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13 条记录 (耗时 0.013 秒)

    CONDUCTIVE PROBE FOR SCANNING MICROSCOPE AND MACHINING METHOD USING THE SAME
    1.
    发明公开
    CONDUCTIVE PROBE FOR SCANNING MICROSCOPE AND MACHINING METHOD USING THE SAME 审中-公开
    LEITFÄHIGESONDEFÜREIN ABTASTMIKROSKOP UND BEARBEITUNGSVERFAHREN DAMIT

    公开(公告)号：EP1336835A4

    公开(公告)日：2005-03-16

    申请号：EP01972624

    申请日：2001-09-28

    申请人： DAIKEN CHEMICAL CO LTD ,  SEIKO INSTR INC ,  NAKAYAMA YOSHIKAZU

    发明人： NAKAYAMA YOSHIKAZU ,  AKITA SEIJI ,  HARADA AKIO ,  OKAWA TAKASHI ,  TAKANO YUICHI ,  YASUTAKE M ,  SHIRAKAWABE Y

    IPC分类号： B82B1/00 ,  B82B3/00 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q60/40 ,  G01Q70/00 ,  G01Q70/12 ,  G01N13/12 ,  G12B21/02 ,  G12B21/04

    CPC分类号： G01Q60/16 ,  G01Q60/38 ,  G01Q60/54 ,  G01Q70/12

    摘要： A conductive probe for a scanning microscope capable of applying a voltage between a conductive nanotube serving as a probe and a specimen or a current to them. A conductive probe (20) for a scanning microscope for collecting physical properties of the surface of a specimen by means of the tip (14a) of a conductive nanotube probe (12) fixed to a cantilever (4) is characterized in that the conductive probe (20) is composed of a conductive coating (17) provided on the surface of the cantilever (4), a conductive nanotube (12) the root part (16) of which is provided in contact with the surface of the necessary portion of the cantilever (4), and a conductive deposit (18) covering from the root part (16) to a part of the conductive coating (17) and fixing the conductive nanotube (12), and the conductive nanotube (12) is electrically connected to the conductive coating (17) through the conductive deposit (18).

    摘要翻译： 一种用于扫描型显微镜的导电探针，其通过固定到悬臂的导电性纳米管探针的尖端捕获试样表面的物质信息，其中导电探针由形成在表面上的导电膜构成 所述悬臂是其基端部固定成导电的非导管，其中预定悬臂的表面是接触的，以及导电沉积物，其通过从非管形管的基端部分覆盖到导电的一部分 电影。 导电非导体和导电膜通过导电沉积物彼此电连接。

    POWER SUPPLY CIRCUIT FOR PLASMA GENERATION, PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA-PROCESSED OBJECT
    8.
    发明公开
    POWER SUPPLY CIRCUIT FOR PLASMA GENERATION, PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA-PROCESSED OBJECT 审中-公开
    电源电路用于产生等离子体，等离子体产生装置，等离子体处理装置及电浆加工对象

    公开(公告)号：EP1748687A4

    公开(公告)日：2009-07-08

    申请号：EP05710329

    申请日：2005-02-17

    申请人： DAIKEN CHEMICAL CO LTD ,  TAKIKAWA HIROFUMI

    发明人： TAKIKAWA HIROFUMI ,  NISHIMURA YOSHIMI ,  HARADA AKIO

    IPC分类号： H05H1/36 ,  H05H1/46 ,  H01L21/304 ,  H05H1/30

    CPC分类号： H05H1/36 ,  H05H1/48

    摘要： A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma-processed objects having target qualities. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of the electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of the capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by sharing the alternating high voltage generating circuit.

    METAL ACETYLIDE COMPOUND AND PROCESS FOR PREPARING THE SAME
    10.
    发明公开
    METAL ACETYLIDE COMPOUND AND PROCESS FOR PREPARING THE SAME 有权
    VERFAHREN ZU SEINER HERSTELLUNG金属制品

    公开(公告)号：EP0969006A4

    公开(公告)日：2002-04-17

    申请号：EP98943090

    申请日：1998-09-21

    申请人： DAIKEN CHEMICAL CO LTD

    发明人： HARADA AKIO ,  OKAMOTO YOSHIKI

    IPC分类号： C07F1/00 ,  C07F15/00 ,  C07F1/12 ,  C07F1/10

    CPC分类号： C07F15/006 ,  C07F1/00 ,  C07F15/0086

    摘要： A novel compound which is used as an organic metal complex for metal pastes and the like, is free from sulfur and chlorine, and hence can contribute to the purification of the environment; and a process for preparing the same. Specifically a metal acetylide compound represented by the general formula M(-CC-R)n, wherein M represents a metal atom; n represents the valency of the metal atom M; and R represents a hydrocarbon group having one to eight carbon atoms and optionally containing an oxygen atom. As this compound contains neither sulfur non chlorine, it emits neither sulfur dioxide gas nor chlorine compounds, when used for metal pastes and the like, thus contributing to the purification of the environment. Use of a solid sulfite as a metal reducing agent facilitates stoichiometrical control of the reaction and preparation of a metal acetylide compound. Further, since this process does not evolve sulfur dioxide gas, it is free from the fear of environmental pollution and can contribute to the purification of the environment.

    摘要翻译： 本发明涉及不含硫或氯的新型化合物及其制造方法，因此有助于作为有机金属配合物在金属糊等中的清洁作用。 由通式M（-CIDENTICAL CR）n表示的金属乙炔化合物（式中，M表示金属原子，n表示金属原子M的价数，R表示碳原子数为1〜8的烃基） 其可以含有或不含有氧原子）作为新的有机金属配合物。 由于这些化合物不含硫或氯，所以即使将糊料固定在金属糊等中，也不会释放出亚硫酸气体或氯化合物。 因此，这些化合物有助于清洁环境。 在本发明中，固体亚硫酸盐用作金属还原剂; 因此，反应的简单化学计量控制是可能的，使得容易获得金属乙炔化合物。 此外，由于在该制造方法中不产生亚硫酸气体，所以不关心环境污染，因此有助于清洁环境。