOSHIKAWA SHOJI ,  SUEMATSU KENICHI ,  KARIMATA TSUTOMU ,  NOJI NOBUHARU

IPC分类号： H01J37/244 ,  G01R31/302 ,  H01J37/29 ,  H01L21/66

CPC分类号： H01J37/261 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446

公开(公告)号：EP1376650A4

公开(公告)日：2008-05-21

申请号：EP02705458

申请日：2002-03-22

申请人： KANAZAWA INST OF TECHNOLOGY

发明人： NISHIKAWA OSAMU

IPC分类号： G01Q30/02 ,  G01Q60/00 ,  G01Q70/10 ,  H01J37/256 ,  H01J37/285 ,  H01J49/06 ,  H01J49/40 ,  G01N13/12 ,  G01N13/16 ,  H01J37/28 ,  H01J49/10

CPC分类号： G01Q30/02 ,  B82Y35/00 ,  H01J37/256 ,  H01J37/285 ,  H01J49/06 ,  H01J49/40 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/2818 ,  Y10S977/852

摘要： in a scanning atom probe (100), a surface topography of a specimen (3) is firstly analyzed by a surface topography analyzing unit (20). In the next place, an extraction electrode (5) is aligned to a desired area to be analyzed of a specimen surface. In case of analyzing electronic state of the area to be analyzed, negative bias voltage is impressed onto the specimen (3) from a direct current high voltage supply (2) and field emitted electrons are detected by a screen (9). In case of analyzing atomic arrangement and composition of the area to be analyzed, positive voltage is impressed onto the specimen (3) from the direct current high voltage supply (2) and a pulse generator (1) and positive ions generated by field evaporation are detected by a position sensitive ion detector (11) or a relfectron type mass analyzer (13).

摘要翻译： 在扫描原子探针（100）中，首先，表面形状分析块（20）分析样本（3）的表面形状。 接下来，将引出电极（5）定位在样品表面的期望分析区域上。 当分析分析区域中的电子状态时，从直流高压电源（2）向样品（3）施加负偏压，并通过屏幕（9）检测场致发射电子。 当分析分析区域中的原子排列和成分时，样品（3）受到来自直流高压电源（2）和脉冲发生器（1）的正电压，并且通过场蒸发产生的阳离子被检测到 检测型离子检测器（11）或反射型质量分析器（13）。

公开(公告)号：EP1618587A2

公开(公告)日：2006-01-25

申请号：EP04750913.8

申请日：2004-04-29

申请人： Axcelis Technologies, Inc.

发明人： BENVENISTE, Victor

IPC分类号： H01J37/304 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24542

摘要： The present invention facilitates semiconductor device fabrication by monitoring uniformity of beam current and angle of incidence at various locations throughout an ion beam (e.g., a wider portion of a ribbon beam). One or more uniformity detectors are employed within an ion implantation system (e.g., single wafer based system and/or a multiple wafer based system) and are comprised of a number of elements. The respective elements comprise an aperture that selectively obtains a beamlet from an incident ion beam and a pair of sensors that measure beam current as a function of the incoming angle of the ion beam. The angle of incidence at for particular elements can be determined at least partially from the measured beam current by the pairs of sensors. As a result, generation of an ion beam can be adjusted to improve uniformity as indicated and ion implantation can be performed with an improved uniformity and under tighter process controls.

公开(公告)号：EP1450391A2

公开(公告)日：2004-08-25

申请号：EP04001955.6

申请日：2004-01-29

申请人： Hitachi High-Technologies Corporation

发明人： Tanba, Yuusuke ,  Sato, Mitsugu ,  Takahashi, Kaname ,  Watanabe, Shunya ,  Nakagawa, Mine ,  Muto, Atsushi ,  Morikawa, Akinari

IPC分类号： H01J37/26

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/2802

摘要： The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.

摘要翻译： 本发明的带电粒子束装置分别检测从样品表面发射的二次信号颗粒，散射在样品内并透过样品的暗场信号颗粒，通过样品透射的亮场信号颗粒，而不分散在样品内， 允许操作者根据应用以最佳对比度观察图像。 为了仅检测在样品内散射的暗场传输信号颗粒，在通过薄膜样品传输的初级带电粒子束获得的透射信号颗粒中，该装置包括具有开口的透射信号转换构件， 未被分散在样品内的亮场发射信号粒子可以通过，以及用于检测与转换构件相撞的信号的检测装置。

公开(公告)号：EP1280184A3

公开(公告)日：2004-03-31

申请号：EP02014643.7

申请日：2002-07-02

申请人： Carl Zeiss SMT AG

发明人： Kienzle, Oliver, Dr. ,  Stenkamp, Dirk, Dr. ,  Steigerwald, Michael, Dr. ,  Knippelmeyer, Rainer, Dr. ,  Haider, Max, Dr. ,  Müller, Heiko, Dr. ,  Uhlemann, Stephan, Dr.

IPC分类号： H01J37/28 ,  H01J37/285 ,  H01J37/147

CPC分类号： H01J37/28 ,  H01J2237/082 ,  H01J2237/2446

摘要： Es wird ein Untersuchungssystem zum Abbilden eines in einer Objektebene anordenbaren Objektes vorgeschlagen, umfassend eine Beleuchtungseinrichtung (31), um einem begrenzten Feld des Objekts (3) Energie derart zuzuführen, daß geladene Teilchen von Orten des Feldes austreten, wobei das Feld in der Ebene des Objektes (3) verlagerbar ist, eine Deflektoreinrichtung (23, 24) zur Bereitstellung eines änderbaren Ablenkfeldes, um an Orten eines auswählbaren Bereiches (7) des Objektes (3) austretende geladene Teilchen durch einen festen vorbestimmten Strahlquerschnitt (27) zu führen, und einen derart im Strahlengang angeordneten ortsauflösenden Detektor (5), daß die geladenen Teilchen nach Durchlaufen der ersten Deflektoreinrichtung (23, 24) auf diesen treffen, wobei von verschiedenen Orten des Bereiches (7) austretende Teilchen auf den Austrittsorten zugeordnete verschiedene Orte des ortsauflösenden Detektors (5) abgebildet werden.